GB782983A - Improvements in or relating to the formation of evaporated layers - Google Patents

Improvements in or relating to the formation of evaporated layers

Info

Publication number
GB782983A
GB782983A GB2183154A GB2183154A GB782983A GB 782983 A GB782983 A GB 782983A GB 2183154 A GB2183154 A GB 2183154A GB 2183154 A GB2183154 A GB 2183154A GB 782983 A GB782983 A GB 782983A
Authority
GB
United Kingdom
Prior art keywords
source
ring
point source
mesh
antimony trisulphide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2183154A
Inventor
Hans Gerhard Lubszynski
Stanley Taylor
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMI Ltd
Electrical and Musical Industries Ltd
Original Assignee
EMI Ltd
Electrical and Musical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EMI Ltd, Electrical and Musical Industries Ltd filed Critical EMI Ltd
Priority to GB2183154A priority Critical patent/GB782983A/en
Publication of GB782983A publication Critical patent/GB782983A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

782,983. Coating by vapour deposition. ELECTRIC & MUSICAL INDUSTRIES, Ltd. July 25, 1955 [July 27, 1954], No. 21831/54. Class 82(2) [Also in Group XL(a)] A layer of uniform thickness is formed on a surface by evaporating material to form the layer from a point source disposed at a distance from said surface and from a ring source disposed closer to said surface than the point source, the point source being on the axis of the ring source. As shown, an electron discharge device comprising an envelope 1 and glass window 2 is first provided with a transparent conducting layer 3, by spraying the window when hot with a stannous or stannic chloride solution, and then with a spongy layer 4 of the photoconductive antimony trisulphide by evaporation from (a) a point source 8 which may be a Ta boat containing the antimony trisulphide or a filament containing a bead of the material and (b) the ring source 7 formed by evaporating on to the surface of the ion trap mesh 5 a ring of antimony trisulphide. The deposition is performed in argon at a pressure of about 1 mm. Preferably the deposition from the point source is interrupted after half the quantity of antimony trisulphide therein has been deposited in order that the mesh 5 may be cleared by heating so as to sinter the deposit thereon but so as not to cause evaporation from the mesh or ring source. The remaining antimony trisulphide is then evaporated from the point source and finally the antimony trisulphide is evaporated from the ring source and mesh by e.g. eddy current heating the anode 6. During deposition from the point source, the window 2 may be maintained at a temperature of 50‹C. and during the evaporation from the ring source and mesh, the window may be kept cool by immersing it in iced water.
GB2183154A 1954-07-27 1954-07-27 Improvements in or relating to the formation of evaporated layers Expired GB782983A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2183154A GB782983A (en) 1954-07-27 1954-07-27 Improvements in or relating to the formation of evaporated layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2183154A GB782983A (en) 1954-07-27 1954-07-27 Improvements in or relating to the formation of evaporated layers

Publications (1)

Publication Number Publication Date
GB782983A true GB782983A (en) 1957-09-18

Family

ID=10169545

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2183154A Expired GB782983A (en) 1954-07-27 1954-07-27 Improvements in or relating to the formation of evaporated layers

Country Status (1)

Country Link
GB (1) GB782983A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0422355A1 (en) * 1989-09-08 1991-04-17 International Business Machines Corporation Method and apparatus for vapour deposition of material onto a substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0422355A1 (en) * 1989-09-08 1991-04-17 International Business Machines Corporation Method and apparatus for vapour deposition of material onto a substrate
US5104695A (en) * 1989-09-08 1992-04-14 International Business Machines Corporation Method and apparatus for vapor deposition of material onto a substrate

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