GB1553181A - Forming electrically insulating layers - Google Patents

Forming electrically insulating layers

Info

Publication number
GB1553181A
GB1553181A GB5435/78A GB543578A GB1553181A GB 1553181 A GB1553181 A GB 1553181A GB 5435/78 A GB5435/78 A GB 5435/78A GB 543578 A GB543578 A GB 543578A GB 1553181 A GB1553181 A GB 1553181A
Authority
GB
United Kingdom
Prior art keywords
electrically insulating
insulating layers
forming electrically
forming
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5435/78A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of GB1553181A publication Critical patent/GB1553181A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • H10P50/262—
    • H10P50/282—
    • H10W20/077—

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Magnetic Heads (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
GB5435/78A 1977-02-15 1978-02-10 Forming electrically insulating layers Expired GB1553181A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7701559A NL7701559A (nl) 1977-02-15 1977-02-15 Het maken van schuine hellingen aan metaal- patronen, alsmede substraat voor een geinte- greerde schakeling voorzien van een dergelijk patroon.

Publications (1)

Publication Number Publication Date
GB1553181A true GB1553181A (en) 1979-09-19

Family

ID=19827979

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5435/78A Expired GB1553181A (en) 1977-02-15 1978-02-10 Forming electrically insulating layers

Country Status (8)

Country Link
US (1) US4176016A (cg-RX-API-DMAC10.html)
JP (1) JPS53100785A (cg-RX-API-DMAC10.html)
CA (1) CA1102922A (cg-RX-API-DMAC10.html)
DE (1) DE2804602C2 (cg-RX-API-DMAC10.html)
FR (1) FR2380636B1 (cg-RX-API-DMAC10.html)
GB (1) GB1553181A (cg-RX-API-DMAC10.html)
HK (1) HK8880A (cg-RX-API-DMAC10.html)
NL (1) NL7701559A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2173822A (en) * 1985-03-23 1986-10-22 Nippon Telegraph & Telephone Planarizing semiconductor surfaces

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3032708C2 (de) * 1980-08-30 1987-01-22 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung eines Dünnschicht-Magnetfeld-Sensors
JPS5759355A (en) * 1980-09-26 1982-04-09 Fujitsu Ltd Manufacture of semiconductor device
FR2619457B1 (fr) * 1987-08-14 1989-11-17 Commissariat Energie Atomique Procede d'obtention d'un motif notamment en materiau ferromagnetique ayant des flancs de pente differente et tete magnetique comportant un tel motif
DE4400032C1 (de) * 1994-01-03 1995-08-31 Gold Star Electronics Halbleitereinrichtung und Verfahren zu deren Herstellung
US5756397A (en) * 1993-12-28 1998-05-26 Lg Semicon Co., Ltd. Method of fabricating a wiring in a semiconductor device
JP2016219452A (ja) * 2015-05-14 2016-12-22 富士通株式会社 多層基板及び多層基板の製造方法
CN114080088B (zh) * 2020-08-10 2024-05-31 鹏鼎控股(深圳)股份有限公司 电路板及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE758160A (fr) * 1969-10-31 1971-04-01 Fairchild Camera Instr Co Structure metallique a couches multiples et procede de fabrication d'une telle structure
US3666548A (en) * 1970-01-06 1972-05-30 Ibm Monocrystalline semiconductor body having dielectrically isolated regions and method of forming
DE2123630A1 (en) * 1970-05-12 1971-12-02 Texas Instruments Inc Semiconductor with multilayer interconnections - using - successive masking and photo etching
US3700508A (en) * 1970-06-25 1972-10-24 Gen Instrument Corp Fabrication of integrated microcircuit devices
FR2119930B1 (cg-RX-API-DMAC10.html) * 1970-12-31 1974-08-19 Ibm
US3755123A (en) * 1971-03-30 1973-08-28 Method for sputtering a film on an irregular surface
JPS5217995B2 (cg-RX-API-DMAC10.html) * 1972-02-18 1977-05-19
US3868723A (en) * 1973-06-29 1975-02-25 Ibm Integrated circuit structure accommodating via holes
US3804738A (en) * 1973-06-29 1974-04-16 Ibm Partial planarization of electrically insulative films by resputtering
US3839111A (en) * 1973-08-20 1974-10-01 Rca Corp Method of etching silicon oxide to produce a tapered edge thereon
US4022930A (en) * 1975-05-30 1977-05-10 Bell Telephone Laboratories, Incorporated Multilevel metallization for integrated circuits

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2173822A (en) * 1985-03-23 1986-10-22 Nippon Telegraph & Telephone Planarizing semiconductor surfaces
US4732761A (en) * 1985-03-23 1988-03-22 Nippon Telegraph And Telephone Corporation Thin film forming apparatus and method
GB2173822B (en) * 1985-03-23 1989-08-09 Nippon Telegraph & Telephone Thin film forming apparatus and method

Also Published As

Publication number Publication date
CA1102922A (en) 1981-06-09
HK8880A (en) 1980-03-14
NL7701559A (nl) 1978-08-17
DE2804602A1 (de) 1978-08-17
FR2380636B1 (fr) 1985-06-14
FR2380636A1 (fr) 1978-09-08
JPS638613B2 (cg-RX-API-DMAC10.html) 1988-02-23
US4176016A (en) 1979-11-27
JPS53100785A (en) 1978-09-02
DE2804602C2 (de) 1985-01-17

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee