GB1475599A - Process for producing ultraviolet-shielding photomasks - Google Patents
Process for producing ultraviolet-shielding photomasksInfo
- Publication number
- GB1475599A GB1475599A GB3258174A GB3258174A GB1475599A GB 1475599 A GB1475599 A GB 1475599A GB 3258174 A GB3258174 A GB 3258174A GB 3258174 A GB3258174 A GB 3258174A GB 1475599 A GB1475599 A GB 1475599A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polymer
- alcohol
- soluble
- photomasks
- july
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 abstract 7
- -1 aromatic azide compound Chemical class 0.000 abstract 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 abstract 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 abstract 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 abstract 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 abstract 1
- 235000010724 Wisteria floribunda Nutrition 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000012670 alkaline solution Substances 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 150000001540 azides Chemical class 0.000 abstract 1
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 abstract 1
- 239000001913 cellulose Substances 0.000 abstract 1
- 229920002678 cellulose Polymers 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 229920006122 polyamide resin Polymers 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 229920002717 polyvinylpyridine Polymers 0.000 abstract 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 abstract 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 abstract 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 239000008096 xylene Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48082849A JPS5140452B2 (enrdf_load_stackoverflow) | 1973-07-23 | 1973-07-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1475599A true GB1475599A (en) | 1977-06-01 |
Family
ID=13785815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3258174A Expired GB1475599A (en) | 1973-07-23 | 1974-07-23 | Process for producing ultraviolet-shielding photomasks |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5140452B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2435390A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2238953B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1475599A (enrdf_load_stackoverflow) |
| IT (1) | IT1016966B (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3440508A1 (de) * | 1983-11-25 | 1985-06-05 | Armstrong World Industries, Inc., Lancaster, Pa. | Verfahren zur photolytischen entwicklung eines gefaerbten bildes auf einem cellulosematerial mit monosulfonylaziden |
| US9513551B2 (en) | 2009-01-29 | 2016-12-06 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5294632A (en) * | 1976-02-04 | 1977-08-09 | Mitsui Constr | Transfer method in compressed air of material lock and its device |
| US4197133A (en) * | 1977-10-14 | 1980-04-08 | Ciba-Geigy Corporation | Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives |
| IT1138814B (it) * | 1980-07-03 | 1986-09-17 | Rca Corp | Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo |
| JPS61166542A (ja) * | 1985-01-18 | 1986-07-28 | Hitachi Chem Co Ltd | 感光性組成物 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1572068C3 (de) * | 1966-03-12 | 1976-01-08 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliche Schicht zur Herstellung von Druckformen |
| DE1294191B (de) * | 1967-07-06 | 1969-07-31 | Kalle Ag | Lichtempfindliches Kopiermaterial mit einer lichtvernetzbaren Schicht |
| DE1597614B2 (de) * | 1967-07-07 | 1977-06-23 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliche kopiermasse |
-
1973
- 1973-07-23 JP JP48082849A patent/JPS5140452B2/ja not_active Expired
-
1974
- 1974-07-23 IT IT52241/74A patent/IT1016966B/it active
- 1974-07-23 GB GB3258174A patent/GB1475599A/en not_active Expired
- 1974-07-23 FR FR7425452A patent/FR2238953B1/fr not_active Expired
- 1974-07-23 DE DE2435390A patent/DE2435390A1/de not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3440508A1 (de) * | 1983-11-25 | 1985-06-05 | Armstrong World Industries, Inc., Lancaster, Pa. | Verfahren zur photolytischen entwicklung eines gefaerbten bildes auf einem cellulosematerial mit monosulfonylaziden |
| US9513551B2 (en) | 2009-01-29 | 2016-12-06 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2238953A1 (enrdf_load_stackoverflow) | 1975-02-21 |
| IT1016966B (it) | 1977-06-20 |
| DE2435390A1 (de) | 1975-02-13 |
| JPS5032924A (enrdf_load_stackoverflow) | 1975-03-29 |
| JPS5140452B2 (enrdf_load_stackoverflow) | 1976-11-04 |
| FR2238953B1 (enrdf_load_stackoverflow) | 1977-10-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |