HK1002939A1 - Waterborne photoresists having polysiloxanes - Google Patents

Waterborne photoresists having polysiloxanes

Info

Publication number
HK1002939A1
HK1002939A1 HK98102010A HK98102010A HK1002939A1 HK 1002939 A1 HK1002939 A1 HK 1002939A1 HK 98102010 A HK98102010 A HK 98102010A HK 98102010 A HK98102010 A HK 98102010A HK 1002939 A1 HK1002939 A1 HK 1002939A1
Authority
HK
Hong Kong
Prior art keywords
compsn
polysiloxanes
photoresists
waterborne
photoimageable
Prior art date
Application number
HK98102010A
Other languages
English (en)
Inventor
Robert K Barr
Gene R Derrico
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/199,037 external-priority patent/US5364737A/en
Application filed by Morton Int Inc filed Critical Morton Int Inc
Publication of HK1002939A1 publication Critical patent/HK1002939A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Silicon Polymers (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Adornments (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
HK98102010A 1994-01-25 1998-03-11 Waterborne photoresists having polysiloxanes HK1002939A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/221,313 US5387494A (en) 1994-01-25 1994-03-30 Waterborne photoresists having polysiloxanes

Publications (1)

Publication Number Publication Date
HK1002939A1 true HK1002939A1 (en) 1998-09-25

Family

ID=27392160

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98102010A HK1002939A1 (en) 1994-01-25 1998-03-11 Waterborne photoresists having polysiloxanes

Country Status (12)

Country Link
EP (1) EP0664491B1 (pt)
JP (1) JP2703731B2 (pt)
CN (1) CN1072812C (pt)
AT (1) ATE162894T1 (pt)
AU (1) AU661438B1 (pt)
BR (1) BR9500255A (pt)
CA (1) CA2133149C (pt)
DE (1) DE69408295T2 (pt)
ES (1) ES2117216T3 (pt)
HK (1) HK1002939A1 (pt)
IL (1) IL112009A (pt)
SG (1) SG43816A1 (pt)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4397601B2 (ja) * 2003-02-06 2010-01-13 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物
TW200622486A (en) * 2004-10-14 2006-07-01 Sumitomo Chemical Co Radiation sensitive resin composition
TWI377440B (en) * 2004-10-14 2012-11-21 Sumitomo Chemical Co Radiation sensitive resin composition
CN100426015C (zh) * 2006-02-15 2008-10-15 虹创科技股份有限公司 彩色滤光片分隔墙及其制造方法,彩色滤光片及其制造方法
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition
EP2883109A1 (en) * 2012-08-09 2015-06-17 3M Innovative Properties Company Photocurable compositions

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
DE3022473A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
US4762747A (en) * 1986-07-29 1988-08-09 Industrial Technology Research Institute Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP3240769B2 (ja) * 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JPH06258832A (ja) * 1992-11-17 1994-09-16 W R Grace & Co 感光性樹脂組成物
JPH06230573A (ja) * 1993-01-29 1994-08-19 Japan Synthetic Rubber Co Ltd レジスト組成物
DE69502741T2 (de) * 1994-01-10 1998-10-01 Du Pont Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

Also Published As

Publication number Publication date
EP0664491B1 (en) 1998-01-28
JPH07234506A (ja) 1995-09-05
DE69408295D1 (de) 1998-03-05
ES2117216T3 (es) 1998-08-01
SG43816A1 (en) 1997-11-14
ATE162894T1 (de) 1998-02-15
IL112009A (en) 1999-03-12
BR9500255A (pt) 1995-11-14
JP2703731B2 (ja) 1998-01-26
EP0664491A1 (en) 1995-07-26
AU661438B1 (en) 1995-07-20
CA2133149A1 (en) 1995-07-26
DE69408295T2 (de) 1998-05-14
CA2133149C (en) 1999-05-11
IL112009A0 (en) 1995-03-15
CN1106936A (zh) 1995-08-16
CN1072812C (zh) 2001-10-10

Similar Documents

Publication Publication Date Title
AU660392B1 (en) Waterborne photoresists having associate thickeners
ATE282639T1 (de) Herstellung von schlagfesten vinylaromatischen polymer aus einem kautschuk mit einer gruppe zur erzeugung eines freien, stabilen radikal
CA2197496A1 (fr) Composition comprenant une dispersion de particules de polymeres dans un milieu non aqueux
ZA951684B (en) Coating composition based on a hydroxyl group-containing polyacrylate resin and its use in processes for producing a multicoat finish
ES8308295A1 (es) Procedimiento para la fabricacion de bases soportadoras para maquinaria en general.
TW374791B (en) Aqueous antireflective coatings for photoresist composition
TW333547B (en) Melt-processed blends
AU661438B1 (en) Waterborne photoresists having polysiloxanes
HUT77330A (hu) Poliolefin-poliakrilát alapú termoplasztikus elasztomer és alkalmazása
BR9606785A (pt) Adesivo endurecível aerobicamente
DE69221678D1 (de) Entfernung von Restmonomere aus Polymere
HK1005069A1 (en) Waterborne photoresists having binders neutralized with amino acrylates
ATE182991T1 (de) Verfahren zur herstellung eines desodorisierten harzes für einen trockentoner
CA2208728A1 (en) Starch graft poly(meth)acrylate blast media
JPS51127187A (en) A process and an apparatus for recovering monomers
TW242637B (pt)
ZA97966B (en) Methods for inhibiting the polymerization of ethylenically unsaturated monomers.
MX9703906A (es) Un metodo para inhibir la polimerizacion prematura de monomeros aromaticos de vinilo.
CA2036422A1 (en) Process for preparing stabilized polymer dispersion
JPS5659820A (en) Hydrophilic resin composition

Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20041027