HK1065644A1 - Structure and method of making a high performance semiconductor device having a narrow doping profile - Google Patents

Structure and method of making a high performance semiconductor device having a narrow doping profile

Info

Publication number
HK1065644A1
HK1065644A1 HK04108436.1A HK04108436A HK1065644A1 HK 1065644 A1 HK1065644 A1 HK 1065644A1 HK 04108436 A HK04108436 A HK 04108436A HK 1065644 A1 HK1065644 A1 HK 1065644A1
Authority
HK
Hong Kong
Prior art keywords
making
semiconductor device
high performance
doping profile
performance semiconductor
Prior art date
Application number
HK04108436.1A
Other languages
English (en)
Inventor
Gary H Loechelt
Original Assignee
Semiconductor Components Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Components Ind filed Critical Semiconductor Components Ind
Publication of HK1065644A1 publication Critical patent/HK1065644A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66242—Heterojunction transistors [HBT]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1004—Base region of bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66272—Silicon vertical transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/732—Vertical transistors
    • H01L29/7322—Vertical transistors having emitter-base and base-collector junctions leaving at the same surface of the body, e.g. planar transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
HK04108436.1A 2002-12-02 2004-10-28 Structure and method of making a high performance semiconductor device having a narrow doping profile HK1065644A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/307,590 US6764918B2 (en) 2002-12-02 2002-12-02 Structure and method of making a high performance semiconductor device having a narrow doping profile

Publications (1)

Publication Number Publication Date
HK1065644A1 true HK1065644A1 (en) 2005-02-25

Family

ID=32312201

Family Applications (1)

Application Number Title Priority Date Filing Date
HK04108436.1A HK1065644A1 (en) 2002-12-02 2004-10-28 Structure and method of making a high performance semiconductor device having a narrow doping profile

Country Status (5)

Country Link
US (1) US6764918B2 (xx)
JP (1) JP4807931B2 (xx)
CN (1) CN100463217C (xx)
DE (1) DE10352765B4 (xx)
HK (1) HK1065644A1 (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005069378A2 (en) * 2004-01-10 2005-07-28 Hvvi Semiconductors, Inc. Power semiconductor device and method therefor
US7923339B2 (en) * 2004-12-06 2011-04-12 Nxp B.V. Method of producing an epitaxial layer on semiconductor substrate and device produced with such a method
US8530963B2 (en) * 2005-01-06 2013-09-10 Estivation Properties Llc Power semiconductor device and method therefor
US7439558B2 (en) * 2005-11-04 2008-10-21 Atmel Corporation Method and system for controlled oxygen incorporation in compound semiconductor films for device performance enhancement
US7300849B2 (en) * 2005-11-04 2007-11-27 Atmel Corporation Bandgap engineered mono-crystalline silicon cap layers for SiGe HBT performance enhancement
US7651919B2 (en) * 2005-11-04 2010-01-26 Atmel Corporation Bandgap and recombination engineered emitter layers for SiGe HBT performance optimization
US20070102729A1 (en) * 2005-11-04 2007-05-10 Enicks Darwin G Method and system for providing a heterojunction bipolar transistor having SiGe extensions
US7656003B2 (en) * 2006-08-25 2010-02-02 Hvvi Semiconductors, Inc Electrical stress protection apparatus and method of manufacture
US7888746B2 (en) * 2006-12-15 2011-02-15 Hvvi Semiconductors, Inc. Semiconductor structure and method of manufacture
US8471307B2 (en) * 2008-06-13 2013-06-25 Texas Instruments Incorporated In-situ carbon doped e-SiGeCB stack for MOS transistor
EP2202795A1 (en) * 2008-12-24 2010-06-30 S.O.I. TEC Silicon Method for fabricating a semiconductor substrate and semiconductor substrate
EP2581930B1 (en) * 2011-10-11 2014-06-04 Nxp B.V. Bipolar transistor manufacturing method, bipolar transistor and integrated circuit
US9466698B2 (en) * 2013-03-15 2016-10-11 Semiconductor Components Industries, Llc Electronic device including vertical conductive regions and a process of forming the same
CN103325680A (zh) * 2013-04-24 2013-09-25 苏州硅智源微电子有限公司 提高集成电路双极型三极管抗辐射的方法
TWI743788B (zh) * 2020-05-18 2021-10-21 力晶積成電子製造股份有限公司 電晶體及其製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05293328A (ja) * 1992-04-17 1993-11-09 Nitto Denko Corp 可燃性有機蒸気含有空気の処理方法
US5365089A (en) * 1992-12-23 1994-11-15 International Business Machines Corporation Double heterojunction bipolar transistor and the method of manufacture therefor
JP2611640B2 (ja) * 1993-12-20 1997-05-21 日本電気株式会社 ヘテロ接合バイポーラトランジスタ
JP3549408B2 (ja) * 1998-09-03 2004-08-04 松下電器産業株式会社 バイポーラトランジスタ
CN1111313C (zh) * 1999-07-02 2003-06-11 北京工业大学 异质结双极型晶体管
US6316795B1 (en) * 2000-04-03 2001-11-13 Hrl Laboratories, Llc Silicon-carbon emitter for silicon-germanium heterojunction bipolar transistors
US6387768B1 (en) * 2000-08-29 2002-05-14 Semiconductor Components Industries Llc Method of manufacturing a semiconductor component and semiconductor component thereof
US6362065B1 (en) 2001-02-26 2002-03-26 Texas Instruments Incorporated Blocking of boron diffusion through the emitter-emitter poly interface in PNP HBTs through use of a SiC layer at the top of the emitter epi layer
US6506659B2 (en) * 2001-03-17 2003-01-14 Newport Fab, Llc High performance bipolar transistor
US7064416B2 (en) * 2001-11-16 2006-06-20 International Business Machines Corporation Semiconductor device and method having multiple subcollectors formed on a common wafer

Also Published As

Publication number Publication date
US20040106264A1 (en) 2004-06-03
CN100463217C (zh) 2009-02-18
CN1505168A (zh) 2004-06-16
JP2004186675A (ja) 2004-07-02
DE10352765B4 (de) 2013-03-28
JP4807931B2 (ja) 2011-11-02
DE10352765A1 (de) 2004-06-09
US6764918B2 (en) 2004-07-20

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20201126