DE2439208A1 - Belichtungsvorrichtung - Google Patents
BelichtungsvorrichtungInfo
- Publication number
- DE2439208A1 DE2439208A1 DE19742439208 DE2439208A DE2439208A1 DE 2439208 A1 DE2439208 A1 DE 2439208A1 DE 19742439208 DE19742439208 DE 19742439208 DE 2439208 A DE2439208 A DE 2439208A DE 2439208 A1 DE2439208 A1 DE 2439208A1
- Authority
- DE
- Germany
- Prior art keywords
- light source
- light
- exposing
- mask
- photoresist layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 claims description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 description 8
- 230000033001 locomotion Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742439208 DE2439208A1 (de) | 1974-08-16 | 1974-08-16 | Belichtungsvorrichtung |
| FR7521474A FR2282120A2 (fr) | 1974-08-16 | 1975-07-03 | Procede et dispositif d'exposition de couches sensibles a la lumiere avec suppression des lignes fantomes |
| GB3163675A GB1500959A (en) | 1974-08-16 | 1975-07-29 | Photographic exposure device |
| JP50092644A JPS5139143A (https=) | 1974-08-16 | 1975-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742439208 DE2439208A1 (de) | 1974-08-16 | 1974-08-16 | Belichtungsvorrichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2439208A1 true DE2439208A1 (de) | 1976-03-11 |
Family
ID=5923274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19742439208 Pending DE2439208A1 (de) | 1974-08-16 | 1974-08-16 | Belichtungsvorrichtung |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5139143A (https=) |
| DE (1) | DE2439208A1 (https=) |
| FR (1) | FR2282120A2 (https=) |
| GB (1) | GB1500959A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5715089A (en) * | 1991-09-06 | 1998-02-03 | Nikon Corporation | Exposure method and apparatus therefor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT939738B (it) * | 1970-08-12 | 1973-02-10 | Rank Organisation Ltd | Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti |
-
1974
- 1974-08-16 DE DE19742439208 patent/DE2439208A1/de active Pending
-
1975
- 1975-07-03 FR FR7521474A patent/FR2282120A2/fr active Granted
- 1975-07-29 GB GB3163675A patent/GB1500959A/en not_active Expired
- 1975-07-31 JP JP50092644A patent/JPS5139143A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5715089A (en) * | 1991-09-06 | 1998-02-03 | Nikon Corporation | Exposure method and apparatus therefor |
| US6094305A (en) * | 1991-09-06 | 2000-07-25 | Nikon Corporation | Exposure method and apparatus therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2282120A2 (fr) | 1976-03-12 |
| GB1500959A (en) | 1978-02-15 |
| JPS5139143A (https=) | 1976-04-01 |
| FR2282120B2 (https=) | 1977-07-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHW | Rejection |