GB8506124D0 - Exposing semiconductor wafer - Google Patents

Exposing semiconductor wafer

Info

Publication number
GB8506124D0
GB8506124D0 GB858506124A GB8506124A GB8506124D0 GB 8506124 D0 GB8506124 D0 GB 8506124D0 GB 858506124 A GB858506124 A GB 858506124A GB 8506124 A GB8506124 A GB 8506124A GB 8506124 D0 GB8506124 D0 GB 8506124D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor wafer
exposing semiconductor
exposing
wafer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB858506124A
Other versions
GB2161285B (en
GB2161285A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of GB8506124D0 publication Critical patent/GB8506124D0/en
Publication of GB2161285A publication Critical patent/GB2161285A/en
Application granted granted Critical
Publication of GB2161285B publication Critical patent/GB2161285B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB08506124A 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor lamp Expired GB2161285B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139776A JPS6120325A (en) 1984-07-07 1984-07-07 Method for exposing material of semiconductor wafer by mercury lamp

Publications (3)

Publication Number Publication Date
GB8506124D0 true GB8506124D0 (en) 1985-04-11
GB2161285A GB2161285A (en) 1986-01-08
GB2161285B GB2161285B (en) 1988-09-14

Family

ID=15253148

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08506124A Expired GB2161285B (en) 1984-07-07 1985-03-08 Method of exposing a semiconductor wafer to light from a mercury-vapor lamp

Country Status (5)

Country Link
JP (1) JPS6120325A (en)
DE (1) DE3510479C2 (en)
FR (1) FR2567281B1 (en)
GB (1) GB2161285B (en)
NL (1) NL8501934A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0861457B1 (en) * 1996-09-19 2000-10-25 Koninklijke Philips Electronics N.V. Method of monitoring a photolithographic process

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2422280A (en) * 1944-07-24 1947-06-17 Curtis Helene Ind Inc Fluorescent illumination
US4040736A (en) * 1973-09-12 1977-08-09 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
US4024428A (en) * 1975-05-19 1977-05-17 Optical Associates, Incorporated Radiation-sensitive control circuit for driving lamp at various power levels
JPS54108478A (en) * 1978-02-14 1979-08-25 Ushio Electric Inc Printing or transcribing method of semiconductor and discharge lamp suitable for printing or transcription
GB2014335B (en) * 1978-02-14 1982-06-03 Kasper Instruments Apparatus for prolonging lamp life by minimizing power requirement levels
DE2845603C2 (en) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Method and device for projection copying

Also Published As

Publication number Publication date
GB2161285B (en) 1988-09-14
DE3510479C2 (en) 1993-12-23
GB2161285A (en) 1986-01-08
JPS6120325A (en) 1986-01-29
FR2567281B1 (en) 1991-06-21
FR2567281A1 (en) 1986-01-10
NL8501934A (en) 1986-02-03
DE3510479A1 (en) 1986-01-16

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20050307