HK1105024A1 - Optical article and manufacturing method of the same - Google Patents

Optical article and manufacturing method of the same

Info

Publication number
HK1105024A1
HK1105024A1 HK07110235.7A HK07110235A HK1105024A1 HK 1105024 A1 HK1105024 A1 HK 1105024A1 HK 07110235 A HK07110235 A HK 07110235A HK 1105024 A1 HK1105024 A1 HK 1105024A1
Authority
HK
Hong Kong
Prior art keywords
manufacturing
same
optical article
article
optical
Prior art date
Application number
HK07110235.7A
Other languages
English (en)
Inventor
Keiichi Suzuki
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of HK1105024A1 publication Critical patent/HK1105024A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/586—Nitriding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Optical Integrated Circuits (AREA)
HK07110235.7A 2006-02-01 2007-09-20 Optical article and manufacturing method of the same HK1105024A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006024162 2006-02-01
JP2006024170 2006-02-01
JP2006024161 2006-02-01
JP2006275295A JP5135753B2 (ja) 2006-02-01 2006-10-06 光学物品

Publications (1)

Publication Number Publication Date
HK1105024A1 true HK1105024A1 (en) 2008-02-01

Family

ID=38180084

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07110235.7A HK1105024A1 (en) 2006-02-01 2007-09-20 Optical article and manufacturing method of the same

Country Status (5)

Country Link
US (1) US7880966B2 (de)
EP (1) EP1816489A3 (de)
JP (1) JP5135753B2 (de)
KR (1) KR100839720B1 (de)
HK (1) HK1105024A1 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4462273B2 (ja) * 2007-01-23 2010-05-12 セイコーエプソン株式会社 光学物品およびその製造方法
WO2009041580A1 (ja) 2007-09-28 2009-04-02 Nikon-Essilor Co., Ltd. 光学部品、及び光学部品の製造方法
ES2302661B1 (es) * 2008-02-14 2009-10-29 Indo Internacional S.A. Lente de base polimerica que comprende una capa endurecedora, una multicapa interferencial y una capa dura intercalada entre ambas, y procedimiento de fabricacion correspondiente.
JP5326407B2 (ja) * 2008-07-31 2013-10-30 セイコーエプソン株式会社 時計用カバーガラス、および時計
WO2010026887A1 (ja) * 2008-09-05 2010-03-11 株式会社シンクロン 成膜方法及び撥油性基材
CN101810050B (zh) * 2008-09-26 2011-12-28 富士电机株式会社 有机el器件及其制造方法
JP2010231172A (ja) * 2009-03-04 2010-10-14 Seiko Epson Corp 光学物品およびその製造方法
FR2949776B1 (fr) 2009-09-10 2013-05-17 Saint Gobain Performance Plast Element en couches pour l'encapsulation d'un element sensible
FR2949775B1 (fr) * 2009-09-10 2013-08-09 Saint Gobain Performance Plast Substrat de protection pour dispositif collecteur ou emetteur de rayonnement
JP2012032690A (ja) 2010-08-02 2012-02-16 Seiko Epson Corp 光学物品およびその製造方法
FR2973939A1 (fr) 2011-04-08 2012-10-12 Saint Gobain Element en couches pour l’encapsulation d’un element sensible
DE102011007557B4 (de) 2011-04-16 2023-09-28 EvoChem Advanced Materials GmbH Verfahren zur Steigerung der Wischfestigkeit bzw. Kratzfestigkeit von Kunststoffoberflächen
FR2975507B1 (fr) * 2011-05-16 2014-01-10 Essilor Int Lentille ophtalmique anti-reflets et son procede de fabrication
CN102207597B (zh) * 2011-05-27 2012-12-19 宁波永新光学股份有限公司 一种高硬度低摩擦的光学窗口器件
BR112016012481B1 (pt) 2014-02-20 2022-05-10 Halliburton Energy Services, Inc Elemento computacional integrado, dispositivo de computação óptica e método de fabricar um elemento computacional integrado
CN106680905A (zh) 2015-11-05 2017-05-17 大金工业株式会社 具有表面处理层的物品
JP6278055B2 (ja) * 2016-04-01 2018-02-14 セイコーエプソン株式会社 カバー部材、および携帯電話
JP6372590B2 (ja) * 2017-05-08 2018-08-15 セイコーエプソン株式会社 カバー部材、および携帯情報機器
EP3759530A1 (de) * 2018-03-02 2021-01-06 Corning Incorporated Antireflektierende beschichtungen und gegenstände und verfahren zu deren herstellung
EP3636796A1 (de) * 2018-10-10 2020-04-15 Comadur S.A. Härtungsverfahren einer antireflex-behandlung, die auf ein transparentes substrat aufgebracht wird, und transparentes substrat, das eine gehärtete antireflex-behandlung umfasst
US11314004B2 (en) * 2019-04-08 2022-04-26 Visera Technologies Company Limited Optical filters and methods for forming the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4609267A (en) * 1980-12-22 1986-09-02 Seiko Epson Corporation Synthetic resin lens and antireflection coating
JPH0384501A (ja) 1989-08-29 1991-04-10 Ricoh Co Ltd 反射防止膜
FR2673633B1 (fr) 1991-03-06 1993-06-11 Air Liquide Revetement multicouche pour substrat polycarbonate.
JPH05214515A (ja) 1992-02-03 1993-08-24 Nissin Electric Co Ltd 窒化珪素薄膜の形成方法
US5674783A (en) 1996-04-01 1997-10-07 Taiwan Semiconductor Manufacturing Company, Ltd. Method for improving the chemical-mechanical polish (CMP) uniformity of insulator layers
US5869149A (en) 1997-06-30 1999-02-09 Lam Research Corporation Method for preparing nitrogen surface treated fluorine doped silicon dioxide films
TW408383B (en) 1999-05-04 2000-10-11 United Microelectronics Corp The method of improving the degree of stability of the anti-reflection coating (ARC) film layer
FR2793889B1 (fr) 1999-05-20 2002-06-28 Saint Gobain Vitrage Substrat transparent a revetement anti-reflets
JP2002139609A (ja) * 2000-10-30 2002-05-17 Sharp Corp 銀の増反射膜およびそれを用いたカラー液晶表示装置
FR2817267B1 (fr) * 2000-11-28 2003-08-29 Essilor Int Procede de depot de couche anti-reflets a froid sur substrat organique
JP2002221601A (ja) * 2001-01-25 2002-08-09 Toppan Printing Co Ltd 反射防止積層体
US6664177B1 (en) 2002-02-01 2003-12-16 Taiwan Semiconductor Manufacturing Company Dielectric ARC scheme to improve photo window in dual damascene process
US7713638B2 (en) * 2002-09-14 2010-05-11 Schott Ag Layer system
JP2004170523A (ja) * 2002-11-18 2004-06-17 Sekisui Chem Co Ltd 反射防止フイルム
JP2004245907A (ja) * 2003-02-12 2004-09-02 Konica Minolta Holdings Inc 防汚層を有する光学材料とそれを表面保護層として用いた画像表示装置
TW200420979A (en) * 2003-03-31 2004-10-16 Zeon Corp Protective film for polarizing plate and method for preparation thereof
FR2858816B1 (fr) * 2003-08-13 2006-11-17 Saint Gobain Substrat transparent comportant un revetement antireflet
JP4581608B2 (ja) 2003-12-02 2010-11-17 セイコーエプソン株式会社 薄膜の製造方法、光学部品の製造方法および成膜装置
US20060130891A1 (en) * 2004-10-29 2006-06-22 Carlson David E Back-contact photovoltaic cells
JP4462273B2 (ja) * 2007-01-23 2010-05-12 セイコーエプソン株式会社 光学物品およびその製造方法

Also Published As

Publication number Publication date
KR100839720B1 (ko) 2008-06-19
EP1816489A2 (de) 2007-08-08
US20100328605A1 (en) 2010-12-30
JP2007233333A (ja) 2007-09-13
US7880966B2 (en) 2011-02-01
JP5135753B2 (ja) 2013-02-06
EP1816489A3 (de) 2008-09-10
KR20070079319A (ko) 2007-08-06

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20180130