GB1507992A - Photosensitive epoxy resin composition for image formatio - Google Patents
Photosensitive epoxy resin composition for image formatioInfo
- Publication number
- GB1507992A GB1507992A GB51440/75A GB5144075A GB1507992A GB 1507992 A GB1507992 A GB 1507992A GB 51440/75 A GB51440/75 A GB 51440/75A GB 5144075 A GB5144075 A GB 5144075A GB 1507992 A GB1507992 A GB 1507992A
- Authority
- GB
- United Kingdom
- Prior art keywords
- epoxy resin
- amine
- formatio
- image
- bisphenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003822 epoxy resin Substances 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 title abstract 3
- 229920000647 polyepoxide Polymers 0.000 title abstract 3
- 150000001412 amines Chemical class 0.000 abstract 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 abstract 2
- 230000002829 reductive effect Effects 0.000 abstract 2
- ZEYKLMDPUOVUCR-UHFFFAOYSA-N 2-chloro-5-(trifluoromethyl)benzenesulfonyl chloride Chemical compound FC(F)(F)C1=CC=C(Cl)C(S(Cl)(=O)=O)=C1 ZEYKLMDPUOVUCR-UHFFFAOYSA-N 0.000 abstract 1
- 229920006310 Asahi-Kasei Polymers 0.000 abstract 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 abstract 1
- 239000004593 Epoxy Substances 0.000 abstract 1
- 229910021576 Iron(III) bromide Inorganic materials 0.000 abstract 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 150000007942 carboxylates Chemical group 0.000 abstract 1
- 239000013522 chelant Substances 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 abstract 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 150000003335 secondary amines Chemical class 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 229910052714 tellurium Inorganic materials 0.000 abstract 1
- SWLJJEFSPJCUBD-UHFFFAOYSA-N tellurium tetrachloride Chemical compound Cl[Te](Cl)(Cl)Cl SWLJJEFSPJCUBD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052716 thallium Inorganic materials 0.000 abstract 1
- FEONEKOZSGPOFN-UHFFFAOYSA-K tribromoiron Chemical compound Br[Fe](Br)Br FEONEKOZSGPOFN-UHFFFAOYSA-K 0.000 abstract 1
- 125000005289 uranyl group Chemical group 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14573274A JPS5337120B2 (en:Method) | 1974-12-20 | 1974-12-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1507992A true GB1507992A (en) | 1978-04-19 |
Family
ID=15391849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB51440/75A Expired GB1507992A (en) | 1974-12-20 | 1975-12-16 | Photosensitive epoxy resin composition for image formatio |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4220707A (en:Method) |
| JP (1) | JPS5337120B2 (en:Method) |
| CH (1) | CH602855A5 (en:Method) |
| DE (1) | DE2557078C3 (en:Method) |
| FR (1) | FR2295456A1 (en:Method) |
| GB (1) | GB1507992A (en:Method) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4102686A (en) * | 1977-02-25 | 1978-07-25 | Polychrome Corporation | Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin |
| US4439517A (en) * | 1982-01-21 | 1984-03-27 | Ciba-Geigy Corporation | Process for the formation of images with epoxide resin |
| US4564578A (en) * | 1982-11-25 | 1986-01-14 | Ciba-Geigy Corporation | Novel thioxanthones substituted by alpha-aminoalkyl groups |
| JPS59191034A (ja) * | 1983-04-14 | 1984-10-30 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
| JPS61166827A (ja) * | 1985-01-17 | 1986-07-28 | Toray Ind Inc | 変性エポキシ系微粒子 |
| US6733950B2 (en) * | 2001-03-14 | 2004-05-11 | General Electric Company | Limited play data storage media and method for limiting access to data thereon |
| US6645696B1 (en) * | 2001-11-30 | 2003-11-11 | Euv Llc. | Photoimageable composition |
| US20030198892A1 (en) * | 2002-04-22 | 2003-10-23 | General Electric Company | Limited play data storage media and method for limiting access to data thereon |
| US20030205323A1 (en) * | 2002-04-22 | 2003-11-06 | General Electric Company | Method for making limited play data storage media |
| US20040087692A1 (en) * | 2002-10-30 | 2004-05-06 | Dixit Arun Nandkishor | Method for preparation of an anthraquinone colorant composition |
| US7087282B2 (en) * | 2003-07-15 | 2006-08-08 | General Electric Company | Limited play optical storage medium, method for making the same |
| US7202292B2 (en) * | 2003-07-15 | 2007-04-10 | General Electric Company | Colored polymeric resin composition with 1,8-diaminoanthraquinone derivative, article made therefrom, and method for making the same |
| US11906901B2 (en) | 2021-06-07 | 2024-02-20 | International Business Machines Corporation | Alternating copolymer chain scission photoresists |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE661650A (en:Method) | 1964-03-26 | 1965-09-27 | ||
| CH478903A (de) | 1965-08-09 | 1969-09-30 | Minnesota Mining & Mfg | Uberzugsmasse |
| US3709861A (en) * | 1970-12-14 | 1973-01-09 | Shell Oil Co | Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds |
| US3817850A (en) * | 1971-05-18 | 1974-06-18 | American Can Co | Photopolymerizable epoxy systems containing substituted acyclic amides or substituted ureas as gelation inhibitors |
| US3721617A (en) * | 1971-05-18 | 1973-03-20 | American Can Co | Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors |
| US3980483A (en) * | 1972-04-24 | 1976-09-14 | Nippon Oil Seal Industry Co., Ltd. | Photocurable composition |
| CH576739A5 (en:Method) * | 1972-08-25 | 1976-06-15 | Ciba Geigy Ag | |
| JPS5015260B2 (en:Method) * | 1972-11-14 | 1975-06-03 | ||
| DE2406400B2 (de) * | 1973-02-14 | 1977-04-28 | Hitachi Chemical Co., Ltd., Tokio | Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen |
| US3977878A (en) * | 1973-06-11 | 1976-08-31 | American Can Company | Epoxy resin photoresist with iodoform and bismuth triphenyl |
| US3951769A (en) * | 1974-03-01 | 1976-04-20 | American Can Company | Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing |
-
1974
- 1974-12-20 JP JP14573274A patent/JPS5337120B2/ja not_active Expired
-
1975
- 1975-12-16 GB GB51440/75A patent/GB1507992A/en not_active Expired
- 1975-12-18 DE DE2557078A patent/DE2557078C3/de not_active Expired
- 1975-12-18 CH CH1639975A patent/CH602855A5/xx not_active IP Right Cessation
- 1975-12-19 FR FR7539093A patent/FR2295456A1/fr active Granted
-
1978
- 1978-04-24 US US05/898,793 patent/US4220707A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE2557078B2 (de) | 1978-01-05 |
| DE2557078C3 (de) | 1978-09-07 |
| DE2557078A1 (de) | 1976-06-24 |
| FR2295456B1 (en:Method) | 1978-05-19 |
| JPS5173100A (en:Method) | 1976-06-24 |
| JPS5337120B2 (en:Method) | 1978-10-06 |
| US4220707A (en) | 1980-09-02 |
| CH602855A5 (en:Method) | 1978-08-15 |
| FR2295456A1 (fr) | 1976-07-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |