GB1489425A - Photo-curable resin compositions - Google Patents

Photo-curable resin compositions

Info

Publication number
GB1489425A
GB1489425A GB3873374A GB3873374A GB1489425A GB 1489425 A GB1489425 A GB 1489425A GB 3873374 A GB3873374 A GB 3873374A GB 3873374 A GB3873374 A GB 3873374A GB 1489425 A GB1489425 A GB 1489425A
Authority
GB
United Kingdom
Prior art keywords
acid
gma
resin
ada
anhydride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3873374A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Publication of GB1489425A publication Critical patent/GB1489425A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Abstract

1489425 Photocurable compositions; modified epoxy resins KANSAI PAINT CO Ltd 4 Sept 1974 [5 Sept 1973] 38733/74 Headings C3P and C3B [Also in Division G2] Photocurable compositions comprise a photosensitizer and a curable modified epoxy resin having a number average molecular weight of 700 to 5000 and containing in the molecular chain at least 15% (by weight of the modified resin) of the addition condensation structure of 2,2 - bis - (4 - hydroxyphenyl)propane and epichlorohydrin, ethylenically unsaturated portions being linked to the main chain by ester groups so as to provide the resin with an unsaturation equivalent (as defined) of 200 to 3000, and carboxyl groups being linked to the main chain so as to provide the resin with an acid value of 30 to 150. Exemplified modified resins are prepared by reacting an epoxy resin in two or more stages with (1) a polyester-dicarboxylic acid, acrylic acid (AA) and succinic anhydride (SA); (2) adipic acid (ADA), AA, SA, maleic anhydride (MA) and 2-hydroxyethylmethacrylate, and diluting with styrene and 1,6-hexane diol diacrylate; (3) ADA, SA and glycidyl methacrylate (GMA); (4) isophthalic acid, SA, GMA and SA again: (5) ADA, AA and SA; (6) AA and MA; (7) sebacic acid and crotonic acid, and diluting with ethyl methacrylate, and then further reacting with MA, tetrahydrophthalic anhydride and phthalic anhydride (PA); (8) fumaric acid, GMA and PA; and (9) linseed oil fatty acid in the presence of styrene, and then with PA and GMA. Suitable photosensitizers include α-carbonyl alcohols, acyloin ethers, vicinal ketoaldonyl compounds, α-substituted acyloins, benzophenone and its derivatives, and dye sensitizers. The compositions may additionally include pigments, dyes or fillers, and are useful for forming relief images in the production of printing plates and etching resists, and for producing decorative coatings.
GB3873374A 1973-09-05 1974-09-04 Photo-curable resin compositions Expired GB1489425A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9928973A JPS5514087B2 (en) 1973-09-05 1973-09-05

Publications (1)

Publication Number Publication Date
GB1489425A true GB1489425A (en) 1977-10-19

Family

ID=14243473

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3873374A Expired GB1489425A (en) 1973-09-05 1974-09-04 Photo-curable resin compositions

Country Status (4)

Country Link
JP (1) JPS5514087B2 (en)
DE (1) DE2442527C3 (en)
FR (1) FR2242702A1 (en)
GB (1) GB1489425A (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4393181A (en) 1982-06-30 1983-07-12 Shell Oil Company Polyfunctional phenolic-melamine epoxy resin curing agents
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4440802A (en) * 1982-04-03 1984-04-03 Ciba-Geigy Corporation Preparation of prepregs from cellulosic fibers using water-borne resin compositions
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
GB2175908A (en) * 1985-04-19 1986-12-10 Taiyo Ink Mfg Co Ltd Photo-setting compositions
US4714751A (en) * 1984-12-24 1987-12-22 Basf Aktiengesellschaft Crosslinkable resin, photosensitive recording material based on this crosslinkable resin, and production of a lithographic printing plate using this photosensitive recording material
US4725524A (en) * 1984-12-24 1988-02-16 Basf Aktiengesellschaft Dry film resist and production of resist images
US4806449A (en) * 1986-06-06 1989-02-21 Basf Aktiengesellschaft Photosensitive photopolymerizable recording element containing a terpolymer binder
US4886735A (en) * 1987-05-21 1989-12-12 Basf Aktiengesellschaft Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon
US4891301A (en) * 1987-05-21 1990-01-02 Basf Aktiengesellschaft Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds
US4940649A (en) * 1987-05-21 1990-07-10 Basf Aktiengesellschaft Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon
US4962011A (en) * 1987-05-21 1990-10-09 Basf Aktiengesellschaft Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
US5849462A (en) * 1995-04-27 1998-12-15 Minnesota Mining & Manufacturing Company Negative-acting no-process printing plates
CN113583222A (en) * 2021-08-24 2021-11-02 濮阳市盛源能源科技股份有限公司 Block copolymerization type degradable polyester and preparation method thereof

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63186232A (en) * 1987-01-28 1988-08-01 Toyobo Co Ltd Photosensitive resin composition
EP0292219A3 (en) * 1987-05-21 1989-10-11 AT&T Corp. Printed circuit board fabrication
GB8804044D0 (en) * 1988-02-22 1988-03-23 Coates Brothers Plc Coating compositions
CN1182485A (en) * 1995-04-27 1998-05-20 美国3M公司 Negative-acting no-process printing plates

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5640329B2 (en) * 1972-04-24 1981-09-19

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4440802A (en) * 1982-04-03 1984-04-03 Ciba-Geigy Corporation Preparation of prepregs from cellulosic fibers using water-borne resin compositions
US4393181A (en) 1982-06-30 1983-07-12 Shell Oil Company Polyfunctional phenolic-melamine epoxy resin curing agents
US4725524A (en) * 1984-12-24 1988-02-16 Basf Aktiengesellschaft Dry film resist and production of resist images
US4714751A (en) * 1984-12-24 1987-12-22 Basf Aktiengesellschaft Crosslinkable resin, photosensitive recording material based on this crosslinkable resin, and production of a lithographic printing plate using this photosensitive recording material
GB2175908A (en) * 1985-04-19 1986-12-10 Taiyo Ink Mfg Co Ltd Photo-setting compositions
GB2175908B (en) * 1985-04-19 1989-09-06 Taiyo Ink Mfg Co Ltd Resist ink composition
US4806449A (en) * 1986-06-06 1989-02-21 Basf Aktiengesellschaft Photosensitive photopolymerizable recording element containing a terpolymer binder
US4940649A (en) * 1987-05-21 1990-07-10 Basf Aktiengesellschaft Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon
US4891301A (en) * 1987-05-21 1990-01-02 Basf Aktiengesellschaft Photopolymerizable recording materials, photoresist layers and lithographic printing plates based theron, and novel 4-quinazolone compounds
US4886735A (en) * 1987-05-21 1989-12-12 Basf Aktiengesellschaft Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon
US4962011A (en) * 1987-05-21 1990-10-09 Basf Aktiengesellschaft Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
US5849462A (en) * 1995-04-27 1998-12-15 Minnesota Mining & Manufacturing Company Negative-acting no-process printing plates
US5925497A (en) * 1995-04-27 1999-07-20 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US6027857A (en) * 1995-04-27 2000-02-22 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US6171735B1 (en) 1995-04-27 2001-01-09 3M Innovative Properties Company Negative-acting no-process printing plates
CN113583222A (en) * 2021-08-24 2021-11-02 濮阳市盛源能源科技股份有限公司 Block copolymerization type degradable polyester and preparation method thereof

Also Published As

Publication number Publication date
JPS5514087B2 (en) 1980-04-14
FR2242702A1 (en) 1975-03-28
JPS5050106A (en) 1975-05-06
DE2442527B2 (en) 1976-08-12
DE2442527A1 (en) 1975-04-03
DE2442527C3 (en) 1980-04-10

Similar Documents

Publication Publication Date Title
GB1489425A (en) Photo-curable resin compositions
US4081492A (en) Hardenable coating compositions
US4014771A (en) Highly reactive resin compositions hardenable by UV-light
JP3252331B2 (en) Acrylate-based photosensitive composition
US4049634A (en) In-air curable resin compositions
JPH06228271A (en) New (cyclo)aliphatic epoxy compound
DE2145935B2 (en) Photo-curable resin composition based on an unsaturated polyester containing glycidyl groups
JPS58154765A (en) Photo-curing resin composition
US4100045A (en) Radiation curable epoxy coating composition of dimer acid modified vinyl ester resin
US4085018A (en) Photocurable resin compositions
ES398231A1 (en) Coating composition
US4250007A (en) Photocurable acrylic phosphate esters of epoxidized polybutadiene
US4067791A (en) Ultraviolet light curable coating compositions
GB1489402A (en) Photocurable resin compositions
CN105237689A (en) Digital light procession photocuring material and preparing method thereof
DE2550077C3 (en) Radiation-curable compositions based on polyester
GB1436443A (en) Composition curable by photoirradiation
US4501767A (en) Multicoat forming method
EP0434099A2 (en) A process for obtaining textured coatings from photo-curable urea-containing compositions
US3984584A (en) Opaque coatings and films produced by the hardening of synthetic resins with light
SE506958C2 (en) Photopolymerizable polyester composition and varnish or paint formulation
JPS60206823A (en) Photocurable resin composition
GB1404687A (en) Benzoin ethers
US4118366A (en) Compositions for the production of opaque coatings by radiation
JPS6011051B2 (en) photocurable composition

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee