GB1500959A - Photographic exposure device - Google Patents
Photographic exposure deviceInfo
- Publication number
- GB1500959A GB1500959A GB3163675A GB3163675A GB1500959A GB 1500959 A GB1500959 A GB 1500959A GB 3163675 A GB3163675 A GB 3163675A GB 3163675 A GB3163675 A GB 3163675A GB 1500959 A GB1500959 A GB 1500959A
- Authority
- GB
- United Kingdom
- Prior art keywords
- lamp
- mask
- arrangement
- disposed
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742439208 DE2439208A1 (de) | 1974-08-16 | 1974-08-16 | Belichtungsvorrichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1500959A true GB1500959A (en) | 1978-02-15 |
Family
ID=5923274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3163675A Expired GB1500959A (en) | 1974-08-16 | 1975-07-29 | Photographic exposure device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5139143A (https=) |
| DE (1) | DE2439208A1 (https=) |
| FR (1) | FR2282120A2 (https=) |
| GB (1) | GB1500959A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0567558A (ja) * | 1991-09-06 | 1993-03-19 | Nikon Corp | 露光方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT939738B (it) * | 1970-08-12 | 1973-02-10 | Rank Organisation Ltd | Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti |
-
1974
- 1974-08-16 DE DE19742439208 patent/DE2439208A1/de active Pending
-
1975
- 1975-07-03 FR FR7521474A patent/FR2282120A2/fr active Granted
- 1975-07-29 GB GB3163675A patent/GB1500959A/en not_active Expired
- 1975-07-31 JP JP50092644A patent/JPS5139143A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2282120A2 (fr) | 1976-03-12 |
| JPS5139143A (https=) | 1976-04-01 |
| DE2439208A1 (de) | 1976-03-11 |
| FR2282120B2 (https=) | 1977-07-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1391270A (en) | Photolithography | |
| US4702592A (en) | Reticle assembly, system, and method for using the same | |
| GB1307257A (en) | Optical method and apparatus for forming an array of discrete areas on a supporting surface | |
| US3526505A (en) | Holographic method of forming and aligning patterns on a photosensitive workpiece | |
| US3697178A (en) | Method of projection printing photoresist masking layers, including elimination of spurious diffraction-associated patterns from the print | |
| US5747221A (en) | Photolithography method and photolithography system for performing the method | |
| GB1500959A (en) | Photographic exposure device | |
| US3334541A (en) | Precision art work machine | |
| JPS5493974A (en) | Projection-system mask alignment unit | |
| SE8800836L (sv) | Anordning for steg- och repetitionssystem for direkt exponering for framstellning eller behandling av halvledarskivor | |
| GB1206650A (en) | Method and apparatus for the production of masks for use in the manufacture of planar transistors and integrated circuits | |
| US3610125A (en) | Apparatus for producing photolithographic structures,particularly on semiconductor crystal surfaces | |
| US3640197A (en) | Production of fine single lines and of discrete closely spaced fine lines | |
| US3663223A (en) | Process for making integrated circuit masks | |
| JPS5743420A (en) | Mask alignment method | |
| KR850002692A (ko) | X-선 노광 방법 및 장치 | |
| JPS5670553A (en) | Photomask for projection exposure | |
| GB628872A (en) | Improved method of manufacturing contact half-tone screens | |
| JPS55165631A (en) | Manufacture of semiconductor device | |
| KR960001367Y1 (ko) | 패턴 마스크 구조 | |
| GB988115A (en) | Method of fabricating semiconductor devices | |
| JPH0322904Y2 (https=) | ||
| JPH0650718B2 (ja) | 照明光学系及びそれを用いた露光装置 | |
| GB1233696A (https=) | ||
| JPS6220314A (ja) | 光線照射装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |