GB1232868A - - Google Patents

Info

Publication number
GB1232868A
GB1232868A GB1232868DA GB1232868A GB 1232868 A GB1232868 A GB 1232868A GB 1232868D A GB1232868D A GB 1232868DA GB 1232868 A GB1232868 A GB 1232868A
Authority
GB
United Kingdom
Prior art keywords
mask
oct
substrate
distance
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1232868A publication Critical patent/GB1232868A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Abstract

1,232,868. Coating by vapour deposition. CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE. Oct. 4, 1968 [Oct. 5, 1967], No.47259/68. Heading C7F. In the vapour deposition of a material from a source 1, a uniform deposit is obtained by providing relative movement between the substrate and a mask 6 having apertures shaped according to the formula. where a is the distance for a point to the axis of the beam, k is the number of apertures in the mask, E is the thickness of the deposit at the point, z the distance between the source and the mask, and I r the intensity of the beam. In a modification Fig. 4 (not shown) the substrate is reciprocated with respect to the mask.
GB1232868D 1967-10-05 1968-10-04 Expired GB1232868A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR123432A FR1545890A (en) 1967-10-05 1967-10-05 Improvements to methods and devices for spraying molecules and to supports coated by the molecules thus projected

Publications (1)

Publication Number Publication Date
GB1232868A true GB1232868A (en) 1971-05-19

Family

ID=8639579

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1232868D Expired GB1232868A (en) 1967-10-05 1968-10-04

Country Status (5)

Country Link
AT (1) AT289500B (en)
DE (1) DE1801443A1 (en)
FR (1) FR1545890A (en)
GB (1) GB1232868A (en)
NL (1) NL6814242A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2419523A1 (en) * 1978-03-07 1979-10-05 Angenieux P Ets Vacuum plating rig for aspheric optical surfaces - has three masks controlling deposition from electron bombarded source
DE2815704C3 (en) * 1978-04-12 1981-06-25 W.C. Heraeus Gmbh, 6450 Hanau Method and device for the production of rotationally symmetrical graduated filters
FR2581793B1 (en) * 1985-05-07 1988-04-29 Duruy Nicolas METHOD AND DEVICE FOR MANUFACTURING ELECTRONIC OR OPTOELECTRONIC COMPONENTS WITH VACUUM EVAPORATION DEPOSITION
JPH06503209A (en) * 1991-03-07 1994-04-07 ハネウエル・インコーポレーテッド Method and apparatus for concave substrates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films

Also Published As

Publication number Publication date
DE1801443A1 (en) 1969-05-08
NL6814242A (en) 1969-04-09
FR1545890A (en) 1968-11-15
AT289500B (en) 1971-04-26

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees