GB1537703A - Fabrication of rectangular relief profiles in photoresist - Google Patents

Fabrication of rectangular relief profiles in photoresist

Info

Publication number
GB1537703A
GB1537703A GB3085/76A GB308576A GB1537703A GB 1537703 A GB1537703 A GB 1537703A GB 3085/76 A GB3085/76 A GB 3085/76A GB 308576 A GB308576 A GB 308576A GB 1537703 A GB1537703 A GB 1537703A
Authority
GB
United Kingdom
Prior art keywords
photoresist
fabrication
relief profiles
rectangular relief
rectangular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3085/76A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Priority to GB3085/76A priority Critical patent/GB1537703A/en
Priority to US05/694,374 priority patent/US4082453A/en
Priority to JP819077A priority patent/JPS5293357A/ja
Priority to DE2703160A priority patent/DE2703160C3/de
Priority to BE174405A priority patent/BE850780A/xx
Priority to FR7702336A priority patent/FR2339883A1/fr
Priority to CA270,577A priority patent/CA1080009A/en
Publication of GB1537703A publication Critical patent/GB1537703A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/153—Multiple image producing on single receiver

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Filters (AREA)
GB3085/76A 1976-01-27 1976-01-27 Fabrication of rectangular relief profiles in photoresist Expired GB1537703A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB3085/76A GB1537703A (en) 1976-01-27 1976-01-27 Fabrication of rectangular relief profiles in photoresist
US05/694,374 US4082453A (en) 1976-01-27 1976-06-09 Fabrication of rectangular relief profiles in photoresist
JP819077A JPS5293357A (en) 1976-01-27 1977-01-26 Original negative for producing color film to reduce diffraction and method of producing same
DE2703160A DE2703160C3 (de) 1976-01-27 1977-01-26 Verfahren zum Herstellen eines Masters für ein Phasengitter in einem mit Beugung arbeitenden subtraktiven Farbfiltersystem
BE174405A BE850780A (fr) 1976-01-27 1977-01-26 Fabrication de nervures a section rectangulaire dans un vernis photosensible
FR7702336A FR2339883A1 (fr) 1976-01-27 1977-01-27 Fabrication de nervures a section rectangulaire dans un vernis photosensible
CA270,577A CA1080009A (en) 1976-01-27 1977-01-27 Fabrication of rectangular relief profiles in photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3085/76A GB1537703A (en) 1976-01-27 1976-01-27 Fabrication of rectangular relief profiles in photoresist

Publications (1)

Publication Number Publication Date
GB1537703A true GB1537703A (en) 1979-01-04

Family

ID=9751685

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3085/76A Expired GB1537703A (en) 1976-01-27 1976-01-27 Fabrication of rectangular relief profiles in photoresist

Country Status (7)

Country Link
US (1) US4082453A (enExample)
JP (1) JPS5293357A (enExample)
BE (1) BE850780A (enExample)
CA (1) CA1080009A (enExample)
DE (1) DE2703160C3 (enExample)
FR (1) FR2339883A1 (enExample)
GB (1) GB1537703A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111433559A (zh) * 2017-12-12 2020-07-17 科磊股份有限公司 增强计量目标信息内容

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1589766A (en) * 1976-10-26 1981-05-20 Rca Corp Fineline diffractive subtractive colour filters
DE2657246C2 (de) * 1976-12-17 1978-09-28 Hoechst Ag, 6000 Frankfurt Original eines Informationsträgers, Verfahren zum Herstellen des Originals, Verfahren zum Herstellen einer Matrize zum Prägen des Originals sowie Informa tionsträger, der mit der Matrize hergestellt ist
DE2734581C2 (de) * 1977-08-01 1979-02-15 Hoechst Ag, 6000 Frankfurt Original eines Informationsträgers und Verfahren zum Herstellen des Originals
DE2734580C2 (de) * 1977-08-01 1979-02-15 Hoechst Ag, 6000 Frankfurt Verfahren zum Herstellen eines Originals eines Informationsträgers
US4372649A (en) * 1978-05-22 1983-02-08 Minnesota Mining And Manufacturing Company Extended area diffractive subtractive color filters
DE2826380A1 (de) 1978-06-16 1980-01-03 Hoechst Ag Farbauszugstransparent und verfahren zu seiner herstellung
US4239790A (en) * 1979-09-12 1980-12-16 Rca Corporation Method of defining a photoresist layer
US4308337A (en) * 1980-03-10 1981-12-29 Rca Corporation Uniform light exposure of positive photoresist for replicating spiral groove in plastic substrate
JPS5855752U (ja) * 1981-10-09 1983-04-15 松下電器産業株式会社 電気掃除機のキヤスタ−取付装置
CA1270934C (en) * 1985-03-20 1990-06-26 SPATIAL PHASE MODULATED MASKS AND METHODS FOR MAKING THESE MASKS AND PHASE DIFFRACTION GRATINGS
JPS6242102A (ja) * 1985-08-20 1987-02-24 Pioneer Electronic Corp マイクロフレネルレンズの製造方法
GB8528698D0 (en) * 1985-11-21 1985-12-24 Plasmon Data Systems Nv Photolithography
US4828356A (en) * 1987-12-22 1989-05-09 Hughes Aircraft Company Method for fabrication of low efficiency diffraction gratings and product obtained thereby
US6030851A (en) * 1995-06-07 2000-02-29 Grandmont; Paul E. Method for overpressure protected pressure sensor
JP3407477B2 (ja) * 1995-06-08 2003-05-19 松下電器産業株式会社 位相格子とその作製方法並びに光学式エンコーダ
JP3437517B2 (ja) * 1999-02-16 2003-08-18 キヤノン株式会社 二次元位相型光学素子の作製方法
US6972853B1 (en) * 2002-09-27 2005-12-06 Advanced Micro Devices, Inc. Methods of calibrating and controlling stepper exposure processes and tools, and system for accomplishing same
US7648641B2 (en) * 2005-06-17 2010-01-19 Hitachi Global Storage Technologies Netherlands B.V. Method and apparatus for creating a topographically patterned substrate
US20080264553A1 (en) * 2007-04-27 2008-10-30 Hewlett-Packard Development Company Lp Embossing
US20100003605A1 (en) * 2008-07-07 2010-01-07 International Business Machines Corporation system and method for projection lithography with immersed image-aligned diffractive element
RU2573160C2 (ru) * 2009-03-30 2016-01-20 Боэгли-Гравюр С.А. Способ и устройство для структурирования поверхности твердого тела покрытого твердым материалом, с помощью лазера
WO2010111798A1 (en) 2009-03-30 2010-10-07 Boegli-Gravures S.A. Method and device for structuring a solid body surface with a hard coating with a first laser with pulses in the nanosecond field and a second laser with pulses in the pico- or femtosecond field
JP5330205B2 (ja) * 2009-11-26 2013-10-30 株式会社東芝 露光方法
TWI831898B (zh) * 2019-01-15 2024-02-11 德商卡爾蔡司Ｓｍｔ有限公司 藉由破壞性干涉抑制至少一目標波長的光學繞射元件
KR20220056235A (ko) * 2019-09-06 2022-05-04 배 시스템즈 피엘시 도파로 및 도파로 마스터 격자 툴 제조 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB941809A (en) * 1961-07-06 1963-11-13 Russel John Searle Elevatable roof for a vehicle
GB1108432A (en) * 1963-11-22 1968-04-03 Auto Sleepers Ltd Improvements in or relating to roofs for vans or the like
GB1108433A (en) * 1963-11-29 1968-04-03 Auto Sleepers Ltd Improvements in or relating to roof structures
US3212813A (en) * 1964-07-27 1965-10-19 Freeway Travelers Inc Vehicle with extensible top
GB1206401A (en) * 1966-12-05 1970-09-23 Pavelle Ltd Improvements in or relating to colour correction filters in or for photographic colour printing or enlarging apparatus
DE1623803B2 (de) * 1967-02-11 1971-11-11 Rudolph, Dietbert, Dipl.-Phys., 3401 Menger shausen; Schmahl, Günter, Dipl.-Phys. Dr., 3400 Göttingen Verfahren zur herstellung von reflexions und transmissions gittern
BE723202A (enExample) * 1967-12-07 1969-04-01
US3669673A (en) * 1970-10-23 1972-06-13 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3697178A (en) * 1971-11-01 1972-10-10 Rca Corp Method of projection printing photoresist masking layers, including elimination of spurious diffraction-associated patterns from the print
JPS5425380B2 (enExample) * 1972-02-15 1979-08-28
US3891300A (en) * 1972-09-09 1975-06-24 Hitachi Ltd Apparatus for making hologram
GB1385118A (en) * 1972-10-17 1975-02-26 Ci Autohomes Ltd Elevating roof
US3936301A (en) * 1974-04-01 1976-02-03 Bell Telephone Laboratories, Incorporated Process for contact photolithography utilizing a photomask having indented channels
US3945825A (en) * 1974-05-22 1976-03-23 Rca Corporation Method for producing width-modulated surface relief patterns
JPS5742849B2 (enExample) * 1974-06-05 1982-09-10
US3957354A (en) * 1975-02-03 1976-05-18 Rca Corporation Diffractive subtractive color filtering technique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111433559A (zh) * 2017-12-12 2020-07-17 科磊股份有限公司 增强计量目标信息内容

Also Published As

Publication number Publication date
BE850780A (fr) 1977-07-26
CA1080009A (en) 1980-06-24
FR2339883A1 (fr) 1977-08-26
DE2703160A1 (de) 1977-07-28
FR2339883B1 (enExample) 1982-02-26
DE2703160C3 (de) 1980-06-26
US4082453A (en) 1978-04-04
JPS5530608B2 (enExample) 1980-08-12
DE2703160B2 (de) 1979-10-04
JPS5293357A (en) 1977-08-05

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]