GB2541412B - Method and Apparatus for Forming a Conductive Track - Google Patents
Method and Apparatus for Forming a Conductive TrackInfo
- Publication number
- GB2541412B GB2541412B GB1514655.8A GB201514655A GB2541412B GB 2541412 B GB2541412 B GB 2541412B GB 201514655 A GB201514655 A GB 201514655A GB 2541412 B GB2541412 B GB 2541412B
- Authority
- GB
- United Kingdom
- Prior art keywords
- forming
- conductive track
- track
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0732—Shaping the laser spot into a rectangular shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/34—Laser welding for purposes other than joining
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Structure Of Printed Boards (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1514655.8A GB2541412B (en) | 2015-08-18 | 2015-08-18 | Method and Apparatus for Forming a Conductive Track |
| PCT/GB2016/052387 WO2017029472A1 (en) | 2015-08-18 | 2016-08-03 | Method and apparatus for forming a conductive track |
| US15/753,265 US10882136B2 (en) | 2015-08-18 | 2016-08-03 | Method and apparatus for forming a conductive track |
| EP16750224.4A EP3337636B1 (en) | 2015-08-18 | 2016-08-03 | Method and apparatus for forming a conductive track |
| KR1020187004936A KR102563985B1 (ko) | 2015-08-18 | 2016-08-03 | 전도성 트랙을 형성하는 방법 및 장치 |
| CN201680047793.XA CN107921582B (zh) | 2015-08-18 | 2016-08-03 | 用于形成导电迹线的方法和设备 |
| JP2018509591A JP7079727B2 (ja) | 2015-08-18 | 2016-08-03 | 導電トラックの形成方法および装置 |
| TW105126210A TWI694881B (zh) | 2015-08-18 | 2016-08-17 | 形成導電軌之方法及裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1514655.8A GB2541412B (en) | 2015-08-18 | 2015-08-18 | Method and Apparatus for Forming a Conductive Track |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB201514655D0 GB201514655D0 (en) | 2015-09-30 |
| GB2541412A GB2541412A (en) | 2017-02-22 |
| GB2541412B true GB2541412B (en) | 2018-08-01 |
Family
ID=54258784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1514655.8A Active GB2541412B (en) | 2015-08-18 | 2015-08-18 | Method and Apparatus for Forming a Conductive Track |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10882136B2 (https=) |
| EP (1) | EP3337636B1 (https=) |
| JP (1) | JP7079727B2 (https=) |
| KR (1) | KR102563985B1 (https=) |
| CN (1) | CN107921582B (https=) |
| GB (1) | GB2541412B (https=) |
| TW (1) | TWI694881B (https=) |
| WO (1) | WO2017029472A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6955932B2 (ja) * | 2017-08-25 | 2021-10-27 | 株式会社ディスコ | レーザービームプロファイラユニット及びレーザー加工装置 |
| EP3624571A1 (en) * | 2018-09-14 | 2020-03-18 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | A process for the manufacturing of printed conductive tracks on an object and 3d printed electronics |
| CN115361785B (zh) * | 2022-08-23 | 2025-03-21 | 广东工业大学 | 一种精细线路的制备方法及系统 |
| GB2629349A (en) * | 2023-04-24 | 2024-10-30 | M Solv Ltd | Apparatus and method for directing laser radiation onto a target, laser drilling apparatus and method |
| CN118016737B (zh) * | 2024-01-24 | 2025-05-30 | 天合光能股份有限公司 | 太阳能电池及其制备方法 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060003262A1 (en) * | 2004-06-30 | 2006-01-05 | Eastman Kodak Company | Forming electrical conductors on a substrate |
| WO2006011671A1 (en) * | 2004-07-30 | 2006-02-02 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and laser irradiation method |
| US20060057502A1 (en) * | 2004-07-23 | 2006-03-16 | Sumitomo Electric Industries, Ltd. | Method of forming a conductive wiring pattern by laser irradiation and a conductive wiring pattern |
| KR20100080120A (ko) * | 2008-12-31 | 2010-07-08 | 한국생산기술연구원 | 인쇄회로 소결방법 |
| US20120015112A1 (en) * | 2010-07-14 | 2012-01-19 | Korea Advanced Institute Of Science And Technology | Method of fabricating pattern |
| KR20130023732A (ko) * | 2011-08-29 | 2013-03-08 | 한국과학기술원 | 금속 나노입자 극미세 레이저 소결 장치 및 방법 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2220502A (en) | 1988-07-09 | 1990-01-10 | Exitech Ltd | Excimer laser beam homogenizer system |
| JP3149450B2 (ja) * | 1991-04-04 | 2001-03-26 | セイコーエプソン株式会社 | 薄膜トランジスタの製造方法及び製造装置 |
| US6331692B1 (en) | 1996-10-12 | 2001-12-18 | Volker Krause | Diode laser, laser optics, device for laser treatment of a workpiece, process for a laser treatment of workpiece |
| JP3436858B2 (ja) * | 1997-02-27 | 2003-08-18 | シャープ株式会社 | 薄膜太陽電池の製造方法 |
| JP4663047B2 (ja) | 1998-07-13 | 2011-03-30 | 株式会社半導体エネルギー研究所 | レーザー照射装置及び半導体装置の作製方法 |
| US6750423B2 (en) * | 2001-10-25 | 2004-06-15 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method, laser irradiation apparatus, and method of manufacturing a semiconductor device |
| TWI221102B (en) * | 2002-08-30 | 2004-09-21 | Sumitomo Heavy Industries | Laser material processing method and processing device |
| JP4536601B2 (ja) * | 2004-06-14 | 2010-09-01 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US7722422B2 (en) | 2007-05-21 | 2010-05-25 | Global Oled Technology Llc | Device and method for improved power distribution for a transparent electrode |
| JP4601679B2 (ja) * | 2008-02-21 | 2010-12-22 | 三洋電機株式会社 | 太陽電池モジュール |
| DE102008019636A1 (de) * | 2008-04-18 | 2009-10-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Bauteil mit Schweißnaht und Verfahren zur Herstellung einer Schweißnaht |
| JP2010145562A (ja) | 2008-12-17 | 2010-07-01 | Panasonic Corp | パターン形成方法 |
| GB0900036D0 (en) | 2009-01-03 | 2009-02-11 | M Solv Ltd | Method and apparatus for forming grooves with complex shape in the surface of apolymer |
| GB2474665B (en) * | 2009-10-22 | 2011-10-12 | M Solv Ltd | Method and apparatus for dividing thin film device into separate cells |
| JP2011194413A (ja) | 2010-03-17 | 2011-10-06 | Sony Corp | 表面超微細凹凸構造を有する成形品の製造方法 |
| JP2011249357A (ja) * | 2010-05-21 | 2011-12-08 | Panasonic Electric Works Co Ltd | 回路基板および回路基板の製造方法 |
| WO2016075822A1 (ja) | 2014-11-14 | 2016-05-19 | 富士機械製造株式会社 | 配線基板作製方法および配線基板作製装置 |
-
2015
- 2015-08-18 GB GB1514655.8A patent/GB2541412B/en active Active
-
2016
- 2016-08-03 US US15/753,265 patent/US10882136B2/en not_active Expired - Fee Related
- 2016-08-03 EP EP16750224.4A patent/EP3337636B1/en active Active
- 2016-08-03 JP JP2018509591A patent/JP7079727B2/ja active Active
- 2016-08-03 CN CN201680047793.XA patent/CN107921582B/zh active Active
- 2016-08-03 KR KR1020187004936A patent/KR102563985B1/ko active Active
- 2016-08-03 WO PCT/GB2016/052387 patent/WO2017029472A1/en not_active Ceased
- 2016-08-17 TW TW105126210A patent/TWI694881B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060003262A1 (en) * | 2004-06-30 | 2006-01-05 | Eastman Kodak Company | Forming electrical conductors on a substrate |
| US20060057502A1 (en) * | 2004-07-23 | 2006-03-16 | Sumitomo Electric Industries, Ltd. | Method of forming a conductive wiring pattern by laser irradiation and a conductive wiring pattern |
| WO2006011671A1 (en) * | 2004-07-30 | 2006-02-02 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and laser irradiation method |
| KR20100080120A (ko) * | 2008-12-31 | 2010-07-08 | 한국생산기술연구원 | 인쇄회로 소결방법 |
| US20120015112A1 (en) * | 2010-07-14 | 2012-01-19 | Korea Advanced Institute Of Science And Technology | Method of fabricating pattern |
| KR20130023732A (ko) * | 2011-08-29 | 2013-03-08 | 한국과학기술원 | 금속 나노입자 극미세 레이저 소결 장치 및 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107921582A (zh) | 2018-04-17 |
| CN107921582B (zh) | 2020-02-07 |
| GB2541412A (en) | 2017-02-22 |
| TW201718151A (zh) | 2017-06-01 |
| TWI694881B (zh) | 2020-06-01 |
| KR20180040594A (ko) | 2018-04-20 |
| JP2018525838A (ja) | 2018-09-06 |
| GB201514655D0 (en) | 2015-09-30 |
| US20180236601A1 (en) | 2018-08-23 |
| EP3337636B1 (en) | 2023-06-07 |
| WO2017029472A1 (en) | 2017-02-23 |
| KR102563985B1 (ko) | 2023-08-04 |
| JP7079727B2 (ja) | 2022-06-02 |
| US10882136B2 (en) | 2021-01-05 |
| EP3337636A1 (en) | 2018-06-27 |
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