GB1507704A - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
GB1507704A
GB1507704A GB1641275A GB1641275A GB1507704A GB 1507704 A GB1507704 A GB 1507704A GB 1641275 A GB1641275 A GB 1641275A GB 1641275 A GB1641275 A GB 1641275A GB 1507704 A GB1507704 A GB 1507704A
Authority
GB
United Kingdom
Prior art keywords
aqueous alkaline
april
insoluble
vinyl acetate
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1641275A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of GB1507704A publication Critical patent/GB1507704A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
GB1641275A 1974-04-23 1975-04-21 Photopolymerisable compositions Expired GB1507704A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46331074A 1974-04-23 1974-04-23

Publications (1)

Publication Number Publication Date
GB1507704A true GB1507704A (en) 1978-04-19

Family

ID=23839658

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1641275A Expired GB1507704A (en) 1974-04-23 1975-04-21 Photopolymerisable compositions

Country Status (6)

Country Link
JP (1) JPS556210B2 (fr)
BE (1) BE828237A (fr)
CA (1) CA1056189A (fr)
DE (1) DE2517656B2 (fr)
FR (1) FR2269108B1 (fr)
GB (1) GB1507704A (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
EP0202690A2 (fr) 1981-06-08 1986-11-26 E.I. Du Pont De Nemours And Company Compositions photographiques contenant des composés cyclohexadiénones substitués
EP0339307A2 (fr) * 1988-04-29 1989-11-02 Du Pont De Nemours (Deutschland) Gmbh Procédé pour la production de masques pour métallisation et gravure
US7932016B2 (en) 2005-11-08 2011-04-26 Rohm And Haas Electronic Materials Llc Photosensitive composition
US10211409B2 (en) 2014-02-02 2019-02-19 Molecular Glasses, Inc. Noncrystallizable sensitized layers for OLED and OEDs

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
US4176028A (en) * 1977-03-22 1979-11-27 E. I. Du Pont De Nemours And Company Plastisols made with polyelectrolyte binders
DE2812015C3 (de) * 1977-03-22 1984-05-24 E.I. Du Pont De Nemours And Co., Wilmington, Del. Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung
DE2812016A1 (de) * 1977-03-22 1978-09-28 Du Pont Thermisch verschmelzbare acrylplastisol- oder organosoldispersionen
CA1127340A (fr) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Compose et materiau photodurcissable et photosensible
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
JP2756623B2 (ja) * 1992-02-26 1998-05-25 富士写真フイルム株式会社 光重合性組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (fr) * 1956-07-09
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2123702B2 (de) * 1971-05-13 1979-11-08 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines Reliefbildes
GB1425423A (en) * 1972-04-26 1976-02-18 Eastman Kodak Co Photopolymerisable compositions

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
EP0202690A2 (fr) 1981-06-08 1986-11-26 E.I. Du Pont De Nemours And Company Compositions photographiques contenant des composés cyclohexadiénones substitués
EP0339307A2 (fr) * 1988-04-29 1989-11-02 Du Pont De Nemours (Deutschland) Gmbh Procédé pour la production de masques pour métallisation et gravure
EP0339307A3 (fr) * 1988-04-29 1991-03-13 Du Pont De Nemours (Deutschland) Gmbh Procédé pour la production de masques pour métallisation et gravure
US7932016B2 (en) 2005-11-08 2011-04-26 Rohm And Haas Electronic Materials Llc Photosensitive composition
US8455175B2 (en) 2005-11-08 2013-06-04 Rohm And Haas Electronic Materials Llc Photosensitive composition
US10211409B2 (en) 2014-02-02 2019-02-19 Molecular Glasses, Inc. Noncrystallizable sensitized layers for OLED and OEDs

Also Published As

Publication number Publication date
DE2517656A1 (de) 1975-10-30
FR2269108B1 (fr) 1981-10-30
FR2269108A1 (fr) 1975-11-21
BE828237A (fr) 1975-10-22
JPS556210B2 (fr) 1980-02-14
CA1056189A (fr) 1979-06-12
JPS50147323A (fr) 1975-11-26
DE2517656B2 (de) 1980-11-13

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940421