GB2161285B - Method of exposing a semiconductor wafer to light from a mercury-vapor lamp - Google Patents

Method of exposing a semiconductor wafer to light from a mercury-vapor lamp

Info

Publication number
GB2161285B
GB2161285B GB08506124A GB8506124A GB2161285B GB 2161285 B GB2161285 B GB 2161285B GB 08506124 A GB08506124 A GB 08506124A GB 8506124 A GB8506124 A GB 8506124A GB 2161285 B GB2161285 B GB 2161285B
Authority
GB
United Kingdom
Prior art keywords
mercury
exposing
light
semiconductor wafer
vapor lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08506124A
Other languages
English (en)
Other versions
GB2161285A (en
GB8506124D0 (en
Inventor
Takehiro Kira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of GB8506124D0 publication Critical patent/GB8506124D0/en
Publication of GB2161285A publication Critical patent/GB2161285A/en
Application granted granted Critical
Publication of GB2161285B publication Critical patent/GB2161285B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08506124A 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor lamp Expired GB2161285B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139776A JPS6120325A (ja) 1984-07-07 1984-07-07 水銀灯による半導体ウエハ−材料の露光方法

Publications (3)

Publication Number Publication Date
GB8506124D0 GB8506124D0 (en) 1985-04-11
GB2161285A GB2161285A (en) 1986-01-08
GB2161285B true GB2161285B (en) 1988-09-14

Family

ID=15253148

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08506124A Expired GB2161285B (en) 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor lamp

Country Status (5)

Country Link
JP (1) JPS6120325A (nl)
DE (1) DE3510479C2 (nl)
FR (1) FR2567281B1 (nl)
GB (1) GB2161285B (nl)
NL (1) NL8501934A (nl)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69703380T2 (de) * 1996-09-19 2001-04-26 Koninklijke Philips Electronics N.V., Eindhoven Verfahren zur überwachung eines photolithographischen prozesses

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2422280A (en) * 1944-07-24 1947-06-17 Curtis Helene Ind Inc Fluorescent illumination
US4040736A (en) * 1973-09-12 1977-08-09 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
GB2014335B (en) * 1978-02-14 1982-06-03 Kasper Instruments Apparatus for prolonging lamp life by minimizing power requirement levels
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren

Also Published As

Publication number Publication date
NL8501934A (nl) 1986-02-03
JPS6120325A (ja) 1986-01-29
DE3510479C2 (de) 1993-12-23
GB2161285A (en) 1986-01-08
FR2567281B1 (fr) 1991-06-21
GB8506124D0 (en) 1985-04-11
FR2567281A1 (fr) 1986-01-10
DE3510479A1 (de) 1986-01-16

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20050307