KR910012810A - 가시방사선 감광성 조성물 - Google Patents
가시방사선 감광성 조성물Info
- Publication number
- KR910012810A KR910012810A KR1019900022239A KR900022239A KR910012810A KR 910012810 A KR910012810 A KR 910012810A KR 1019900022239 A KR1019900022239 A KR 1019900022239A KR 900022239 A KR900022239 A KR 900022239A KR 910012810 A KR910012810 A KR 910012810A
- Authority
- KR
- South Korea
- Prior art keywords
- visible radiation
- composition according
- photosensitive composition
- resin
- group
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims 18
- 239000000203 mixture Substances 0.000 title claims 16
- 239000011347 resin Substances 0.000 claims 20
- 229920005989 resin Polymers 0.000 claims 20
- 150000001875 compounds Chemical class 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 125000000129 anionic group Chemical group 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 239000003505 polymerization initiator Substances 0.000 claims 3
- -1 cinnamoyl Chemical group 0.000 claims 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- 229910017008 AsF 6 Inorganic materials 0.000 claims 1
- 229910015892 BF 4 Inorganic materials 0.000 claims 1
- 229910021115 PF 6 Inorganic materials 0.000 claims 1
- 229910018286 SbF 6 Inorganic materials 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 1
- 125000005078 alkoxycarbonylalkyl group Chemical group 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 125000002091 cationic group Chemical group 0.000 claims 1
- 239000008199 coating composition Substances 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 claims 1
- 230000009477 glass transition Effects 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000003010 ionic group Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000002195 soluble material Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 125000001302 tertiary amino group Chemical group 0.000 claims 1
- 101710179738 6,7-dimethyl-8-ribityllumazine synthase 1 Proteins 0.000 description 1
- 101710186608 Lipoyl synthase 1 Proteins 0.000 description 1
- 101710137584 Lipoyl synthase 1, chloroplastic Proteins 0.000 description 1
- 101710090391 Lipoyl synthase 1, mitochondrial Proteins 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 감광제 LS-1의 1R 흡수 스펙트럼을 나타낸다.
Claims (16)
- 다음 (a), (b), (c)를 포함하는 가시방사선 감광성 조성물(a) 광방사선 조사에 의하여 가교결합이나 중합반응을 할 수 있는 감광성기를 포함하는 광경화 수지,(b) 하기 구조식(i)으로 표시되는 감광제여기에서 R1과 R2는 동일하거나 다를 수 있는 저급알킬기이며, R3는 수소원자, 저급알킬기, 알콕시알킬기, 하이드로알콕시알킬기나 알콕시카보닐알킬기,(c) 중합반응개시제.
- 제1항에 있어서, 광경화수지(A)내에 포함된 감광성기는 (메트)아크릴로일, 시나모일과 알릴로서 이루어진 그룹으로부터 선택된 기임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지내의 감광성기의 함량은 0.2로부터 5.0몰/㎏에 이르는 범위내임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지(A)는 유리전이온도가 0℃ 이상이며, 수평균 분자량이 1,000로부터 100,000임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 사진식자용 수지(A)는 고산가의 아크릴을 기초로한 수지에 불포화 화합물을 포함하는 그리시딜을 첨가하여서 얻어진 음이온 수지임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지(A)는 고산가의 아크릴을 기초로한 수지를 포함하는 하이드록실을 시나모일 할라이드와 반응시켜서 얻어진 음이온 수지임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지(A)는 고산가의 아크릴을 기초로한 수지에 알릴글리시딜에텔을 첨가하여 얻어진 음이온수지임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지(A)는 감광성기를 포함하는 에틸렌적으로 불포화된 화합물과 이온성기를 가지는 결합제로 이루어짐을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지(A)는 수지 ㎏당 3차 아미노기나 오니움염기를 0.2-5몰 포함하는 양이온성수지임을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 감광제(B)는 하기 화학구조식으로부터 선택됨을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 감광제(B)는 광경화수지(A) 100중량부당, 0.1-10중량부 범위내에서 혼합됨을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 중합반응개시제(C)는 철-아렌 착화합물이나 티타노쎈 화합물임을 특징으로 하는 가시방사선 감광성 조성물.
- 제12항에 있어서, 철-아렌 착화합물은 일반식(Ⅰ), (Ⅱ) 또는 (Ⅲ)으로 표시됨을 특징으로 하는 가시 방사선 감광성 조성물.상기식에서 X는 BF4, PF6, AsF6또는 SbF6이며, R4와 R5는 탄소원자수 1-6을 가지는 직쇄나 분지된 알킬기임.
- 제12항에 있어서, 티타노쎈 화합물은 하기 구조식으로부터 선택됨을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 중합반응개시제(C)는 광경화수지(A) 100중량부당 0.1-25중량부 범위내에서 혼합됨을 특징으로 하는 가시방사선 감광성 조성물.
- 제1항에 있어서, 광경화수지(A)는 수용성 물질이거나 수분산성 물질임을 특징으로 하는 가시방사선 감광성 전착도료 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33827989 | 1989-12-28 | ||
JP???1-338279 | 1989-12-28 | ||
JP1-338279 | 1989-12-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910012810A true KR910012810A (ko) | 1991-08-08 |
KR940001555B1 KR940001555B1 (ko) | 1994-02-24 |
Family
ID=18316630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900022239A KR940001555B1 (ko) | 1989-12-28 | 1990-12-28 | 가시방사선 감광성 조성물 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5045434A (ko) |
EP (1) | EP0435262B1 (ko) |
KR (1) | KR940001555B1 (ko) |
CA (1) | CA2032630C (ko) |
DE (1) | DE69026228T2 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5246816A (en) * | 1990-09-03 | 1993-09-21 | Nippon Oil Co., Ltd. | Cationic electrodeposition negative type resist composition |
US5422204A (en) * | 1991-07-19 | 1995-06-06 | Canon Kabushiki Kaisha | Photo-crosslinkable resin composition and hologram recording medium |
JP3583455B2 (ja) * | 1994-02-01 | 2004-11-04 | 関西ペイント株式会社 | 回路板の製造方法 |
US5738974A (en) * | 1994-09-05 | 1998-04-14 | Mitsubishi Chemical Corporation | Photopolymerizable composition and photosensitive lithographic printing plate |
US5939148A (en) * | 1996-09-13 | 1999-08-17 | Kansai Paint Co., Ltd. | Visible laser-curable composition |
US6114092A (en) * | 1997-09-29 | 2000-09-05 | Kansai Paint Co., Ltd. | Photosensitive resin compositions for photoresist |
US5960743A (en) * | 1998-01-07 | 1999-10-05 | Oil-Dri Corporation Of America | Clay litter product for ammonia control in poultry pens |
US6093518A (en) * | 1998-02-09 | 2000-07-25 | Kansai Paint Co., Ltd. | Visible laser-curable composition |
US6232364B1 (en) * | 1999-02-18 | 2001-05-15 | Shimizu Co., Ltd. | Ultraviolet curable coating compositions for cationic electrodeposition applicable to metallic materials and electrically conductive plastic materials |
US6573380B2 (en) | 1999-03-09 | 2003-06-03 | Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo | 4-cyanocoumarin derivatives and uses thereof |
JP2001072683A (ja) * | 1999-03-09 | 2001-03-21 | Hayashibara Biochem Lab Inc | 4−シアノクマリン誘導体 |
CN108844931B (zh) * | 2018-05-23 | 2020-09-11 | 郑州大学 | Lzq荧光探针在同时检测so2衍生物和hsa中的应用 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4147552A (en) * | 1976-05-21 | 1979-04-03 | Eastman Kodak Company | Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers |
US4152159A (en) * | 1977-06-03 | 1979-05-01 | Eastman Kodak Company | Acid-resistant copolymer and photographic element incorporating same |
US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
US4289844A (en) * | 1979-06-18 | 1981-09-15 | Eastman Kodak Company | Photopolymerizable compositions featuring novel co-initiators |
US4743529A (en) * | 1986-11-21 | 1988-05-10 | Eastman Kodak Company | Negative working photoresists responsive to shorter visible wavelengths and novel coated articles |
-
1990
- 1990-12-18 CA CA002032630A patent/CA2032630C/en not_active Expired - Fee Related
- 1990-12-18 US US07/629,484 patent/US5045434A/en not_active Expired - Lifetime
- 1990-12-27 EP EP90125521A patent/EP0435262B1/en not_active Expired - Lifetime
- 1990-12-27 DE DE69026228T patent/DE69026228T2/de not_active Expired - Fee Related
- 1990-12-28 KR KR1019900022239A patent/KR940001555B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0435262A3 (en) | 1992-01-15 |
DE69026228D1 (de) | 1996-05-02 |
EP0435262B1 (en) | 1996-03-27 |
DE69026228T2 (de) | 1996-11-14 |
KR940001555B1 (ko) | 1994-02-24 |
US5045434A (en) | 1991-09-03 |
CA2032630C (en) | 1996-04-23 |
CA2032630A1 (en) | 1991-06-29 |
EP0435262A2 (en) | 1991-07-03 |
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