FR2242702A1 - - Google Patents

Info

Publication number
FR2242702A1
FR2242702A1 FR7430950A FR7430950A FR2242702A1 FR 2242702 A1 FR2242702 A1 FR 2242702A1 FR 7430950 A FR7430950 A FR 7430950A FR 7430950 A FR7430950 A FR 7430950A FR 2242702 A1 FR2242702 A1 FR 2242702A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7430950A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Publication of FR2242702A1 publication Critical patent/FR2242702A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)
FR7430950A 1973-09-05 1974-09-04 Withdrawn FR2242702A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9928973A JPS5514087B2 (enrdf_load_stackoverflow) 1973-09-05 1973-09-05

Publications (1)

Publication Number Publication Date
FR2242702A1 true FR2242702A1 (enrdf_load_stackoverflow) 1975-03-28

Family

ID=14243473

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7430950A Withdrawn FR2242702A1 (enrdf_load_stackoverflow) 1973-09-05 1974-09-04

Country Status (4)

Country Link
JP (1) JPS5514087B2 (enrdf_load_stackoverflow)
DE (1) DE2442527C3 (enrdf_load_stackoverflow)
FR (1) FR2242702A1 (enrdf_load_stackoverflow)
GB (1) GB1489425A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989007785A1 (en) * 1988-02-22 1989-08-24 Coates Brothers Plc Coating compositions
EP0292219A3 (en) * 1987-05-21 1989-10-11 AT&T Corp. Printed circuit board fabrication
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
EP0091401B1 (de) * 1982-04-03 1986-11-20 Ciba-Geigy Ag Herstellung von Prepregs aus cellulosehaltigen Fasern unter Verwendung wässriger Harzzusammensetzungen
US4393181A (en) 1982-06-30 1983-07-12 Shell Oil Company Polyfunctional phenolic-melamine epoxy resin curing agents
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
DE3447355A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Vernetzbares harz, lichtempfindliches aufzeichnungsmaterial auf basis dieses vernetzbaren harzes sowie verfahren zur herstellung einer flachdruckplatte mittels dieses lichtempfindlichen aufzeichnungsmaterials
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
JPS63186232A (ja) * 1987-01-28 1988-08-01 Toyobo Co Ltd 感光性樹脂組成物
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717036A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
US5925497A (en) * 1995-04-27 1999-07-20 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
CN113583222B (zh) * 2021-08-24 2023-03-24 濮阳市盛源能源科技股份有限公司 一种嵌段共聚型可降解聚酯及其制备方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5640329B2 (enrdf_load_stackoverflow) * 1972-04-24 1981-09-19

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0292219A3 (en) * 1987-05-21 1989-10-11 AT&T Corp. Printed circuit board fabrication
WO1989007785A1 (en) * 1988-02-22 1989-08-24 Coates Brothers Plc Coating compositions
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates

Also Published As

Publication number Publication date
JPS5514087B2 (enrdf_load_stackoverflow) 1980-04-14
DE2442527B2 (de) 1976-08-12
GB1489425A (en) 1977-10-19
DE2442527C3 (de) 1980-04-10
JPS5050106A (enrdf_load_stackoverflow) 1975-05-06
DE2442527A1 (de) 1975-04-03

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Legal Events

Date Code Title Description
ST Notification of lapse