GB1589286A - Alignment of a photo-mask with respect to the surface of a substrate body - Google Patents
Alignment of a photo-mask with respect to the surface of a substrate body Download PDFInfo
- Publication number
- GB1589286A GB1589286A GB3267977A GB3267977A GB1589286A GB 1589286 A GB1589286 A GB 1589286A GB 3267977 A GB3267977 A GB 3267977A GB 3267977 A GB3267977 A GB 3267977A GB 1589286 A GB1589286 A GB 1589286A
- Authority
- GB
- United Kingdom
- Prior art keywords
- mask
- substrate
- ray source
- windows
- scale
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 title claims description 48
- 238000000034 method Methods 0.000 claims description 32
- 239000004922 lacquer Substances 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 28
- 239000004065 semiconductor Substances 0.000 description 11
- 238000005530 etching Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762635275 DE2635275C2 (de) | 1976-08-05 | 1976-08-05 | Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1589286A true GB1589286A (en) | 1981-05-07 |
Family
ID=5984815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3267977A Expired GB1589286A (en) | 1976-08-05 | 1977-08-04 | Alignment of a photo-mask with respect to the surface of a substrate body |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5318970A (Direct) |
| BE (1) | BE857539A (Direct) |
| DE (1) | DE2635275C2 (Direct) |
| FR (1) | FR2360916A1 (Direct) |
| GB (1) | GB1589286A (Direct) |
| IT (1) | IT1081184B (Direct) |
| NL (1) | NL7708652A (Direct) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5655041A (en) * | 1979-10-11 | 1981-05-15 | Nippon Telegr & Teleph Corp <Ntt> | Positioning exposure |
| JP7497649B2 (ja) * | 2020-08-25 | 2024-06-11 | セイコーエプソン株式会社 | 液体噴射装置、液体噴射装置のメンテナンス方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1804923A1 (de) * | 1967-10-27 | 1969-07-31 | Hilger & Watts Ltd | Verfahren und Vorrichtung zur Reproduktion eines Musters von einem ebenen Koerper auf einen zweiten ebenen Koerper |
| US3745358A (en) * | 1971-05-10 | 1973-07-10 | Radiant Energy Systems | Alignment method and apparatus for electron projection systems |
| US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
| US3742229A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask alignment system |
| DE2460914C2 (de) * | 1974-12-21 | 1983-08-18 | Ibm Deutschland Gmbh, 7000 Stuttgart | Photolithographische Projektionsvorrichtung |
| US4085329A (en) * | 1976-05-03 | 1978-04-18 | Hughes Aircraft Company | Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment |
-
1976
- 1976-08-05 DE DE19762635275 patent/DE2635275C2/de not_active Expired
-
1977
- 1977-07-27 IT IT2616277A patent/IT1081184B/it active
- 1977-08-02 FR FR7723760A patent/FR2360916A1/fr active Granted
- 1977-08-03 JP JP9330377A patent/JPS5318970A/ja active Pending
- 1977-08-04 GB GB3267977A patent/GB1589286A/en not_active Expired
- 1977-08-04 NL NL7708652A patent/NL7708652A/xx not_active Application Discontinuation
- 1977-08-05 BE BE179952A patent/BE857539A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE2635275A1 (de) | 1978-02-09 |
| FR2360916B1 (Direct) | 1982-05-21 |
| NL7708652A (nl) | 1978-02-07 |
| FR2360916A1 (fr) | 1978-03-03 |
| JPS5318970A (en) | 1978-02-21 |
| DE2635275C2 (de) | 1984-09-06 |
| BE857539A (fr) | 1977-12-01 |
| IT1081184B (it) | 1985-05-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |