GB1500959A - Photographic exposure device - Google Patents

Photographic exposure device

Info

Publication number
GB1500959A
GB1500959A GB3163675A GB3163675A GB1500959A GB 1500959 A GB1500959 A GB 1500959A GB 3163675 A GB3163675 A GB 3163675A GB 3163675 A GB3163675 A GB 3163675A GB 1500959 A GB1500959 A GB 1500959A
Authority
GB
United Kingdom
Prior art keywords
lamp
mask
arrangement
disposed
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3163675A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1500959A publication Critical patent/GB1500959A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)

Abstract

1500959 Exposing light-sensitive layers through fine masks INTERNATIONAL BUSINESS MACHINES CORP 29 July 1975 [16 Aug 1974] 31636/75 Heading G2A In an arrangement for exposing a light-sensitive layer through a mask having a finely structured pattern, the light source is annular in shape, and disposed in the focal plane of an optical system. The arrangement is similar to that disclosed in Specification 1362139 for the manufacture of integrated circuits. In order to provide sufficient energy to expose the photo-resist layer an extended light source is used such as the annular lamp 1, which may be a flash lamp or a continuously emitting thin filament lamp. Alternatively it may comprise a plurality of individual light sources arranged in a circle. Such an arrangement will provide satisfactory imaging of a pattern of slit openings 8a, 8b, 8c, 8d in the mask 5 which slits may be disposed in different directions as shown. The mask 5 is spaced about 20 Ám from a semiconductor wafer 6 covered with the photo-resist 7, and arranged in an adjustable vacuum holder 9. The lamp is disposed in the focal plane of a lens 3.
GB3163675A 1974-08-16 1975-07-29 Photographic exposure device Expired GB1500959A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742439208 DE2439208A1 (en) 1974-08-16 1974-08-16 EXPOSURE DEVICE

Publications (1)

Publication Number Publication Date
GB1500959A true GB1500959A (en) 1978-02-15

Family

ID=5923274

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3163675A Expired GB1500959A (en) 1974-08-16 1975-07-29 Photographic exposure device

Country Status (4)

Country Link
JP (1) JPS5139143A (en)
DE (1) DE2439208A1 (en)
FR (1) FR2282120A2 (en)
GB (1) GB1500959A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0567558A (en) * 1991-09-06 1993-03-19 Nikon Corp Exposure method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT939738B (en) * 1970-08-12 1973-02-10 Rank Organisation Ltd LIGHTING DEVICE FOR PHOTOLITHOGRAPHIC PRINTING OF MICROCIRCUIT COMPONENTS

Also Published As

Publication number Publication date
DE2439208A1 (en) 1976-03-11
FR2282120A2 (en) 1976-03-12
FR2282120B2 (en) 1977-07-22
JPS5139143A (en) 1976-04-01

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee