BR8405362A - Processo para a fabricacao de mascaras para a litografia radiologica - Google Patents

Processo para a fabricacao de mascaras para a litografia radiologica

Info

Publication number
BR8405362A
BR8405362A BR8405362A BR8405362A BR8405362A BR 8405362 A BR8405362 A BR 8405362A BR 8405362 A BR8405362 A BR 8405362A BR 8405362 A BR8405362 A BR 8405362A BR 8405362 A BR8405362 A BR 8405362A
Authority
BR
Brazil
Prior art keywords
carrier foil
portions
exposed
carrier
litography
Prior art date
Application number
BR8405362A
Other languages
English (en)
Inventor
Walter Glashauser
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of BR8405362A publication Critical patent/BR8405362A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
BR8405362A 1983-10-25 1984-10-23 Processo para a fabricacao de mascaras para a litografia radiologica BR8405362A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833338717 DE3338717A1 (de) 1983-10-25 1983-10-25 Verfahren zur herstellung einer roentgenmaske mit metalltraegerfolie

Publications (1)

Publication Number Publication Date
BR8405362A true BR8405362A (pt) 1985-09-03

Family

ID=6212687

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8405362A BR8405362A (pt) 1983-10-25 1984-10-23 Processo para a fabricacao de mascaras para a litografia radiologica

Country Status (8)

Country Link
US (1) US4528071A (pt)
EP (1) EP0141335B1 (pt)
JP (1) JPS60108851A (pt)
AT (1) ATE29601T1 (pt)
AU (1) AU585841B2 (pt)
BR (1) BR8405362A (pt)
CA (1) CA1261193A (pt)
DE (2) DE3338717A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3529966C1 (de) * 1985-08-22 1987-01-15 Kernforschungsz Karlsruhe Verfahren zur Herstellung von Masken fuer die Roentgentiefenlithographie
JPH0795512B2 (ja) * 1987-05-14 1995-10-11 沖電気工業株式会社 Ｘ線露光マスク用メンブレンの製造方法
DE3806762A1 (de) * 1988-03-02 1989-09-07 Fraunhofer Ges Forschung Verfahren zur lokalen erhoehung der optischen transparenz von siliziummembranen
KR920010065B1 (ko) * 1989-04-20 1992-11-13 삼성전자 주식회사 X선 마스크
US5477105A (en) * 1992-04-10 1995-12-19 Silicon Video Corporation Structure of light-emitting device with raised black matrix for use in optical devices such as flat-panel cathode-ray tubes
DE69428821T2 (de) * 1993-03-25 2002-04-11 Sumitomo Electric Industries Verfahren zur Herstellung einer Mikrostruktur und einer Röntgenstrahlmaske
US6360424B1 (en) 1994-06-06 2002-03-26 Case Western Reserve University Method of making micromotors with utilitarian features
US6029337A (en) * 1994-06-06 2000-02-29 Case Western Reserve University Methods of fabricating micromotors with utilitarian features
US5705318A (en) * 1994-06-06 1998-01-06 Case Western Reserve University Micromotors and methods of fabrication
US5788468A (en) * 1994-11-03 1998-08-04 Memstek Products, Llc Microfabricated fluidic devices
GB2367788A (en) * 2000-10-16 2002-04-17 Seiko Epson Corp Etching using an ink jet print head
RU2759387C1 (ru) * 2020-11-11 2021-11-12 Федеральное государственное бюджетное учреждение науки Институт ядерной физики им. Г.И. Будкера Сибирского отделения Российской академии наук (ИЯФ СО РАН) Способ изготовления самонесущего рентгеношаблона

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3192136A (en) * 1962-09-14 1965-06-29 Sperry Rand Corp Method of preparing precision screens
US3342706A (en) * 1964-01-23 1967-09-19 Liben William Method of constructing evaporation masks
US3476658A (en) * 1965-11-16 1969-11-04 United Aircraft Corp Method of making microcircuit pattern masks
US3402110A (en) * 1966-01-17 1968-09-17 Zenith Radio Corp Mask electroforming process
US3449221A (en) * 1966-12-08 1969-06-10 Dynamics Res Corp Method of making a monometallic mask
US3742230A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask support substrate
DE2425464C3 (de) * 1974-05-27 1978-11-02 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von Dunnschicht-Aperturblenden für Korpuskularstrahlgeräte
DE2512086C3 (de) * 1975-03-19 1978-11-30 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung freitragender, dünner Metallstrukturen
US4037111A (en) * 1976-06-08 1977-07-19 Bell Telephone Laboratories, Incorporated Mask structures for X-ray lithography
DE2626851C3 (de) * 1976-06-15 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Masken für die Röntgenlithographie
DE3030742A1 (de) * 1980-08-14 1982-03-25 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur herstellung einer maske fuer die strukturerzeugung in lackschichten mittels roentgenstrahlen
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof
US4515876A (en) * 1982-07-17 1985-05-07 Nippon Telegraph & Telephone Public Corp. X-Ray lithography mask and method for fabricating the same

Also Published As

Publication number Publication date
ATE29601T1 (de) 1987-09-15
CA1261193A (en) 1989-09-26
US4528071A (en) 1985-07-09
EP0141335B1 (de) 1987-09-09
AU585841B2 (en) 1989-06-29
AU3464084A (en) 1985-05-02
DE3338717A1 (de) 1985-05-02
JPS60108851A (ja) 1985-06-14
DE3466088D1 (en) 1987-10-15
EP0141335A1 (de) 1985-05-15

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)