HK1110948A1 - 印版的製造方法 - Google Patents

印版的製造方法

Info

Publication number
HK1110948A1
HK1110948A1 HK08105479.1A HK08105479A HK1110948A1 HK 1110948 A1 HK1110948 A1 HK 1110948A1 HK 08105479 A HK08105479 A HK 08105479A HK 1110948 A1 HK1110948 A1 HK 1110948A1
Authority
HK
Hong Kong
Prior art keywords
radiation
polymer coating
gelatin
light
absorbing
Prior art date
Application number
HK08105479.1A
Other languages
English (en)
Inventor
Siegfried Rckl
Original Assignee
Spgprints B V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Spgprints B V filed Critical Spgprints B V
Publication of HK1110948A1 publication Critical patent/HK1110948A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing
HK08105479.1A 1997-11-03 2008-05-16 印版的製造方法 HK1110948A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97119181A EP0913730B1 (de) 1997-11-03 1997-11-03 Verfahren zum Herstellen einer Druckform

Publications (1)

Publication Number Publication Date
HK1110948A1 true HK1110948A1 (zh) 2008-07-25

Family

ID=8227565

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08105479.1A HK1110948A1 (zh) 1997-11-03 2008-05-16 印版的製造方法

Country Status (5)

Country Link
US (1) US6309799B1 (zh)
EP (2) EP1860499B1 (zh)
AT (1) ATE368239T1 (zh)
DE (1) DE59712866D1 (zh)
HK (1) HK1110948A1 (zh)

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US6530317B2 (en) * 2000-12-05 2003-03-11 Creo Srl Method to engrave surface using particle beam
DE10063819B4 (de) * 2000-12-21 2006-02-02 Man Roland Druckmaschinen Ag Maskenerstellung zur Herstellung einer Druckform
US7833389B1 (en) * 2005-01-21 2010-11-16 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus
US9307648B2 (en) 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
US8435373B2 (en) 2005-06-20 2013-05-07 Microcontinumm, Inc. Systems and methods for roll-to-roll patterning
US7674103B2 (en) 2005-01-21 2010-03-09 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus
DE102004007600A1 (de) * 2004-02-17 2005-09-01 Heidelberger Druckmaschinen Ag Druckform mit mehreren flächigen Funktionszonen
US7041432B2 (en) * 2004-03-29 2006-05-09 Markhart Gary T Apparatus and method for thermally developing flexographic printing elements
US7237482B2 (en) * 2004-03-29 2007-07-03 Ryan Vest Flexo processor
US20110281219A9 (en) * 2005-10-13 2011-11-17 Vest Ryan W Apparatus and Method for Thermally Developing Flexographic Printing Elements
WO2007100849A2 (en) 2006-02-27 2007-09-07 Microcontinuum, Inc. Formation of pattern replicating tools
EP2128699A1 (en) * 2008-05-28 2009-12-02 Stork Prints B.V. Base material for preparing a stencil for screen printing
NL2001744C2 (nl) * 2008-06-04 2009-12-07 Stork Prints Bv Werkwijze voor de vervaardiging van een zeefdrukvorm.
EP2277699A2 (de) 2009-07-13 2011-01-26 Kesper Druckwalzen GmbH Drucksiebe und Verfahren zur Herstellung von Drucksieben
JP5335146B2 (ja) * 2009-10-23 2013-11-06 ストルク プリンツ オーストリア ゲーエムベーハー レリーフ部を備えた有孔または部分有孔テンプレートの製造方法
US8820234B2 (en) * 2009-10-30 2014-09-02 Esko-Graphics Imaging Gmbh Curing of photo-curable printing plates with flat tops or round tops by variable speed exposure
ITMI20102097A1 (it) * 2010-11-12 2012-05-13 Carminati & Guizzardi Srl Procedimento di realizzazione di lastre flessografiche, particolarmente per sistemi di stampa flessografica.
US8845912B2 (en) 2010-11-22 2014-09-30 Microcontinuum, Inc. Tools and methods for forming semi-transparent patterning masks
EP2602662A1 (de) 2011-12-09 2013-06-12 AKK GmbH Beleuchtungssystem zur Herstellung von Drucksieben mit einem Richtstrahl-Kombinator
CN104035286B (zh) * 2013-03-05 2015-12-23 中芯国际集成电路制造(上海)有限公司 圆筒形掩模板系统、曝光装置和曝光方法
US9589797B2 (en) 2013-05-17 2017-03-07 Microcontinuum, Inc. Tools and methods for producing nanoantenna electronic devices
CN107445489B (zh) * 2016-05-30 2023-07-07 蓝思科技（长沙）有限公司 一种含彩色油墨纹路图案的玻璃板的制备方法及玻璃板
EP3401732B1 (de) 2017-05-11 2020-02-05 Folex AG Hochauflösende flexodruckplatte und mittel zu deren herstellung
CN110692147A (zh) * 2017-12-13 2020-01-14 深圳市柔宇科技有限公司 用于真空蒸镀的掩膜板、蒸镀方法、显示装置及蒸镀设备
EP3832389A1 (de) 2019-12-06 2021-06-09 Folex AG Hochauflösende flexodruckplatte und mittel zu deren herstellung mit verbesserter sperrschicht und haftungsmodulierende schicht
CN112382557B (zh) * 2021-01-15 2021-04-27 钧迪智能装备科技(苏州)有限公司 一种屏幕光处理的方法
CN115257149B (zh) * 2022-06-22 2024-01-23 德中（天津）技术发展股份有限公司 喷印添加与激光去除相结合制造漏印网版掩膜图案的方法

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Also Published As

Publication number Publication date
EP1860499A2 (de) 2007-11-28
US6309799B1 (en) 2001-10-30
EP0913730A1 (de) 1999-05-06
EP1860499B1 (de) 2015-02-11
ATE368239T1 (de) 2007-08-15
EP1860499A3 (de) 2008-10-22
EP0913730B1 (de) 2007-07-25
DE59712866D1 (de) 2007-09-06

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Effective date: 20171102