HK1111230A1 - Pellicle storage container and method of manufacturing same - Google Patents

Pellicle storage container and method of manufacturing same

Info

Publication number
HK1111230A1
HK1111230A1 HK08105759.2A HK08105759A HK1111230A1 HK 1111230 A1 HK1111230 A1 HK 1111230A1 HK 08105759 A HK08105759 A HK 08105759A HK 1111230 A1 HK1111230 A1 HK 1111230A1
Authority
HK
Hong Kong
Prior art keywords
storage container
manufacturing same
pellicle storage
pellicle
manufacturing
Prior art date
Application number
HK08105759.2A
Other languages
English (en)
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1111230A1 publication Critical patent/HK1111230A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Packaging Frangible Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Closures For Containers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK08105759.2A 2006-06-09 2008-05-23 Pellicle storage container and method of manufacturing same HK1111230A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006160573A JP2007328226A (ja) 2006-06-09 2006-06-09 ペリクル収納容器及びその製造方法

Publications (1)

Publication Number Publication Date
HK1111230A1 true HK1111230A1 (en) 2008-08-01

Family

ID=38928724

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08105759.2A HK1111230A1 (en) 2006-06-09 2008-05-23 Pellicle storage container and method of manufacturing same

Country Status (5)

Country Link
JP (1) JP2007328226A (ja)
KR (1) KR20070117996A (ja)
CN (1) CN101086612B (ja)
HK (1) HK1111230A1 (ja)
TW (1) TWI316920B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5464859B2 (ja) * 2008-02-01 2014-04-09 旭化成イーマテリアルズ株式会社 ペリクル収納容器
TWI537674B (zh) * 2008-09-12 2016-06-11 Asahi Kasei E Materials Corp Mask mask film, mask mask and mask mask the use of the box
JP5474385B2 (ja) * 2009-03-18 2014-04-16 旭化成イーマテリアルズ株式会社 ペリクル収納容器
JP2011007827A (ja) * 2009-06-23 2011-01-13 Shin Etsu Polymer Co Ltd 大型精密部材収納容器
JP2011034020A (ja) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd ペリクル収納容器
JP2011203309A (ja) * 2010-03-24 2011-10-13 Shin-Etsu Chemical Co Ltd ペリクルの収納容器およびペリクル収納容器の搬送用台車
JP2012002918A (ja) * 2010-06-15 2012-01-05 Shin Etsu Polymer Co Ltd 大型精密部材収納容器およびその蓋体
JP2016151633A (ja) * 2015-02-17 2016-08-22 信越化学工業株式会社 ペリクル収納容器

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645965Y2 (ja) * 1988-02-09 1994-11-24 三井石油化学工業株式会社 ペリクル用容器
US5575394A (en) * 1994-07-15 1996-11-19 Fluoroware, Inc. Wafer shipper and package
JP3143337B2 (ja) * 1994-10-12 2001-03-07 信越ポリマー株式会社 ペリクル収納容器
JPH08198377A (ja) * 1995-01-20 1996-08-06 Mitsui Petrochem Ind Ltd マスク保護装置の収納ケース
JP3023612U (ja) * 1995-10-06 1996-04-23 信越化学工業株式会社 ペリクルのペリクル収納容器への固定構造
JP2000173887A (ja) * 1998-12-02 2000-06-23 Asahi Kasei Denshi Kk ペリクル収納ケース
JP4082845B2 (ja) * 2000-04-10 2008-04-30 信越化学工業株式会社 リソグラフィー用ペリクルおよびペリクル膜の反りの緩和方法
JP4236535B2 (ja) * 2003-07-31 2009-03-11 旭化成エレクトロニクス株式会社 大型ペリクル収納容器
JP2005107085A (ja) * 2003-09-30 2005-04-21 Asahi Kasei Electronics Co Ltd 大型ペリクル収納容器の開封方法および蓋開閉治具および大型ペリクル収納容器

Also Published As

Publication number Publication date
KR20070117996A (ko) 2007-12-13
TWI316920B (en) 2009-11-11
TW200744919A (en) 2007-12-16
CN101086612A (zh) 2007-12-12
JP2007328226A (ja) 2007-12-20
CN101086612B (zh) 2010-09-15

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20180607