HK1039967B - 以組成梯度沉積氧化物和氮化物的方法 - Google Patents

以組成梯度沉積氧化物和氮化物的方法

Info

Publication number
HK1039967B
HK1039967B HK02101201.1A HK02101201A HK1039967B HK 1039967 B HK1039967 B HK 1039967B HK 02101201 A HK02101201 A HK 02101201A HK 1039967 B HK1039967 B HK 1039967B
Authority
HK
Hong Kong
Prior art keywords
metalloid
metal
deposition
result
precursors
Prior art date
Application number
HK02101201.1A
Other languages
English (en)
Other versions
HK1039967A1 (en
Inventor
Yoshihide Senzaki
John Anthony Thomas Norman
Arthur Kenneth Hochberg
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of HK1039967A1 publication Critical patent/HK1039967A1/xx
Publication of HK1039967B publication Critical patent/HK1039967B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/029—Graded interfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Saccharide Compounds (AREA)
  • Ceramic Products (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
HK02101201.1A 2000-04-10 2002-02-19 以組成梯度沉積氧化物和氮化物的方法 HK1039967B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/546,867 US6537613B1 (en) 2000-04-10 2000-04-10 Process for metal metalloid oxides and nitrides with compositional gradients

Publications (2)

Publication Number Publication Date
HK1039967A1 HK1039967A1 (en) 2002-05-17
HK1039967B true HK1039967B (zh) 2007-09-14

Family

ID=24182359

Family Applications (1)

Application Number Title Priority Date Filing Date
HK02101201.1A HK1039967B (zh) 2000-04-10 2002-02-19 以組成梯度沉積氧化物和氮化物的方法

Country Status (8)

Country Link
US (1) US6537613B1 (zh)
EP (1) EP1146140B1 (zh)
JP (1) JP3588334B2 (zh)
KR (1) KR100418461B1 (zh)
AT (1) ATE358191T1 (zh)
DE (1) DE60127486T2 (zh)
HK (1) HK1039967B (zh)
TW (1) TWI242055B (zh)

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Also Published As

Publication number Publication date
JP3588334B2 (ja) 2004-11-10
HK1039967A1 (en) 2002-05-17
EP1146140B1 (en) 2007-03-28
EP1146140A1 (en) 2001-10-17
US6537613B1 (en) 2003-03-25
TWI242055B (en) 2005-10-21
KR100418461B1 (ko) 2004-02-14
KR20010090776A (ko) 2001-10-19
JP2002033317A (ja) 2002-01-31
DE60127486D1 (de) 2007-05-10
DE60127486T2 (de) 2007-12-13
ATE358191T1 (de) 2007-04-15

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Legal Events

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20110404