JPS5337120B2 - - Google Patents

Info

Publication number
JPS5337120B2
JPS5337120B2 JP14573274A JP14573274A JPS5337120B2 JP S5337120 B2 JPS5337120 B2 JP S5337120B2 JP 14573274 A JP14573274 A JP 14573274A JP 14573274 A JP14573274 A JP 14573274A JP S5337120 B2 JPS5337120 B2 JP S5337120B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14573274A
Other languages
Japanese (ja)
Other versions
JPS5173100A (en:Method
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14573274A priority Critical patent/JPS5337120B2/ja
Priority to GB51440/75A priority patent/GB1507992A/en
Priority to DE2557078A priority patent/DE2557078C3/de
Priority to CH1639975A priority patent/CH602855A5/xx
Priority to FR7539093A priority patent/FR2295456A1/fr
Publication of JPS5173100A publication Critical patent/JPS5173100A/ja
Priority to US05/898,793 priority patent/US4220707A/en
Publication of JPS5337120B2 publication Critical patent/JPS5337120B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
JP14573274A 1974-12-20 1974-12-20 Expired JPS5337120B2 (en:Method)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP14573274A JPS5337120B2 (en:Method) 1974-12-20 1974-12-20
GB51440/75A GB1507992A (en) 1974-12-20 1975-12-16 Photosensitive epoxy resin composition for image formatio
DE2557078A DE2557078C3 (de) 1974-12-20 1975-12-18 Lichtempfindliche Masse
CH1639975A CH602855A5 (en:Method) 1974-12-20 1975-12-18
FR7539093A FR2295456A1 (fr) 1974-12-20 1975-12-19 Composition de resine epoxyde pour la formation d'images
US05/898,793 US4220707A (en) 1974-12-20 1978-04-24 Epoxy resin composition for image formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14573274A JPS5337120B2 (en:Method) 1974-12-20 1974-12-20

Publications (2)

Publication Number Publication Date
JPS5173100A JPS5173100A (en:Method) 1976-06-24
JPS5337120B2 true JPS5337120B2 (en:Method) 1978-10-06

Family

ID=15391849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14573274A Expired JPS5337120B2 (en:Method) 1974-12-20 1974-12-20

Country Status (6)

Country Link
US (1) US4220707A (en:Method)
JP (1) JPS5337120B2 (en:Method)
CH (1) CH602855A5 (en:Method)
DE (1) DE2557078C3 (en:Method)
FR (1) FR2295456A1 (en:Method)
GB (1) GB1507992A (en:Method)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4102686A (en) * 1977-02-25 1978-07-25 Polychrome Corporation Lithographic photosensitive compositions comprising acrylonitrile-butadiene-styrene terpolymer and novolak resin
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4564578A (en) * 1982-11-25 1986-01-14 Ciba-Geigy Corporation Novel thioxanthones substituted by alpha-aminoalkyl groups
JPS59191034A (ja) * 1983-04-14 1984-10-30 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS61166827A (ja) * 1985-01-17 1986-07-28 Toray Ind Inc 変性エポキシ系微粒子
US6733950B2 (en) * 2001-03-14 2004-05-11 General Electric Company Limited play data storage media and method for limiting access to data thereon
US6645696B1 (en) * 2001-11-30 2003-11-11 Euv Llc. Photoimageable composition
US20030198892A1 (en) * 2002-04-22 2003-10-23 General Electric Company Limited play data storage media and method for limiting access to data thereon
US20030205323A1 (en) * 2002-04-22 2003-11-06 General Electric Company Method for making limited play data storage media
US20040087692A1 (en) * 2002-10-30 2004-05-06 Dixit Arun Nandkishor Method for preparation of an anthraquinone colorant composition
US7087282B2 (en) * 2003-07-15 2006-08-08 General Electric Company Limited play optical storage medium, method for making the same
US7202292B2 (en) * 2003-07-15 2007-04-10 General Electric Company Colored polymeric resin composition with 1,8-diaminoanthraquinone derivative, article made therefrom, and method for making the same
US11906901B2 (en) 2021-06-07 2024-02-20 International Business Machines Corporation Alternating copolymer chain scission photoresists

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE661650A (en:Method) 1964-03-26 1965-09-27
CH478903A (de) 1965-08-09 1969-09-30 Minnesota Mining & Mfg Uberzugsmasse
US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds
US3817850A (en) * 1971-05-18 1974-06-18 American Can Co Photopolymerizable epoxy systems containing substituted acyclic amides or substituted ureas as gelation inhibitors
US3721617A (en) * 1971-05-18 1973-03-20 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
US3980483A (en) * 1972-04-24 1976-09-14 Nippon Oil Seal Industry Co., Ltd. Photocurable composition
CH576739A5 (en:Method) * 1972-08-25 1976-06-15 Ciba Geigy Ag
JPS5015260B2 (en:Method) * 1972-11-14 1975-06-03
DE2406400B2 (de) * 1973-02-14 1977-04-28 Hitachi Chemical Co., Ltd., Tokio Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen
US3977878A (en) * 1973-06-11 1976-08-31 American Can Company Epoxy resin photoresist with iodoform and bismuth triphenyl
US3951769A (en) * 1974-03-01 1976-04-20 American Can Company Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing

Also Published As

Publication number Publication date
DE2557078B2 (de) 1978-01-05
DE2557078C3 (de) 1978-09-07
DE2557078A1 (de) 1976-06-24
GB1507992A (en) 1978-04-19
FR2295456B1 (en:Method) 1978-05-19
JPS5173100A (en:Method) 1976-06-24
US4220707A (en) 1980-09-02
CH602855A5 (en:Method) 1978-08-15
FR2295456A1 (fr) 1976-07-16

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