JPS5521107B2 - - Google Patents

Info

Publication number
JPS5521107B2
JPS5521107B2 JP666675A JP666675A JPS5521107B2 JP S5521107 B2 JPS5521107 B2 JP S5521107B2 JP 666675 A JP666675 A JP 666675A JP 666675 A JP666675 A JP 666675A JP S5521107 B2 JPS5521107 B2 JP S5521107B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP666675A
Other languages
Japanese (ja)
Other versions
JPS5181791A (ja
Inventor
Toshinori Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP666675A priority Critical patent/JPS5181791A/ja
Priority to US05/648,296 priority patent/US4082636A/en
Priority to DE2601066A priority patent/DE2601066B2/de
Priority to GB123676A priority patent/GB1518911A/en
Publication of JPS5181791A publication Critical patent/JPS5181791A/ja
Publication of JPS5521107B2 publication Critical patent/JPS5521107B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP666675A 1975-01-13 1975-01-13 Ionkapureeteinguhoho Granted JPS5181791A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP666675A JPS5181791A (ja) 1975-01-13 1975-01-13 Ionkapureeteinguhoho
US05/648,296 US4082636A (en) 1975-01-13 1976-01-12 Ion plating method
DE2601066A DE2601066B2 (de) 1975-01-13 1976-01-13 Plattierungsverfahren
GB123676A GB1518911A (en) 1975-01-13 1976-01-13 Ion plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP666675A JPS5181791A (ja) 1975-01-13 1975-01-13 Ionkapureeteinguhoho

Publications (2)

Publication Number Publication Date
JPS5181791A JPS5181791A (ja) 1976-07-17
JPS5521107B2 true JPS5521107B2 (enrdf_load_html_response) 1980-06-07

Family

ID=11644687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP666675A Granted JPS5181791A (ja) 1975-01-13 1975-01-13 Ionkapureeteinguhoho

Country Status (2)

Country Link
JP (1) JPS5181791A (enrdf_load_html_response)
GB (1) GB1518911A (enrdf_load_html_response)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5197544A (en) * 1975-02-26 1976-08-27 Kuroomuhimakuno keiseihoho
CA1040230A (en) * 1975-10-10 1978-10-10 Lawrence A. Bergman Flexible sealing joint
JPS53131984A (en) * 1977-04-25 1978-11-17 Nippon Electron Optics Lab Ion plating apparatus
DE3069815D1 (en) * 1979-03-19 1985-01-31 Xerox Corp Method and apparatus for pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon
US4310614A (en) 1979-03-19 1982-01-12 Xerox Corporation Method and apparatus for pretreating and depositing thin films on substrates
JPS58221271A (ja) * 1982-06-18 1983-12-22 Citizen Watch Co Ltd イオンプレ−テイング法による被膜形成方法
JPS60106126A (ja) * 1983-11-15 1985-06-11 Mitsubishi Electric Corp 薄膜形成装置
JPS61227165A (ja) * 1985-03-29 1986-10-09 Mitsubishi Electric Corp 蒸着装置
WO1987007916A1 (en) * 1986-06-18 1987-12-30 Ricoh Company, Ltd. Thin film forming apparatus
GB8701414D0 (en) * 1987-01-22 1987-02-25 Matthews A Heating enhancement in physical vapour deposition
JPH089774B2 (ja) * 1990-06-25 1996-01-31 三菱電機株式会社 薄膜形成装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE790940A (fr) * 1971-11-04 1973-03-01 Rca Corp Procede de reglage de la composition d'un film

Also Published As

Publication number Publication date
GB1518911A (en) 1978-07-26
JPS5181791A (ja) 1976-07-17

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