GB1567555A - Photometric measurement and control of the thickness of optically thin layers - Google Patents
Photometric measurement and control of the thickness of optically thin layers Download PDFInfo
- Publication number
- GB1567555A GB1567555A GB25702/77A GB2570277A GB1567555A GB 1567555 A GB1567555 A GB 1567555A GB 25702/77 A GB25702/77 A GB 25702/77A GB 2570277 A GB2570277 A GB 2570277A GB 1567555 A GB1567555 A GB 1567555A
- Authority
- GB
- United Kingdom
- Prior art keywords
- measurement light
- measurement
- light receiver
- axis
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005375 photometry Methods 0.000 title description 2
- 238000005259 measurement Methods 0.000 claims description 138
- 238000000576 coating method Methods 0.000 claims description 14
- 230000004069 differentiation Effects 0.000 claims description 10
- 238000009434 installation Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000001771 vacuum deposition Methods 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 31
- 230000003287 optical effect Effects 0.000 description 18
- 239000011521 glass Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000004913 activation Effects 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D5/00—Control of dimensions of material
- G05D5/02—Control of dimensions of material of thickness, e.g. of rolled material
- G05D5/03—Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2627753A DE2627753C2 (de) | 1976-06-21 | 1976-06-21 | Anordnung zur Dickenmessung und -steuerung optisch wirksamer Dünnschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1567555A true GB1567555A (en) | 1980-05-14 |
Family
ID=5981051
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB25702/77A Expired GB1567555A (en) | 1976-06-21 | 1977-06-20 | Photometric measurement and control of the thickness of optically thin layers |
| GB11473/79A Expired GB1567556A (en) | 1976-06-21 | 1977-06-20 | Photometer for use in the photometric measurement of the thickness of optically thin layers |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB11473/79A Expired GB1567556A (en) | 1976-06-21 | 1977-06-20 | Photometer for use in the photometric measurement of the thickness of optically thin layers |
Country Status (16)
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52102783A (en) * | 1976-02-25 | 1977-08-29 | Kanagawa Prefecture | Method of measuring maximum diameter of bruise in brinell hardness test |
| FI69370C (fi) * | 1981-08-18 | 1986-01-10 | Topwave Instr Oy | Foerfarande foer maetning av egenskaperna hos ett plastskikt med hjaelp av infraroed straolning |
| DE3135443A1 (de) * | 1981-09-08 | 1983-03-24 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und fotometrische anordnung zur dickenmessung und -steuerung optisch wirksamer schichten |
| DE3234534C2 (de) * | 1982-09-17 | 1986-09-11 | Kievskoe naučno-proizvodstvennoe obiedinenie "Analitpribor", Kiev | Anordnung zum Aufstäuben von optischen Filmschichten |
| DE3220282C3 (de) * | 1982-05-28 | 1995-05-18 | Roland Man Druckmasch | Vorrichtung zum betrieblichen Erfassen eines Maßes für die Feuchtmittelmenge auf der rotierenden Druckplatte in Offset-Druckmaschinen |
| FR2531775A1 (fr) * | 1982-08-12 | 1984-02-17 | Cit Alcatel | Dispositif de mesure de l'epaisseur d'une couche deposee sur un substrat transparent |
| US4676883A (en) * | 1986-03-03 | 1987-06-30 | Sierracin Corporation | Optical disk transmission monitor for deposited films |
| EP0290657A1 (de) * | 1987-05-15 | 1988-11-17 | KSB Aktiengesellschaft | Verfahren und Vorrichtung zur Messung der optischen Eigenschaften von dünnen Schichten |
| US4669418A (en) * | 1986-05-19 | 1987-06-02 | Gte Laboratories Incorporated | Optical coating apparatus |
| DE3623106C1 (en) * | 1986-07-09 | 1987-12-10 | Hewlett Packard Gmbh | Optoelectronic measuring device having a light (optical) chopper |
| DE3803840A1 (de) * | 1988-02-09 | 1989-08-17 | Leybold Ag | Fotometer |
| DE4123589C2 (de) * | 1991-07-17 | 2001-03-29 | Leybold Ag | Vorrichtung zum Messen der Lichtstrahlung eines Plasmas |
| US5504695A (en) * | 1992-11-17 | 1996-04-02 | Nissan Motor Co., Ltd. | Apparatus for measuring paint film thickness based on dynamic levelling property of wet paint film surface |
| DE4314251C2 (de) * | 1993-04-30 | 2002-02-21 | Unaxis Deutschland Holding | Verfahren und Vorrichtung zum Aufdampfen absorbierender dünner Schichten auf ein Substrat |
| DE102005008889B4 (de) * | 2005-02-26 | 2016-07-07 | Leybold Optics Gmbh | Optisches Monitoringsystem für Beschichtungsprozesse |
| US8958156B1 (en) | 2007-05-30 | 2015-02-17 | Semrock, Inc. | Interference filter for non-zero angle of incidence spectroscopy |
| DE102018205236A1 (de) * | 2018-04-06 | 2019-10-10 | Bhs-Sonthofen Gmbh | Vorrichtung und Verfahren zur Messung einer Filterkuchendicke |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1079920B (de) * | 1952-04-25 | 1960-04-14 | Technicolor Corp | Verfahren und Vorrichtung zum Aufdampfen von mehrschichtigen dichromatischen Interferenzueberzuegen im Vakuum |
| DE1797108U (de) | 1959-07-17 | 1959-10-01 | Schubert & Salzer Maschinen | Speisevorrichtung fuer karden schlagmaschinen u. dgl. |
| DE1276976B (de) * | 1962-01-29 | 1968-09-05 | Lab Pristroje Narodni Podnik | Verfahren und Vorrichtung zur optischen Schichtdickenmessung duenner Schichten waehrend ihrer Herstellung durch Aufdampfen im Vakuum |
| DE1548262B2 (de) * | 1966-10-13 | 1970-05-06 | Leybold-Heraeus GmbH & Co KG, 5OOO Köln-Bayenthal | Optisches Gerät zur Messung von Schichtdicken in Vakuumaufdampfprozessen |
| US3491240A (en) * | 1967-03-29 | 1970-01-20 | Itek Corp | Noncontacting surface sensor |
| US3526460A (en) * | 1967-06-27 | 1970-09-01 | Webb James E | Optical characteristics measuring apparatus |
| FR1539538A (fr) * | 1967-10-05 | 1968-09-13 | Leybold Hochvakuum Anlagen Gmb | Instrument optique de mesure de l'épaisseur de couches déposées par métallisationsous vide |
| US3654109A (en) * | 1968-04-25 | 1972-04-04 | Ibm | Apparatus and method for measuring rate in flow processes |
| US3737237A (en) * | 1971-11-18 | 1973-06-05 | Nasa | Monitoring deposition of films |
| DE2220231A1 (de) * | 1972-04-25 | 1973-11-08 | Serv Anstalt | Photometer zur digitalen anzeige der lichtabsorption einer messprobe in einer kuevette |
| US3869211A (en) * | 1972-06-29 | 1975-03-04 | Canon Kk | Instrument for measuring thickness of thin film |
| US3892490A (en) * | 1974-03-06 | 1975-07-01 | Minolta Camera Kk | Monitoring system for coating a substrate |
| US4024291A (en) * | 1975-06-17 | 1977-05-17 | Leybold-Heraeus Gmbh & Co. Kg | Control of vapor deposition |
-
1976
- 1976-06-21 DE DE2627753A patent/DE2627753C2/de not_active Expired
-
1977
- 1977-06-09 IT IT24553/77A patent/IT1086231B/it active
- 1977-06-13 CH CH721877A patent/CH616502A5/de not_active IP Right Cessation
- 1977-06-16 ZA ZA00773609A patent/ZA773609B/xx unknown
- 1977-06-16 US US05/807,290 patent/US4207835A/en not_active Expired - Lifetime
- 1977-06-16 CA CA280,674A patent/CA1082486A/en not_active Expired
- 1977-06-17 NL NLAANVRAGE7706712,A patent/NL186235C/xx not_active IP Right Cessation
- 1977-06-20 GB GB25702/77A patent/GB1567555A/en not_active Expired
- 1977-06-20 GB GB11473/79A patent/GB1567556A/en not_active Expired
- 1977-06-20 AT AT0434977A patent/AT366505B/de not_active IP Right Cessation
- 1977-06-20 ES ES459933A patent/ES459933A1/es not_active Expired
- 1977-06-21 SU SU772501304A patent/SU845804A3/ru active
- 1977-06-21 FR FR7719017A patent/FR2356191A1/fr active Granted
- 1977-06-21 AU AU26259/77A patent/AU520695B2/en not_active Expired
- 1977-06-21 BE BE178632A patent/BE855932A/xx not_active IP Right Cessation
- 1977-06-21 JP JP7377577A patent/JPS5322456A/ja active Pending
- 1977-06-21 SE SE7707141A patent/SE433003B/xx not_active IP Right Cessation
- 1977-10-05 ES ES462916A patent/ES462916A1/es not_active Expired
-
1982
- 1982-08-27 SE SE8204900A patent/SE456775B/sv not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB1567556A (en) | 1980-05-14 |
| SE8204900L (sv) | 1982-08-27 |
| ATA434977A (de) | 1981-08-15 |
| SE7707141L (sv) | 1977-12-22 |
| AU2625977A (en) | 1979-01-04 |
| AU520695B2 (en) | 1982-02-25 |
| ZA773609B (en) | 1978-06-28 |
| NL186235C (nl) | 1990-10-16 |
| ES459933A1 (es) | 1978-04-16 |
| CH616502A5 (US08063081-20111122-C00044.png) | 1980-03-31 |
| BE855932A (fr) | 1977-10-17 |
| AT366505B (de) | 1982-04-26 |
| SU845804A3 (ru) | 1981-07-07 |
| FR2356191B1 (US08063081-20111122-C00044.png) | 1984-06-22 |
| SE8204900D0 (sv) | 1982-08-27 |
| DE2627753C2 (de) | 1983-09-01 |
| ES462916A1 (es) | 1978-06-16 |
| SE456775B (sv) | 1988-10-31 |
| CA1082486A (en) | 1980-07-29 |
| NL7706712A (nl) | 1977-12-23 |
| JPS5322456A (en) | 1978-03-01 |
| DE2627753A1 (de) | 1977-12-29 |
| US4207835A (en) | 1980-06-17 |
| IT1086231B (it) | 1985-05-28 |
| NL186235B (nl) | 1990-05-16 |
| FR2356191A1 (fr) | 1978-01-20 |
| SE433003B (sv) | 1984-04-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |