GB8503653D0 - Semiconductor device fabrication - Google Patents

Semiconductor device fabrication

Info

Publication number
GB8503653D0
GB8503653D0 GB858503653A GB8503653A GB8503653D0 GB 8503653 D0 GB8503653 D0 GB 8503653D0 GB 858503653 A GB858503653 A GB 858503653A GB 8503653 A GB8503653 A GB 8503653A GB 8503653 D0 GB8503653 D0 GB 8503653D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor device
device fabrication
fabrication
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB858503653A
Other versions
GB2154330A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
British Telecommunications PLC
Original Assignee
British Telecommunications PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by British Telecommunications PLC filed Critical British Telecommunications PLC
Publication of GB8503653D0 publication Critical patent/GB8503653D0/en
Publication of GB2154330A publication Critical patent/GB2154330A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB08503653A 1984-02-13 1985-02-13 Fabrication of semiconductor devices Withdrawn GB2154330A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB848403698A GB8403698D0 (en) 1984-02-13 1984-02-13 Semiconductor device fabrication

Publications (2)

Publication Number Publication Date
GB8503653D0 true GB8503653D0 (en) 1985-03-13
GB2154330A GB2154330A (en) 1985-09-04

Family

ID=10556496

Family Applications (3)

Application Number Title Priority Date Filing Date
GB848403698A Pending GB8403698D0 (en) 1984-02-13 1984-02-13 Semiconductor device fabrication
GB848422820A Pending GB8422820D0 (en) 1984-02-13 1984-09-10 Semiconductor device fabrication
GB08503653A Withdrawn GB2154330A (en) 1984-02-13 1985-02-13 Fabrication of semiconductor devices

Family Applications Before (2)

Application Number Title Priority Date Filing Date
GB848403698A Pending GB8403698D0 (en) 1984-02-13 1984-02-13 Semiconductor device fabrication
GB848422820A Pending GB8422820D0 (en) 1984-02-13 1984-09-10 Semiconductor device fabrication

Country Status (1)

Country Link
GB (3) GB8403698D0 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5215867A (en) * 1983-09-16 1993-06-01 At&T Bell Laboratories Method with gas functionalized plasma developed layer
US4810601A (en) * 1984-12-07 1989-03-07 International Business Machines Corporation Top imaged resists
US4908298A (en) * 1985-03-19 1990-03-13 International Business Machines Corporation Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
DE3669211D1 (en) * 1985-05-31 1990-04-05 Ibm PROTECTIVE LACQUER FOR LITHOGRAPHY AND APPLICATION METHOD.
US4613398A (en) * 1985-06-06 1986-09-23 International Business Machines Corporation Formation of etch-resistant resists through preferential permeation
US4657845A (en) * 1986-01-14 1987-04-14 International Business Machines Corporation Positive tone oxygen plasma developable photoresist
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
DE3772267D1 (en) * 1986-06-12 1991-09-26 Matsushita Electric Ind Co Ltd IMAGE GENERATION PROCESS.
US4931351A (en) * 1987-01-12 1990-06-05 Eastman Kodak Company Bilayer lithographic process
US4808511A (en) * 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process
US5212044A (en) * 1988-09-08 1993-05-18 The Mead Corporation Photoresist composition including polyphenol and sensitizer
US4978594A (en) * 1988-10-17 1990-12-18 International Business Machines Corporation Fluorine-containing base layer for multi-layer resist processes
US5234794A (en) * 1989-04-24 1993-08-10 Siemens Aktiengesellschaft Photostructuring method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3520683A (en) * 1967-05-19 1970-07-14 Bell Telephone Labor Inc Photoresist method and products produced thereby
JPS494851B1 (en) * 1968-04-26 1974-02-04
JPS5119982B2 (en) * 1972-01-26 1976-06-22
BE793490A (en) * 1972-05-23 1973-06-29 Hunt Chem Corp Philip A LIGHT-SENSITIVE ITEM CONTAINING DIAZOQUINONE PHENOLATE, POLYMERIC BINDER, AND DIAZOQUINONE-SILOXANE
JPS5143125A (en) * 1974-10-09 1976-04-13 Fuji Photo Film Co Ltd KANKOSEIFUKUSHAZAIRYO

Also Published As

Publication number Publication date
GB2154330A (en) 1985-09-04
GB8422820D0 (en) 1984-10-17
GB8403698D0 (en) 1984-03-14

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)