HK1101217A1 - Electron beam irradiation device - Google Patents

Electron beam irradiation device

Info

Publication number
HK1101217A1
HK1101217A1 HK07109212.6A HK07109212A HK1101217A1 HK 1101217 A1 HK1101217 A1 HK 1101217A1 HK 07109212 A HK07109212 A HK 07109212A HK 1101217 A1 HK1101217 A1 HK 1101217A1
Authority
HK
Hong Kong
Prior art keywords
electron beam
beam irradiation
irradiation device
electron
irradiation
Prior art date
Application number
HK07109212.6A
Other languages
English (en)
Inventor
Nakao Seitaro
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Printing Co Ltd filed Critical Dainippon Printing Co Ltd
Publication of HK1101217A1 publication Critical patent/HK1101217A1/xx

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Coating Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
HK07109212.6A 2004-03-09 2007-08-23 Electron beam irradiation device HK1101217A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004065263 2004-03-09
PCT/JP2005/004092 WO2005086176A1 (ja) 2004-03-09 2005-03-09 電子線照射装置

Publications (1)

Publication Number Publication Date
HK1101217A1 true HK1101217A1 (en) 2007-10-12

Family

ID=34918230

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07109212.6A HK1101217A1 (en) 2004-03-09 2007-08-23 Electron beam irradiation device

Country Status (6)

Country Link
US (1) US7435980B2 (ko)
JP (1) JP4183727B2 (ko)
KR (1) KR101098085B1 (ko)
CN (1) CN1922696B (ko)
HK (1) HK1101217A1 (ko)
WO (1) WO2005086176A1 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE526700C2 (sv) * 2003-06-19 2005-10-25 Tetra Laval Holdings & Finance Anordning och förfarande för sterilisering av en materialbana med elektronbestrålning
JP4641844B2 (ja) * 2005-03-25 2011-03-02 大日本印刷株式会社 電子線照射装置
JP4697250B2 (ja) * 2008-03-21 2011-06-08 株式会社Ｉｈｉ 地下式電子線照射設備
US8106369B2 (en) * 2009-03-10 2012-01-31 Pct Engineered Systems, Llc Electron beam web irradiation apparatus and process
JP5802164B2 (ja) * 2012-03-31 2015-10-28 株式会社巴川製紙所 光照射装置、ハードコートフィルム製造装置、および積層フィルムの製造方法
EP4216680A1 (en) * 2012-04-27 2023-07-26 Triumf Inc. Processes, systems, and apparatus for cyclotron production of technetium-99m
WO2017035307A1 (en) * 2015-08-26 2017-03-02 Energy Sciences Inc. Electron beam apparatus with adjustable air gap
EP3163983B1 (en) * 2015-10-28 2020-08-05 Vito NV Apparatus for indirect atmospheric pressure plasma processing
CN107971191A (zh) * 2017-12-04 2018-05-01 江苏久瑞高能电子有限公司 一种用于涂层固化的电子加速器
US11097310B2 (en) * 2019-03-28 2021-08-24 Toyota Jidosha Kabushiki Kaisha Paint hardening device and paint hardening method
CN113409981B (zh) * 2021-06-18 2023-05-05 中国科学院近代物理研究所 一种用于电子束辐照加工的多面辐照方法及系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0781035B2 (ja) 1986-06-27 1995-08-30 豊田合成株式会社 クロロプレンゴム配合物
JPH04127597A (ja) 1990-09-19 1992-04-28 Fujitsu Ltd 表面実装型部品の浸漬半田付方法
JP3241064B2 (ja) 1991-07-05 2001-12-25 住友軽金属工業株式会社 耐軟化性に優れた飲料缶蓋用アルミニウム合金硬質板の製造方法
JPH04127597U (ja) * 1991-05-13 1992-11-20 日新ハイボルテージ株式会社 電子線照射装置
JP2580085Y2 (ja) * 1991-07-22 1998-09-03 日新ハイボルテージ株式会社 電子線硬化装置
JPH0536212A (ja) 1991-07-29 1993-02-12 Matsushita Electric Ind Co Ltd クロツク変換回路
JPH0560899A (ja) 1991-09-02 1993-03-12 Nissin High Voltage Co Ltd 電子線照射装置
JP2534965B2 (ja) 1992-02-18 1996-09-18 東洋エンジニアリング株式会社 ホ―スユニット移送接続と回分生産システム
JP4641844B2 (ja) * 2005-03-25 2011-03-02 大日本印刷株式会社 電子線照射装置

Also Published As

Publication number Publication date
CN1922696A (zh) 2007-02-28
JP4183727B2 (ja) 2008-11-19
US7435980B2 (en) 2008-10-14
JPWO2005086176A1 (ja) 2008-01-24
US20070205381A1 (en) 2007-09-06
CN1922696B (zh) 2010-05-26
KR101098085B1 (ko) 2011-12-26
WO2005086176A1 (ja) 2005-09-15
KR20060129036A (ko) 2006-12-14

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220309