JPS5717852A - Ion selective electrode, its production and ion selective electrode integrating plate - Google Patents
Ion selective electrode, its production and ion selective electrode integrating plateInfo
- Publication number
- JPS5717852A JPS5717852A JP9237980A JP9237980A JPS5717852A JP S5717852 A JPS5717852 A JP S5717852A JP 9237980 A JP9237980 A JP 9237980A JP 9237980 A JP9237980 A JP 9237980A JP S5717852 A JPS5717852 A JP S5717852A
- Authority
- JP
- Japan
- Prior art keywords
- ion selective
- attains
- layer
- vapor
- selective electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
- G01N27/333—Ion-selective electrodes or membranes
- G01N27/3335—Ion-selective electrodes or membranes the membrane containing at least one organic component
Abstract
PURPOSE:To reduce electrode drift by providing a layer of a water-insoluble salt of the conductive metal on said metal, further providing an electrolyte layer having annions common to the annions of this insoluble salt thereon, and providing an ion selective layer thereon. CONSTITUTION:After 4g silver of 99.9% purity is put into a tungsten basket, a polyethylene terephthalate film substrate 1 of 100mum thickness is disposed in a vacuum vapor depositing device and is thereafter vapor deposited with the silver until the rate of evaporation thereof attains 7g/m<2>. Thence, 3g silver chloride of 99.5% is put in a vapor source and is vapor deposited until the rate of evaporation attains 2.5g/m<2>. Further, potassium chloride of 99.5% purity is put into the evaporating source and is vapor deposited on this silver chloride layer 3, until the rate of evaporation of potassium chloride attains 1.5g/m<2>. A potassium ion selective layer 5 is coated on the Ag/AgCl/KCl multilayer film formed by the vapor deposition in this way in such a manner that the thickness of the dry film attains 25mum, thereafter it is dried, whereby the potassium ion selective electrode film is made.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9237980A JPS5717852A (en) | 1980-07-07 | 1980-07-07 | Ion selective electrode, its production and ion selective electrode integrating plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9237980A JPS5717852A (en) | 1980-07-07 | 1980-07-07 | Ion selective electrode, its production and ion selective electrode integrating plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5717852A true JPS5717852A (en) | 1982-01-29 |
JPS6256976B2 JPS6256976B2 (en) | 1987-11-28 |
Family
ID=14052784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9237980A Granted JPS5717852A (en) | 1980-07-07 | 1980-07-07 | Ion selective electrode, its production and ion selective electrode integrating plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5717852A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0145834A1 (en) | 1983-07-18 | 1985-06-26 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Ion-selective compositions containing certain crown ethers |
EP0160997A2 (en) * | 1984-05-10 | 1985-11-13 | Fuji Photo Film Co., Ltd. | Ion selective electrode |
EP0165607A2 (en) * | 1984-06-20 | 1985-12-27 | Fuji Photo Film Co., Ltd. | Ion selective electrode |
EP0168666A2 (en) * | 1984-06-20 | 1986-01-22 | Fuji Photo Film Co., Ltd. | Ion selective electrode |
JPS62157565A (en) * | 1985-12-23 | 1987-07-13 | イクバル ダブリュー シッディクィ | Dried laminated electrode |
JPH05249068A (en) * | 1991-07-15 | 1993-09-28 | Boehringer Mannheim Gmbh | Electrochemical analyzing apparatus |
WO2020025688A1 (en) | 2018-07-31 | 2020-02-06 | Universidad Rovira I Virgili (Urv) | Point-of care device for the selective detection of potassium |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5564759U (en) * | 1978-10-27 | 1980-05-02 |
-
1980
- 1980-07-07 JP JP9237980A patent/JPS5717852A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5564759U (en) * | 1978-10-27 | 1980-05-02 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0145834A1 (en) | 1983-07-18 | 1985-06-26 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Ion-selective compositions containing certain crown ethers |
EP0160997A2 (en) * | 1984-05-10 | 1985-11-13 | Fuji Photo Film Co., Ltd. | Ion selective electrode |
EP0165607A2 (en) * | 1984-06-20 | 1985-12-27 | Fuji Photo Film Co., Ltd. | Ion selective electrode |
EP0168666A2 (en) * | 1984-06-20 | 1986-01-22 | Fuji Photo Film Co., Ltd. | Ion selective electrode |
JPS62157565A (en) * | 1985-12-23 | 1987-07-13 | イクバル ダブリュー シッディクィ | Dried laminated electrode |
JPH05249068A (en) * | 1991-07-15 | 1993-09-28 | Boehringer Mannheim Gmbh | Electrochemical analyzing apparatus |
WO2020025688A1 (en) | 2018-07-31 | 2020-02-06 | Universidad Rovira I Virgili (Urv) | Point-of care device for the selective detection of potassium |
US11874246B2 (en) | 2018-07-31 | 2024-01-16 | Universidad Rovira I Virgili (Urv) | Point-of care device for the selective detection of potassium |
Also Published As
Publication number | Publication date |
---|---|
JPS6256976B2 (en) | 1987-11-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1533427A (en) | Metallized plastics film | |
ES333127A1 (en) | A procedure for depositing by cathodized spraying on a substrate a thin metal layer. (Machine-translation by Google Translate, not legally binding) | |
JPS5717852A (en) | Ion selective electrode, its production and ion selective electrode integrating plate | |
GB1168522A (en) | Improvements in or relating to Superconducting Materials | |
GB1355927A (en) | Process for manufacturing metallic foil | |
GB1449835A (en) | Composite metal polymer films | |
KR880011364A (en) | Sputtered films of bismuth / tin oxides and articles comprising such films | |
GB1190480A (en) | Process for Making Metallised Films and Filaments. | |
JPS5717851A (en) | Ion selective electrode, its production and ion selective electrode integrating plate | |
EP0107357A3 (en) | Apparatus and method for making large area photovoltaic devices incorporating back reflectors | |
JPS54141391A (en) | Manufacture of metallized film | |
JPS54127877A (en) | Preparation of thin film | |
JPS5511245A (en) | Electrochromic display device | |
JPS5568796A (en) | Manufacture of speaker diaphragm | |
JPS57123828A (en) | Preparation of transparent conductive film | |
JPS55137671A (en) | Photo-charging silver-halogen battery | |
JPS5211787A (en) | Method of manufacturing schottky barrier solar battery | |
JPS5462984A (en) | Masking deposition method | |
JPS5534651A (en) | Structure of primary layer of plated film | |
JPS5260989A (en) | Manufacturing of dielectric thin film | |
JPS57833A (en) | Target for image pick-up tube | |
JPS5435176A (en) | Depositing method by vacuum evaporation | |
GB849341A (en) | Evaporating techniques for depositing a thin layer upon a substrate | |
GB1170428A (en) | Method of preparing Lead Oxide Films | |
JPS52123871A (en) | Thin film forming method |