GB1518911A - Ion plating method - Google Patents

Ion plating method

Info

Publication number
GB1518911A
GB1518911A GB123676A GB123676A GB1518911A GB 1518911 A GB1518911 A GB 1518911A GB 123676 A GB123676 A GB 123676A GB 123676 A GB123676 A GB 123676A GB 1518911 A GB1518911 A GB 1518911A
Authority
GB
United Kingdom
Prior art keywords
ionized
electrode
particles
ion
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB123676A
Inventor
Toshinori Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of GB1518911A publication Critical patent/GB1518911A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

1518911 Ion-plating SHARP KK 13 Jan 1976 [13 Jan 1975] 01236/76 Heading C7F In an ion-plating method, material to be deposited on a substrate is ionized, and the ionized particles plus neutral particles of the material are advanced past an accelerating electrode toward the substrate, the accelerating or decelerating voltage applied to the electrode being varied to form a sequence of deposited films having different properties depending upon the incident particle energy and/or ratio of neutral to ionized incident particles. Some of the particles may be advanced as ion clusters, as described in Specification No. 1483966. As shown, material 24 is evaporated by heating crucible 31 by electron beams from filament 33, and vapour passes through orifice 26 to be ionized by electron cloud 29 produced between electrode 28 and filament 27. The ionized material is accelerated by electrode 30 to strike substrate 32 on biased holder 23, the relative amounts of ionized and unionized material and the nature and sequence of films being determined by the various applied potentials. The applied potential may have an interrupted waveform Fig. 2 (not shown); deposition of Cu on glass and the effect of different accelerating potentials are described.
GB123676A 1975-01-13 1976-01-13 Ion plating method Expired GB1518911A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP666675A JPS5181791A (en) 1975-01-13 1975-01-13 IONKAPUREETEINGUHOHO

Publications (1)

Publication Number Publication Date
GB1518911A true GB1518911A (en) 1978-07-26

Family

ID=11644687

Family Applications (1)

Application Number Title Priority Date Filing Date
GB123676A Expired GB1518911A (en) 1975-01-13 1976-01-13 Ion plating method

Country Status (2)

Country Link
JP (1) JPS5181791A (en)
GB (1) GB1518911A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017360A2 (en) * 1979-03-19 1980-10-15 Xerox Corporation Method and apparatus for pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon
DE3441471A1 (en) * 1983-11-15 1985-05-23 Mitsubishi Denki K.K., Tokio/Tokyo Film deposition apparatus
DE3605486A1 (en) * 1985-03-29 1986-10-09 Mitsubishi Denki K.K., Tokio/Tokyo EVAPORATOR AND USE THEREOF
GB2200654A (en) * 1987-01-22 1988-08-10 Ion Coat Ltd Heating enhancement of resistive evaporation sources in ionisation assisted physical vapour deposition
DE3790317C2 (en) * 1986-06-18 1990-06-07 Ricoh Co., Ltd., Tokio/Tokyo, Jp
DE4120941A1 (en) * 1990-06-25 1992-01-09 Mitsubishi Electric Corp DEVICE FOR APPLYING THIN LAYERS

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5197544A (en) * 1975-02-26 1976-08-27 Kuroomuhimakuno keiseihoho
CA1040230A (en) * 1975-10-10 1978-10-10 Lawrence A. Bergman Flexible sealing joint
JPS53131984A (en) * 1977-04-25 1978-11-17 Nippon Electron Optics Lab Ion plating apparatus
JPS58221271A (en) * 1982-06-18 1983-12-22 Citizen Watch Co Ltd Formation of film by ion plating method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE790940A (en) * 1971-11-04 1973-03-01 Rca Corp METHOD OF ADJUSTING THE COMPOSITION OF A FILM

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0017360A2 (en) * 1979-03-19 1980-10-15 Xerox Corporation Method and apparatus for pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon
EP0017360A3 (en) * 1979-03-19 1980-10-29 Xerox Corporation Method of pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon, and optical recording medium produced thereby
DE3441471A1 (en) * 1983-11-15 1985-05-23 Mitsubishi Denki K.K., Tokio/Tokyo Film deposition apparatus
DE3605486A1 (en) * 1985-03-29 1986-10-09 Mitsubishi Denki K.K., Tokio/Tokyo EVAPORATOR AND USE THEREOF
DE3790317C2 (en) * 1986-06-18 1990-06-07 Ricoh Co., Ltd., Tokio/Tokyo, Jp
GB2200654A (en) * 1987-01-22 1988-08-10 Ion Coat Ltd Heating enhancement of resistive evaporation sources in ionisation assisted physical vapour deposition
GB2200654B (en) * 1987-01-22 1991-02-20 Ion Coat Ltd Heating enchancement of resistive evaporation sources in ionisation assisted physical vapour deposition
DE4120941A1 (en) * 1990-06-25 1992-01-09 Mitsubishi Electric Corp DEVICE FOR APPLYING THIN LAYERS
US5180477A (en) * 1990-06-25 1993-01-19 Mitsubishi Denki Kabushiki Kaisha Thin film deposition apparatus

Also Published As

Publication number Publication date
JPS5521107B2 (en) 1980-06-07
JPS5181791A (en) 1976-07-17

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Legal Events

Date Code Title Description
PS Patent sealed
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19950113