CN110692147A - 用于真空蒸镀的掩膜板、蒸镀方法、显示装置及蒸镀设备 - Google Patents
用于真空蒸镀的掩膜板、蒸镀方法、显示装置及蒸镀设备 Download PDFInfo
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- CN110692147A CN110692147A CN201780091437.2A CN201780091437A CN110692147A CN 110692147 A CN110692147 A CN 110692147A CN 201780091437 A CN201780091437 A CN 201780091437A CN 110692147 A CN110692147 A CN 110692147A
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- Prior art keywords
- layer
- mask plate
- evaporation
- mask
- substrate
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Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 72
- 230000008020 evaporation Effects 0.000 title claims abstract description 69
- 238000007738 vacuum evaporation Methods 0.000 title claims abstract description 51
- 238000000034 method Methods 0.000 claims abstract description 61
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 239000011248 coating agent Substances 0.000 claims abstract description 27
- 238000000576 coating method Methods 0.000 claims abstract description 27
- 238000010521 absorption reaction Methods 0.000 claims description 17
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000002310 reflectometry Methods 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 137
- 238000004519 manufacturing process Methods 0.000 description 35
- 239000011247 coating layer Substances 0.000 description 32
- 238000002360 preparation method Methods 0.000 description 22
- 239000000463 material Substances 0.000 description 17
- 239000007888 film coating Substances 0.000 description 11
- 238000009501 film coating Methods 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 10
- 229910001111 Fine metal Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
用于真空蒸发镀膜的掩膜板、利用掩膜板进行蒸镀的方法、有机发光显示装置以及利用掩膜板进行蒸镀的设备。该掩膜板包括：衬底(100)；反射层(200)，反射层(200)设置在衬底(100)上，反射层(200)上具有镂空区域；吸热层(300)，吸热层(300)设置在衬底(100)具有反射层(200)的一侧且覆盖镂空区域。
Description
PCT国内申请，说明书已公开。
Claims (24)
- PCT国内申请，权利要求书已公开。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2017/116005 WO2019113852A1 (zh) | 2017-12-13 | 2017-12-13 | 用于真空蒸镀的掩膜板、蒸镀方法、显示装置及蒸镀设备 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110692147A true CN110692147A (zh) | 2020-01-14 |
Family
ID=66818844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780091437.2A Pending CN110692147A (zh) | 2017-12-13 | 2017-12-13 | 用于真空蒸镀的掩膜板、蒸镀方法、显示装置及蒸镀设备 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN110692147A (zh) |
| WO (1) | WO2019113852A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113637940A (zh) * | 2021-08-30 | 2021-11-12 | 重庆翰博显示科技研发中心有限公司 | 一种能够提高蒸镀品质的oled蒸镀用掩膜板及其应用方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6309799B1 (en) * | 1997-11-03 | 2001-10-30 | Schablonentechnik Kufstein Aktiengesellschaft | Process for producing a printing form |
| CN101378107A (zh) * | 2008-09-27 | 2009-03-04 | 彩虹集团公司 | 一种oled显示器件有机发光层形成方法 |
| CN103882374A (zh) * | 2014-03-03 | 2014-06-25 | 京东方科技集团股份有限公司 | 掩膜版、有机层加工方法、显示基板制备方法 |
| CN104934370A (zh) * | 2014-03-18 | 2015-09-23 | 三星显示有限公司 | 掩模、形成有机层图案的方法和制造显示器的方法 |
| CN105714249A (zh) * | 2016-04-19 | 2016-06-29 | 上海和辉光电有限公司 | 掩膜板、蒸镀装置及蒸镀方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090041314A (ko) * | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판 및 발광장치의 제조방법 |
| US8574709B2 (en) * | 2008-07-21 | 2013-11-05 | Semiconductor Energy Laboratory Co., Ltd. | Deposition donor substrate and method for manufacturing light-emitting device |
| CN103695842B (zh) * | 2013-12-31 | 2015-12-09 | 信利半导体有限公司 | 一种掩膜板及其制作方法 |
| CN106521412B (zh) * | 2016-11-30 | 2019-01-29 | 京东方科技集团股份有限公司 | 一种蒸镀掩模板及蒸镀方法 |
| CN106591776B (zh) * | 2016-12-28 | 2019-12-03 | 武汉华星光电技术有限公司 | 精细掩膜板及其制作方法 |
| CN106876612A (zh) * | 2017-02-23 | 2017-06-20 | 深圳市华星光电技术有限公司 | 一种oled器件的封装结构及其制备方法、金属掩膜板 |
-
2017
- 2017-12-13 WO PCT/CN2017/116005 patent/WO2019113852A1/zh active Application Filing
- 2017-12-13 CN CN201780091437.2A patent/CN110692147A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6309799B1 (en) * | 1997-11-03 | 2001-10-30 | Schablonentechnik Kufstein Aktiengesellschaft | Process for producing a printing form |
| CN101378107A (zh) * | 2008-09-27 | 2009-03-04 | 彩虹集团公司 | 一种oled显示器件有机发光层形成方法 |
| CN103882374A (zh) * | 2014-03-03 | 2014-06-25 | 京东方科技集团股份有限公司 | 掩膜版、有机层加工方法、显示基板制备方法 |
| CN104934370A (zh) * | 2014-03-18 | 2015-09-23 | 三星显示有限公司 | 掩模、形成有机层图案的方法和制造显示器的方法 |
| CN105714249A (zh) * | 2016-04-19 | 2016-06-29 | 上海和辉光电有限公司 | 掩膜板、蒸镀装置及蒸镀方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019113852A1 (zh) | 2019-06-20 |
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Address after: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province Applicant after: Shenzhen Ruoyu Technology Co.,Ltd. Address before: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province Applicant before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd. |
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Application publication date: 20200114 |
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