GB988115A - Method of fabricating semiconductor devices - Google Patents
Method of fabricating semiconductor devicesInfo
- Publication number
- GB988115A GB988115A GB25299/63A GB2529963A GB988115A GB 988115 A GB988115 A GB 988115A GB 25299/63 A GB25299/63 A GB 25299/63A GB 2529963 A GB2529963 A GB 2529963A GB 988115 A GB988115 A GB 988115A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wafer
- photoresist
- layer
- portions
- silicon oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10W20/069—
-
- H10P95/00—
-
- H10W20/058—
-
- H10W74/43—
-
- H10W74/47—
Landscapes
- Weting (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US21369562A | 1962-07-31 | 1962-07-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB988115A true GB988115A (en) | 1965-04-07 |
Family
ID=22796141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB25299/63A Expired GB988115A (en) | 1962-07-31 | 1963-06-25 | Method of fabricating semiconductor devices |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE635672A (cg-RX-API-DMAC10.html) |
| DE (1) | DE1246127B (cg-RX-API-DMAC10.html) |
| GB (1) | GB988115A (cg-RX-API-DMAC10.html) |
| NL (1) | NL295980A (cg-RX-API-DMAC10.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0050415A1 (en) * | 1980-09-15 | 1982-04-28 | Photon Power Inc. | Process for forming a pattern of transparent conductive material |
| EP0072933A1 (en) * | 1981-08-24 | 1983-03-02 | International Business Machines Corporation | Method for photolithographic pattern generation in a photoresist layer |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3386864A (en) * | 1963-12-09 | 1968-06-04 | Ibm | Semiconductor-metal-semiconductor structure |
| DE2929739C2 (de) * | 1979-07-23 | 1984-10-31 | Brown, Boveri & Cie Ag, 6800 Mannheim | Verfahren zum Entfernen eines Teiles einer Metallschicht von einer Halbleiterscheibe |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL204955A (cg-RX-API-DMAC10.html) * | 1956-02-28 | |||
| FR77789E (fr) * | 1957-08-12 | 1962-04-20 | Int Standard Electric Corp | Perfectionnements aux dispositifs semi-conducteurs à jonction et méthode de fabrication de ceux-ci |
| BE570279A (cg-RX-API-DMAC10.html) * | 1957-08-12 | 1900-01-01 | ||
| US2981877A (en) * | 1959-07-30 | 1961-04-25 | Fairchild Semiconductor | Semiconductor device-and-lead structure |
-
0
- BE BE635672D patent/BE635672A/xx unknown
- NL NL295980D patent/NL295980A/xx unknown
-
1963
- 1963-06-25 GB GB25299/63A patent/GB988115A/en not_active Expired
- 1963-07-15 DE DER35674A patent/DE1246127B/de active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0050415A1 (en) * | 1980-09-15 | 1982-04-28 | Photon Power Inc. | Process for forming a pattern of transparent conductive material |
| EP0072933A1 (en) * | 1981-08-24 | 1983-03-02 | International Business Machines Corporation | Method for photolithographic pattern generation in a photoresist layer |
Also Published As
| Publication number | Publication date |
|---|---|
| NL295980A (cg-RX-API-DMAC10.html) | |
| BE635672A (cg-RX-API-DMAC10.html) | |
| DE1246127B (de) | 1967-08-03 |
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