JPS5691234A - Manufacture of mask for x-ray exposure - Google Patents
Manufacture of mask for x-ray exposureInfo
- Publication number
- JPS5691234A JPS5691234A JP16809379A JP16809379A JPS5691234A JP S5691234 A JPS5691234 A JP S5691234A JP 16809379 A JP16809379 A JP 16809379A JP 16809379 A JP16809379 A JP 16809379A JP S5691234 A JPS5691234 A JP S5691234A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- plated
- mask
- undercoat
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 238000010521 absorption reaction Methods 0.000 abstract 3
- 239000004642 Polyimide Substances 0.000 abstract 1
- 238000003486 chemical etching Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000001020 plasma etching Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Abstract
PURPOSE:To obtain a mask with superior Au adhesion, etc. by forming a plated undercoat layer on a substrate, forming a resist pattern exposing the layer correspondingly to an X-ray absorption pattern on the layer, and plating the exposed part with Ni and Au in order. CONSTITUTION:Plated undercoat layer 2 of Cr, Ni or the like is formed on sub- strate 1 of polyimide or the like, and it is covered with resist layer 3 having plated undercoat exposed part 4 corresponding to an X-ray absorption pattern. Exposed part 4 is plated with Ni 5 and further plated with Au 6. Resist layer 3 is then removed, and undercoat layer 2 is also removed by chemical etching, gas plasma etching or other method to form X-ray absorption pattern 7. Etching mask 8 is attached to the back side of substrate 1, and window 9 is made to form pattern support layer 8. Since plated Au 6 exists on substrate 1 with undercoat layer 2 and plated Ni 5 in-between without using Au as layer 2, a mask with high adhesion and reliability is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16809379A JPS5691234A (en) | 1979-12-26 | 1979-12-26 | Manufacture of mask for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16809379A JPS5691234A (en) | 1979-12-26 | 1979-12-26 | Manufacture of mask for x-ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5691234A true JPS5691234A (en) | 1981-07-24 |
JPS631739B2 JPS631739B2 (en) | 1988-01-13 |
Family
ID=15861707
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16809379A Granted JPS5691234A (en) | 1979-12-26 | 1979-12-26 | Manufacture of mask for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5691234A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4599737A (en) * | 1982-09-16 | 1986-07-08 | Hitachi, Ltd. | X-ray mask with Ni pattern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5212002A (en) * | 1975-06-30 | 1977-01-29 | Ibm | Method of high aspect ratio mask |
JPS5312793A (en) * | 1976-07-23 | 1978-02-04 | Midori Anzen Kogyo | Oxygen generating apparatus |
JPS5329574A (en) * | 1976-08-31 | 1978-03-18 | Oki Electric Ind Co Ltd | Transmitting type photoelectric switch |
-
1979
- 1979-12-26 JP JP16809379A patent/JPS5691234A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5212002A (en) * | 1975-06-30 | 1977-01-29 | Ibm | Method of high aspect ratio mask |
JPS5312793A (en) * | 1976-07-23 | 1978-02-04 | Midori Anzen Kogyo | Oxygen generating apparatus |
JPS5329574A (en) * | 1976-08-31 | 1978-03-18 | Oki Electric Ind Co Ltd | Transmitting type photoelectric switch |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4599737A (en) * | 1982-09-16 | 1986-07-08 | Hitachi, Ltd. | X-ray mask with Ni pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS631739B2 (en) | 1988-01-13 |
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