GB722866A - Improvements in or relating to apparatus applying, by vaporisation in vacuo, layers of vaporisable substance - Google Patents

Improvements in or relating to apparatus applying, by vaporisation in vacuo, layers of vaporisable substance

Info

Publication number
GB722866A
GB722866A GB28113/52A GB2811352A GB722866A GB 722866 A GB722866 A GB 722866A GB 28113/52 A GB28113/52 A GB 28113/52A GB 2811352 A GB2811352 A GB 2811352A GB 722866 A GB722866 A GB 722866A
Authority
GB
United Kingdom
Prior art keywords
vacuo
coating
vaporisation
relating
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB28113/52A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electrical Industries Ltd
Original Assignee
Philips Electrical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electrical Industries Ltd filed Critical Philips Electrical Industries Ltd
Publication of GB722866A publication Critical patent/GB722866A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

722,866. Coating by vapour deposition. PHILIPS ELECTRICAL INDUSTRIES, Ltd. Nov. 7, 1952 [Nov. 10, 1951], No. 28113/52. Class 82 (2). Apparatus for coating bodies such as mirrors and lenses with a layer of metal or non-metallic substance by deposition from vapour in vacuo comprises a vacuum chamber in which the object to be coated is arranged, and a container consisting of a hollow tube 5 divided into two parts by a transverse wall, the part 6 being closed by a porous or reticulated cover 7 and adapted to contain the material 8 to be evaporated, and the other part containing a heating element 9 to evaporate the material. The cover 7 may be porous and of sintered metal powder, or consist of metal gauze with apertures up to some tenths of a millimetre. Coating materials referred to are Al, Cu, Ag, ZnS, MgF 2 , silica, albite and cryolite.
GB28113/52A 1951-11-10 1952-11-07 Improvements in or relating to apparatus applying, by vaporisation in vacuo, layers of vaporisable substance Expired GB722866A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL309574X 1951-11-10

Publications (1)

Publication Number Publication Date
GB722866A true GB722866A (en) 1955-02-02

Family

ID=19783585

Family Applications (1)

Application Number Title Priority Date Filing Date
GB28113/52A Expired GB722866A (en) 1951-11-10 1952-11-07 Improvements in or relating to apparatus applying, by vaporisation in vacuo, layers of vaporisable substance

Country Status (5)

Country Link
BE (1) BE515457A (en)
CH (1) CH309574A (en)
FR (1) FR1069111A (en)
GB (1) GB722866A (en)
NL (1) NL78611C (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3110620A (en) * 1960-06-28 1963-11-12 Ibm Method of making plural layer thin film devices
US3117210A (en) * 1959-07-13 1964-01-07 Wisconsin Alumni Res Found Apparatus for evaporating materials
US3367304A (en) * 1967-03-13 1968-02-06 Dow Corning Deposition chamber for manufacture of refractory coated filaments
US3427432A (en) * 1966-06-10 1969-02-11 Granville Phillips Co Sublimation device
US3603284A (en) * 1970-01-02 1971-09-07 Ibm Vapor deposition apparatus
US3805736A (en) * 1971-12-27 1974-04-23 Ibm Apparatus for diffusion limited mass transport
US4146774A (en) * 1975-11-14 1979-03-27 Hughes Aircraft Company Planar reactive evaporation apparatus for the deposition of compound semiconducting films

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3094395A (en) * 1959-01-12 1963-06-18 Gen Dynamics Corp Method for evaporating subliming materials
FR2611746B1 (en) * 1987-03-06 1989-06-30 Centre Nat Etd Spatiales DEVICE FOR VACUUM EVAPORATION OF A CONTINUOUS METAL
DE102015107297A1 (en) * 2015-05-11 2016-11-17 Von Ardenne Gmbh processing arrangement

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3117210A (en) * 1959-07-13 1964-01-07 Wisconsin Alumni Res Found Apparatus for evaporating materials
US3110620A (en) * 1960-06-28 1963-11-12 Ibm Method of making plural layer thin film devices
US3427432A (en) * 1966-06-10 1969-02-11 Granville Phillips Co Sublimation device
US3367304A (en) * 1967-03-13 1968-02-06 Dow Corning Deposition chamber for manufacture of refractory coated filaments
US3603284A (en) * 1970-01-02 1971-09-07 Ibm Vapor deposition apparatus
US3805736A (en) * 1971-12-27 1974-04-23 Ibm Apparatus for diffusion limited mass transport
US4146774A (en) * 1975-11-14 1979-03-27 Hughes Aircraft Company Planar reactive evaporation apparatus for the deposition of compound semiconducting films

Also Published As

Publication number Publication date
FR1069111A (en) 1954-07-05
NL78611C (en)
CH309574A (en) 1955-09-15
BE515457A (en)

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