HK1002870A1 - Process for the corrosion protection of copper or copper alloys - Google Patents

Process for the corrosion protection of copper or copper alloys

Info

Publication number
HK1002870A1
HK1002870A1 HK98102036A HK98102036A HK1002870A1 HK 1002870 A1 HK1002870 A1 HK 1002870A1 HK 98102036 A HK98102036 A HK 98102036A HK 98102036 A HK98102036 A HK 98102036A HK 1002870 A1 HK1002870 A1 HK 1002870A1
Authority
HK
Hong Kong
Prior art keywords
copper
pct
corrosion protection
sec
aryl
Prior art date
Application number
HK98102036A
Other languages
English (en)
Inventor
John Reynolds
Andrew Macintosh
Keith William Peter White
Anthony Williams
Original Assignee
Cookson Group Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB9426087.4A external-priority patent/GB9426087D0/en
Priority claimed from GBGB9507419.1A external-priority patent/GB9507419D0/en
Application filed by Cookson Group Plc filed Critical Cookson Group Plc
Publication of HK1002870A1 publication Critical patent/HK1002870A1/xx

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Chemical Treatment Of Metals (AREA)
  • ing And Chemical Polishing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
HK98102036A 1994-12-23 1998-03-12 Process for the corrosion protection of copper or copper alloys HK1002870A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9426087.4A GB9426087D0 (en) 1994-12-23 1994-12-23 Process for the surface treatment of copper or copper alloys
GBGB9507419.1A GB9507419D0 (en) 1995-04-10 1995-04-10 Process for the surface treatment of copper or copper alloys
PCT/GB1995/002912 WO1996020295A1 (en) 1994-12-23 1995-12-13 Process for the corrosion protection of copper or copper alloys

Publications (1)

Publication Number Publication Date
HK1002870A1 true HK1002870A1 (en) 1998-09-25

Family

ID=26306247

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98102036A HK1002870A1 (en) 1994-12-23 1998-03-12 Process for the corrosion protection of copper or copper alloys

Country Status (12)

Country Link
US (1) US6158491A (xx)
EP (1) EP0799327B1 (xx)
JP (1) JPH10511431A (xx)
KR (1) KR100402899B1 (xx)
CN (1) CN1057350C (xx)
AT (1) ATE178953T1 (xx)
AU (1) AU4183896A (xx)
DE (1) DE69509124T2 (xx)
FI (1) FI972692A (xx)
HK (1) HK1002870A1 (xx)
TW (1) TW304208B (xx)
WO (1) WO1996020295A1 (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1091173C (zh) * 1999-09-01 2002-09-18 中国科学院金属研究所 一种清除铜及铜合金表面锈蚀的综合防护处理剂
DE10026010A1 (de) * 2000-05-25 2001-11-29 Basf Ag Hydraulische Flüssigkeiten mit verbessertem Korrosionsschutz für Buntmetalle
WO2002000965A1 (fr) * 2000-06-28 2002-01-03 Koito, Tatsuya Agent anticorrosion
WO2002041837A2 (en) * 2000-11-22 2002-05-30 Rxkinetix, Inc. Treatment of mucositis
DE10117647A1 (de) * 2001-04-09 2002-10-17 Basf Ag Hydraulische Flüssigkeiten mit verbessertem Korrosionsschutz
US8349393B2 (en) 2004-07-29 2013-01-08 Enthone Inc. Silver plating in electronics manufacture
KR100668129B1 (ko) * 2005-07-07 2007-01-11 백양케미칼(주) 프리플럭스 조성물
CN1955341B (zh) * 2005-10-25 2011-09-07 李碧洁 适用于多次高温无铅焊接的铜面防氧化剂
DE102006041292A1 (de) * 2006-09-01 2008-03-06 Henkel Kgaa Wasserstoffperoxid-Aktivierung mit N-Heterocyclen
CN101575704B (zh) * 2009-06-12 2011-01-26 林原标 铜及铜合金表面处理剂
CN101824621A (zh) * 2010-04-12 2010-09-08 海宁市科泰克金属表面技术有限公司 一种高性能铜、镍保护剂
US8961678B2 (en) * 2012-12-20 2015-02-24 Rohm And Haas Electronic Materials Llc Organic solderability preservative and method
KR20200093710A (ko) * 2013-03-16 2020-08-05 피알시-데소토 인터내쇼날, 인코포레이티드 부식 억제제로서의 금속 착화제
EP3314038B1 (en) * 2015-05-28 2021-12-29 Ecolab Usa Inc. Purine-based corrosion inhibitors
MX2017015290A (es) 2015-05-28 2018-02-19 Ecolab Usa Inc Derivados de pirazol solubles en agua como inhibidores de corrosion.
ES2899038T3 (es) 2015-05-28 2022-03-09 Ecolab Usa Inc Nuevos inhibidores de la corrosión
EP4234760A1 (en) 2015-05-28 2023-08-30 Ecolab USA Inc. Formulation comprising 2-substituted benzimidazole or 2-substituted imidazole corrosion inhibitors
KR102334425B1 (ko) * 2019-11-21 2021-12-01 엘티씨 (주) 디스플레이 제조용 포토레지스트 박리액 조성물

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5233583B2 (xx) * 1972-06-15 1977-08-29
JPS537902B2 (xx) * 1972-12-21 1978-03-23
JPS533975B2 (xx) * 1973-10-17 1978-02-13 Tokai Electro Chemical Co
US4740320A (en) * 1985-07-22 1988-04-26 The Dow Chemical Company Process for preventing corrosion of a metal in contact with a well fluid

Also Published As

Publication number Publication date
AU4183896A (en) 1996-07-19
WO1996020295A1 (en) 1996-07-04
DE69509124T2 (de) 1999-11-25
TW304208B (xx) 1997-05-01
JPH10511431A (ja) 1998-11-04
DE69509124D1 (de) 1999-05-20
FI972692A (fi) 1997-08-22
FI972692A0 (fi) 1997-06-23
KR100402899B1 (ko) 2004-06-12
CN1057350C (zh) 2000-10-11
EP0799327B1 (en) 1999-04-14
EP0799327A1 (en) 1997-10-08
CN1175286A (zh) 1998-03-04
ATE178953T1 (de) 1999-04-15
US6158491A (en) 2000-12-12

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20031213

PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)