IT1016966B - Procedimento per produrre maschere fotografiche schermanti ultra violetto - Google Patents
Procedimento per produrre maschere fotografiche schermanti ultra violettoInfo
- Publication number
- IT1016966B IT1016966B IT52241/74A IT5224174A IT1016966B IT 1016966 B IT1016966 B IT 1016966B IT 52241/74 A IT52241/74 A IT 52241/74A IT 5224174 A IT5224174 A IT 5224174A IT 1016966 B IT1016966 B IT 1016966B
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- ultra violet
- producing ultra
- photographic masks
- shielding photographic
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48082849A JPS5140452B2 (enrdf_load_stackoverflow) | 1973-07-23 | 1973-07-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1016966B true IT1016966B (it) | 1977-06-20 |
Family
ID=13785815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT52241/74A IT1016966B (it) | 1973-07-23 | 1974-07-23 | Procedimento per produrre maschere fotografiche schermanti ultra violetto |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5140452B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2435390A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2238953B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1475599A (enrdf_load_stackoverflow) |
| IT (1) | IT1016966B (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5294632A (en) * | 1976-02-04 | 1977-08-09 | Mitsui Constr | Transfer method in compressed air of material lock and its device |
| US4197133A (en) * | 1977-10-14 | 1980-04-08 | Ciba-Geigy Corporation | Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives |
| IT1138814B (it) * | 1980-07-03 | 1986-09-17 | Rca Corp | Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo |
| US4556625A (en) * | 1982-07-09 | 1985-12-03 | Armstrong World Industries, Inc. | Development of a colored image on a cellulosic material with monosulfonyl azides |
| JPS61166542A (ja) * | 1985-01-18 | 1986-07-28 | Hitachi Chem Co Ltd | 感光性組成物 |
| CN102365584B (zh) | 2009-01-29 | 2014-07-30 | 迪吉福来克斯有限公司 | 用于在光聚合物表面上产生光掩模的工艺 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1572069C3 (de) * | 1966-03-12 | 1976-01-08 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliche Schicht zur Herstellung von Druckformen |
| DE1294191B (de) * | 1967-07-06 | 1969-07-31 | Kalle Ag | Lichtempfindliches Kopiermaterial mit einer lichtvernetzbaren Schicht |
| DE1597614B2 (de) * | 1967-07-07 | 1977-06-23 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliche kopiermasse |
-
1973
- 1973-07-23 JP JP48082849A patent/JPS5140452B2/ja not_active Expired
-
1974
- 1974-07-23 DE DE2435390A patent/DE2435390A1/de not_active Withdrawn
- 1974-07-23 FR FR7425452A patent/FR2238953B1/fr not_active Expired
- 1974-07-23 IT IT52241/74A patent/IT1016966B/it active
- 1974-07-23 GB GB3258174A patent/GB1475599A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2435390A1 (de) | 1975-02-13 |
| GB1475599A (en) | 1977-06-01 |
| FR2238953B1 (enrdf_load_stackoverflow) | 1977-10-21 |
| FR2238953A1 (enrdf_load_stackoverflow) | 1975-02-21 |
| JPS5032924A (enrdf_load_stackoverflow) | 1975-03-29 |
| JPS5140452B2 (enrdf_load_stackoverflow) | 1976-11-04 |
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