GB1500959A - Photographic exposure device - Google Patents

Photographic exposure device

Info

Publication number
GB1500959A
GB1500959A GB3163675A GB3163675A GB1500959A GB 1500959 A GB1500959 A GB 1500959A GB 3163675 A GB3163675 A GB 3163675A GB 3163675 A GB3163675 A GB 3163675A GB 1500959 A GB1500959 A GB 1500959A
Authority
GB
United Kingdom
Prior art keywords
lamp
mask
arrangement
disposed
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3163675A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1500959A publication Critical patent/GB1500959A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
GB3163675A 1974-08-16 1975-07-29 Photographic exposure device Expired GB1500959A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742439208 DE2439208A1 (de) 1974-08-16 1974-08-16 Belichtungsvorrichtung

Publications (1)

Publication Number Publication Date
GB1500959A true GB1500959A (en) 1978-02-15

Family

ID=5923274

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3163675A Expired GB1500959A (en) 1974-08-16 1975-07-29 Photographic exposure device

Country Status (4)

Country Link
JP (1) JPS5139143A (https=)
DE (1) DE2439208A1 (https=)
FR (1) FR2282120A2 (https=)
GB (1) GB1500959A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0567558A (ja) * 1991-09-06 1993-03-19 Nikon Corp 露光方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT939738B (it) * 1970-08-12 1973-02-10 Rank Organisation Ltd Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti

Also Published As

Publication number Publication date
FR2282120A2 (fr) 1976-03-12
JPS5139143A (https=) 1976-04-01
DE2439208A1 (de) 1976-03-11
FR2282120B2 (https=) 1977-07-22

Similar Documents

Publication Publication Date Title
GB1391270A (en) Photolithography
US4702592A (en) Reticle assembly, system, and method for using the same
GB1307257A (en) Optical method and apparatus for forming an array of discrete areas on a supporting surface
US3526505A (en) Holographic method of forming and aligning patterns on a photosensitive workpiece
US3697178A (en) Method of projection printing photoresist masking layers, including elimination of spurious diffraction-associated patterns from the print
US5747221A (en) Photolithography method and photolithography system for performing the method
GB1500959A (en) Photographic exposure device
US3334541A (en) Precision art work machine
JPS5493974A (en) Projection-system mask alignment unit
SE8800836L (sv) Anordning for steg- och repetitionssystem for direkt exponering for framstellning eller behandling av halvledarskivor
GB1206650A (en) Method and apparatus for the production of masks for use in the manufacture of planar transistors and integrated circuits
US3610125A (en) Apparatus for producing photolithographic structures,particularly on semiconductor crystal surfaces
US3640197A (en) Production of fine single lines and of discrete closely spaced fine lines
US3663223A (en) Process for making integrated circuit masks
JPS5743420A (en) Mask alignment method
KR850002692A (ko) X-선 노광 방법 및 장치
JPS5670553A (en) Photomask for projection exposure
GB628872A (en) Improved method of manufacturing contact half-tone screens
JPS55165631A (en) Manufacture of semiconductor device
KR960001367Y1 (ko) 패턴 마스크 구조
GB988115A (en) Method of fabricating semiconductor devices
JPH0322904Y2 (https=)
JPH0650718B2 (ja) 照明光学系及びそれを用いた露光装置
GB1233696A (https=)
JPS6220314A (ja) 光線照射装置

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee