GB1489425A - Photo-curable resin compositions - Google Patents
Photo-curable resin compositionsInfo
- Publication number
- GB1489425A GB1489425A GB3873374A GB3873374A GB1489425A GB 1489425 A GB1489425 A GB 1489425A GB 3873374 A GB3873374 A GB 3873374A GB 3873374 A GB3873374 A GB 3873374A GB 1489425 A GB1489425 A GB 1489425A
- Authority
- GB
- United Kingdom
- Prior art keywords
- acid
- gma
- resin
- ada
- anhydride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011342 resin composition Substances 0.000 title 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 abstract 8
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 abstract 7
- 229940014800 succinic anhydride Drugs 0.000 abstract 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 5
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 abstract 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 4
- 239000001361 adipic acid Substances 0.000 abstract 4
- 235000011037 adipic acid Nutrition 0.000 abstract 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 abstract 4
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 abstract 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 4
- 239000000203 mixture Substances 0.000 abstract 3
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 abstract 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 2
- 238000007865 diluting Methods 0.000 abstract 2
- 239000000975 dye Substances 0.000 abstract 2
- 239000003822 epoxy resin Substances 0.000 abstract 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 229920000647 polyepoxide Polymers 0.000 abstract 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 abstract 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 abstract 1
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 abstract 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 abstract 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 abstract 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- -1 acyloin ethers Chemical class 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 abstract 1
- 235000014113 dietary fatty acids Nutrition 0.000 abstract 1
- 125000004185 ester group Chemical group 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 abstract 1
- 229930195729 fatty acid Natural products 0.000 abstract 1
- 239000000194 fatty acid Substances 0.000 abstract 1
- 150000004665 fatty acids Chemical class 0.000 abstract 1
- 239000000945 filler Substances 0.000 abstract 1
- 239000001530 fumaric acid Substances 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 235000021388 linseed oil Nutrition 0.000 abstract 1
- 239000000944 linseed oil Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000003973 paint Substances 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9928973A JPS5514087B2 (enrdf_load_stackoverflow) | 1973-09-05 | 1973-09-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1489425A true GB1489425A (en) | 1977-10-19 |
Family
ID=14243473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3873374A Expired GB1489425A (en) | 1973-09-05 | 1974-09-04 | Photo-curable resin compositions |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5514087B2 (enrdf_load_stackoverflow) |
DE (1) | DE2442527C3 (enrdf_load_stackoverflow) |
FR (1) | FR2242702A1 (enrdf_load_stackoverflow) |
GB (1) | GB1489425A (enrdf_load_stackoverflow) |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
US4393181A (en) | 1982-06-30 | 1983-07-12 | Shell Oil Company | Polyfunctional phenolic-melamine epoxy resin curing agents |
US4422914A (en) | 1981-01-16 | 1983-12-27 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4436806A (en) | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
US4440802A (en) * | 1982-04-03 | 1984-04-03 | Ciba-Geigy Corporation | Preparation of prepregs from cellulosic fibers using water-borne resin compositions |
US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4451636A (en) * | 1981-01-16 | 1984-05-29 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4481281A (en) * | 1981-01-16 | 1984-11-06 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
GB2175908A (en) * | 1985-04-19 | 1986-12-10 | Taiyo Ink Mfg Co Ltd | Photo-setting compositions |
US4714751A (en) * | 1984-12-24 | 1987-12-22 | Basf Aktiengesellschaft | Crosslinkable resin, photosensitive recording material based on this crosslinkable resin, and production of a lithographic printing plate using this photosensitive recording material |
US4725524A (en) * | 1984-12-24 | 1988-02-16 | Basf Aktiengesellschaft | Dry film resist and production of resist images |
US4806449A (en) * | 1986-06-06 | 1989-02-21 | Basf Aktiengesellschaft | Photosensitive photopolymerizable recording element containing a terpolymer binder |
US4886735A (en) * | 1987-05-21 | 1989-12-12 | Basf Aktiengesellschaft | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon |
US4891301A (en) * | 1987-05-21 | 1990-01-02 | Basf Aktiengesellschaft | Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds |
US4940649A (en) * | 1987-05-21 | 1990-07-10 | Basf Aktiengesellschaft | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon |
US4962011A (en) * | 1987-05-21 | 1990-10-09 | Basf Aktiengesellschaft | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon |
US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
US5849462A (en) * | 1995-04-27 | 1998-12-15 | Minnesota Mining & Manufacturing Company | Negative-acting no-process printing plates |
CN113583222A (zh) * | 2021-08-24 | 2021-11-02 | 濮阳市盛源能源科技股份有限公司 | 一种嵌段共聚型可降解聚酯及其制备方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63186232A (ja) * | 1987-01-28 | 1988-08-01 | Toyobo Co Ltd | 感光性樹脂組成物 |
EP0292219A3 (en) * | 1987-05-21 | 1989-10-11 | AT&T Corp. | Printed circuit board fabrication |
GB8804044D0 (en) * | 1988-02-22 | 1988-03-23 | Coates Brothers Plc | Coating compositions |
DE69605909D1 (de) * | 1995-04-27 | 2000-02-03 | Minnesota Mining & Mfg | Negativ arbeitende unbehandelte reproduktionsschichten |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5640329B2 (enrdf_load_stackoverflow) * | 1972-04-24 | 1981-09-19 |
-
1973
- 1973-09-05 JP JP9928973A patent/JPS5514087B2/ja not_active Expired
-
1974
- 1974-09-04 GB GB3873374A patent/GB1489425A/en not_active Expired
- 1974-09-04 FR FR7430950A patent/FR2242702A1/fr not_active Withdrawn
- 1974-09-05 DE DE19742442527 patent/DE2442527C3/de not_active Expired
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
US4422914A (en) | 1981-01-16 | 1983-12-27 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4436806A (en) | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4451636A (en) * | 1981-01-16 | 1984-05-29 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4481281A (en) * | 1981-01-16 | 1984-11-06 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4440802A (en) * | 1982-04-03 | 1984-04-03 | Ciba-Geigy Corporation | Preparation of prepregs from cellulosic fibers using water-borne resin compositions |
US4393181A (en) | 1982-06-30 | 1983-07-12 | Shell Oil Company | Polyfunctional phenolic-melamine epoxy resin curing agents |
US4725524A (en) * | 1984-12-24 | 1988-02-16 | Basf Aktiengesellschaft | Dry film resist and production of resist images |
US4714751A (en) * | 1984-12-24 | 1987-12-22 | Basf Aktiengesellschaft | Crosslinkable resin, photosensitive recording material based on this crosslinkable resin, and production of a lithographic printing plate using this photosensitive recording material |
GB2175908A (en) * | 1985-04-19 | 1986-12-10 | Taiyo Ink Mfg Co Ltd | Photo-setting compositions |
GB2175908B (en) * | 1985-04-19 | 1989-09-06 | Taiyo Ink Mfg Co Ltd | Resist ink composition |
US4806449A (en) * | 1986-06-06 | 1989-02-21 | Basf Aktiengesellschaft | Photosensitive photopolymerizable recording element containing a terpolymer binder |
US4940649A (en) * | 1987-05-21 | 1990-07-10 | Basf Aktiengesellschaft | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon |
US4891301A (en) * | 1987-05-21 | 1990-01-02 | Basf Aktiengesellschaft | Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds |
US4886735A (en) * | 1987-05-21 | 1989-12-12 | Basf Aktiengesellschaft | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon |
US4962011A (en) * | 1987-05-21 | 1990-10-09 | Basf Aktiengesellschaft | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon |
US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
US5849462A (en) * | 1995-04-27 | 1998-12-15 | Minnesota Mining & Manufacturing Company | Negative-acting no-process printing plates |
US5925497A (en) * | 1995-04-27 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
US6027857A (en) * | 1995-04-27 | 2000-02-22 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
US6171735B1 (en) | 1995-04-27 | 2001-01-09 | 3M Innovative Properties Company | Negative-acting no-process printing plates |
CN113583222A (zh) * | 2021-08-24 | 2021-11-02 | 濮阳市盛源能源科技股份有限公司 | 一种嵌段共聚型可降解聚酯及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
FR2242702A1 (enrdf_load_stackoverflow) | 1975-03-28 |
DE2442527A1 (de) | 1975-04-03 |
DE2442527B2 (de) | 1976-08-12 |
JPS5514087B2 (enrdf_load_stackoverflow) | 1980-04-14 |
DE2442527C3 (de) | 1980-04-10 |
JPS5050106A (enrdf_load_stackoverflow) | 1975-05-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |