GB1518911A - Ion plating method - Google Patents

Ion plating method

Info

Publication number
GB1518911A
GB1518911A GB123676A GB123676A GB1518911A GB 1518911 A GB1518911 A GB 1518911A GB 123676 A GB123676 A GB 123676A GB 123676 A GB123676 A GB 123676A GB 1518911 A GB1518911 A GB 1518911A
Authority
GB
United Kingdom
Prior art keywords
ionized
electrode
particles
ion
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB123676A
Other languages
English (en)
Inventor
Toshinori Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of GB1518911A publication Critical patent/GB1518911A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
GB123676A 1975-01-13 1976-01-13 Ion plating method Expired GB1518911A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP666675A JPS5181791A (ja) 1975-01-13 1975-01-13 Ionkapureeteinguhoho

Publications (1)

Publication Number Publication Date
GB1518911A true GB1518911A (en) 1978-07-26

Family

ID=11644687

Family Applications (1)

Application Number Title Priority Date Filing Date
GB123676A Expired GB1518911A (en) 1975-01-13 1976-01-13 Ion plating method

Country Status (2)

Country Link
JP (1) JPS5181791A (enrdf_load_html_response)
GB (1) GB1518911A (enrdf_load_html_response)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017360A3 (en) * 1979-03-19 1980-10-29 Xerox Corporation Method of pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon, and optical recording medium produced thereby
US4310614A (en) 1979-03-19 1982-01-12 Xerox Corporation Method and apparatus for pretreating and depositing thin films on substrates
DE3441471A1 (de) * 1983-11-15 1985-05-23 Mitsubishi Denki K.K., Tokio/Tokyo Filmabscheidungsvorrichtung
DE3605486A1 (de) * 1985-03-29 1986-10-09 Mitsubishi Denki K.K., Tokio/Tokyo Verdampfungsapparat und verwendung desselben
GB2200654A (en) * 1987-01-22 1988-08-10 Ion Coat Ltd Heating enhancement of resistive evaporation sources in ionisation assisted physical vapour deposition
DE3790317C2 (enrdf_load_html_response) * 1986-06-18 1990-06-07 Ricoh Co., Ltd., Tokio/Tokyo, Jp
DE4120941A1 (de) * 1990-06-25 1992-01-09 Mitsubishi Electric Corp Vorrichtung zum aufbringen von duennschichten

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5197544A (en) * 1975-02-26 1976-08-27 Kuroomuhimakuno keiseihoho
CA1040230A (en) * 1975-10-10 1978-10-10 Lawrence A. Bergman Flexible sealing joint
JPS53131984A (en) * 1977-04-25 1978-11-17 Nippon Electron Optics Lab Ion plating apparatus
JPS58221271A (ja) * 1982-06-18 1983-12-22 Citizen Watch Co Ltd イオンプレ−テイング法による被膜形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE790940A (fr) * 1971-11-04 1973-03-01 Rca Corp Procede de reglage de la composition d'un film

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017360A3 (en) * 1979-03-19 1980-10-29 Xerox Corporation Method of pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon, and optical recording medium produced thereby
US4310614A (en) 1979-03-19 1982-01-12 Xerox Corporation Method and apparatus for pretreating and depositing thin films on substrates
DE3441471A1 (de) * 1983-11-15 1985-05-23 Mitsubishi Denki K.K., Tokio/Tokyo Filmabscheidungsvorrichtung
DE3605486A1 (de) * 1985-03-29 1986-10-09 Mitsubishi Denki K.K., Tokio/Tokyo Verdampfungsapparat und verwendung desselben
DE3790317C2 (enrdf_load_html_response) * 1986-06-18 1990-06-07 Ricoh Co., Ltd., Tokio/Tokyo, Jp
GB2200654A (en) * 1987-01-22 1988-08-10 Ion Coat Ltd Heating enhancement of resistive evaporation sources in ionisation assisted physical vapour deposition
GB2200654B (en) * 1987-01-22 1991-02-20 Ion Coat Ltd Heating enchancement of resistive evaporation sources in ionisation assisted physical vapour deposition
DE4120941A1 (de) * 1990-06-25 1992-01-09 Mitsubishi Electric Corp Vorrichtung zum aufbringen von duennschichten
US5180477A (en) * 1990-06-25 1993-01-19 Mitsubishi Denki Kabushiki Kaisha Thin film deposition apparatus

Also Published As

Publication number Publication date
JPS5181791A (ja) 1976-07-17
JPS5521107B2 (enrdf_load_html_response) 1980-06-07

Similar Documents

Publication Publication Date Title
GB1483966A (en) Vapourized-metal cluster ion source and ionized-cluster beam deposition
DE68915012T2 (de) Anlage zur Erzeugung von Dünnschichten und Ionenquelle unter Anwendung von Plasmazerstäubung.
US4935623A (en) Production of energetic atom beams
GB1518911A (en) Ion plating method
GB1209266A (en) Improvements in methods and apparatus for making electrical conductive pattern
DE4217450C2 (de) Ionenbedampfungsverfahren und -vorrichtung
DE2601066B2 (de) Plattierungsverfahren
AU5022496A (en) An electron jet vapor deposition system
DE3787705D1 (de) Vorrichtung und Verfahren zum Auftragen von Dünnschichtüberzügen im Vacuum.
HK67587A (en) Method for pure ion plating using magnetic fields
GB2039500A (en) Deposition of thin film organic coatings
GB1457165A (en) Electron beam vaporizer
JPS57106513A (en) Formation of carbon film
GB1500701A (en) Vapour deposition apparatus
GB1532759A (en) Production of monocrystalline layers on substrates
US2736809A (en) Ion generator and projector
GB1482219A (en) Coating members with a material by explosive vapourisatio
DE4011515C1 (en) Coating substrate with metal (alloy) - by magnetic sputtering, with substrate mounted on surface held at negative voltage
DD244149A1 (de) Verfahren zur abscheidung von ic-schichten
DE69808267T2 (de) Verfahren und vorrichtung für pvd beschichtung
GB1324653A (en) Electroless plating processes
Novikov et al. Mass Spectrometry of Ions Emitted by Impact of Micrometeoric Particles on Materials
DE2122336A1 (de) Verfahren zum Niederschlagen von Metall mittels Aufstäuben aus flüssiger Phase
JPS5278777A (en) Ion plating apparatus
FR2208708A1 (en) Vacuum deposition of catalyst - from atomic dispersion produced by bombarding target with accelerated ions

Legal Events

Date Code Title Description
PS Patent sealed
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19950113