GB1521950A - Method of insulating a metallization pattern - Google Patents

Method of insulating a metallization pattern

Info

Publication number
GB1521950A
GB1521950A GB26166/77A GB2616677A GB1521950A GB 1521950 A GB1521950 A GB 1521950A GB 26166/77 A GB26166/77 A GB 26166/77A GB 2616677 A GB2616677 A GB 2616677A GB 1521950 A GB1521950 A GB 1521950A
Authority
GB
United Kingdom
Prior art keywords
metallization
quartz
insulating
layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB26166/77A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1521950A publication Critical patent/GB1521950A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P14/683—
    • H10P14/6342—
    • H10W20/092—

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Thin Film Transistor (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Weting (AREA)
  • Formation Of Insulating Films (AREA)
GB26166/77A 1976-07-03 1977-06-22 Method of insulating a metallization pattern Expired GB1521950A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762629996 DE2629996A1 (de) 1976-07-03 1976-07-03 Verfahren zur passivierung und planarisierung eines metallisierungsmusters

Publications (1)

Publication Number Publication Date
GB1521950A true GB1521950A (en) 1978-08-23

Family

ID=5982138

Family Applications (1)

Application Number Title Priority Date Filing Date
GB26166/77A Expired GB1521950A (en) 1976-07-03 1977-06-22 Method of insulating a metallization pattern

Country Status (5)

Country Link
US (1) US4089766A (OSRAM)
JP (1) JPS536588A (OSRAM)
DE (1) DE2629996A1 (OSRAM)
FR (1) FR2357070A1 (OSRAM)
GB (1) GB1521950A (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4176029A (en) * 1978-03-02 1979-11-27 Sperry Rand Corporation Subminiature bore and conductor formation
US4263603A (en) * 1978-03-02 1981-04-21 Sperry Corporation Subminiature bore and conductor formation
US4244799A (en) * 1978-09-11 1981-01-13 Bell Telephone Laboratories, Incorporated Fabrication of integrated circuits utilizing thick high-resolution patterns
US4222816A (en) * 1978-12-26 1980-09-16 International Business Machines Corporation Method for reducing parasitic capacitance in integrated circuit structures
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
US4481070A (en) * 1984-04-04 1984-11-06 Advanced Micro Devices, Inc. Double planarization process for multilayer metallization of integrated circuit structures
US4541169A (en) * 1984-10-29 1985-09-17 International Business Machines Corporation Method for making studs for interconnecting metallization layers at different levels in a semiconductor chip
US4654120A (en) * 1985-10-31 1987-03-31 International Business Machines Corporation Method of making a planar trench semiconductor structure
US4721689A (en) * 1986-08-28 1988-01-26 International Business Machines Corporation Method for simultaneously forming an interconnection level and via studs
US6107674A (en) * 1993-05-05 2000-08-22 Ixys Corporation Isolated multi-chip devices
US6147393A (en) * 1993-05-05 2000-11-14 Ixys Corporation Isolated multi-chip devices
DE19720974C1 (de) * 1997-05-20 1998-07-02 Deutsche Spezialglas Ag Vorsatzfilter für selbstleuchtende Bildschirme

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2547792C3 (de) * 1974-10-25 1978-08-31 Hitachi, Ltd., Tokio Verfahren zur Herstellung eines Halbleiterbauelementes

Also Published As

Publication number Publication date
US4089766A (en) 1978-05-16
JPS536588A (en) 1978-01-21
FR2357070A1 (fr) 1978-01-27
DE2629996A1 (de) 1978-01-05
FR2357070B1 (OSRAM) 1980-02-08

Similar Documents

Publication Publication Date Title
GB1521950A (en) Method of insulating a metallization pattern
IE812455L (en) Plasma-assisted etching process
EP0304077A3 (en) Method of forming a fine pattern
CA2006175A1 (en) Method of forming patterned silicone rubber layer
US3808070A (en) Beveled edge photoetching of metal-iron film
JPS57204165A (en) Manufacture of charge coupling element
GB1440349A (en) Method of manufacturing etched patterns
JPS57143826A (en) Formation of resist pattern on gapped semiconductor substrate
JPS6421988A (en) Semiconductor laser device
EP0385447A3 (en) Process for preparing of semiconductor device and pattern-forming coating solution used for this process
JPS5643729A (en) Formation of fine pattern
JPS6457719A (en) Forming method for resist pattern
JPS5687326A (en) Method of forming wiring
JPS5635421A (en) Manufacture of minute structure
JPS5687343A (en) Forming method of wiring
JPS6450527A (en) Manufacture of semiconductor device
JPS56144553A (en) Manufacture of semiconductor device
JPS641215A (en) Manufacture of magnetic thin film
JPS57102050A (en) Manufacture of semiconductor device
JPS645018A (en) Dry etching method
JPS5643744A (en) Manufacture of semiconductor device
JPS55150254A (en) Semiconductor device
JPS574116A (en) Manufacture of semiconductor substrate
JPS6411399A (en) Etching of thin film pattern
JPS5690539A (en) Production of semiconductor device

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee