GB1461471A - Exposure method - Google Patents

Exposure method

Info

Publication number
GB1461471A
GB1461471A GB25274A GB25274A GB1461471A GB 1461471 A GB1461471 A GB 1461471A GB 25274 A GB25274 A GB 25274A GB 25274 A GB25274 A GB 25274A GB 1461471 A GB1461471 A GB 1461471A
Authority
GB
United Kingdom
Prior art keywords
photo
resist
mask
resist material
jan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB25274A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB1461471A publication Critical patent/GB1461471A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Current Or Voltage (AREA)
GB25274A 1973-01-16 1974-01-03 Exposure method Expired GB1461471A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (cg-RX-API-DMAC7.html) 1973-01-16 1973-01-16

Publications (1)

Publication Number Publication Date
GB1461471A true GB1461471A (en) 1977-01-13

Family

ID=11659554

Family Applications (2)

Application Number Title Priority Date Filing Date
GB25274A Expired GB1461471A (en) 1973-01-16 1974-01-03 Exposure method
GB3728276A Expired GB1461472A (en) 1973-01-16 1974-01-03 Apparatus for imagewise exposing a layer of photosensitive material

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB3728276A Expired GB1461472A (en) 1973-01-16 1974-01-03 Apparatus for imagewise exposing a layer of photosensitive material

Country Status (4)

Country Link
JP (1) JPS5612011B2 (cg-RX-API-DMAC7.html)
DE (1) DE2401998C2 (cg-RX-API-DMAC7.html)
FR (1) FR2224787B1 (cg-RX-API-DMAC7.html)
GB (2) GB1461471A (cg-RX-API-DMAC7.html)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576630A (en) * 1966-10-29 1971-04-27 Nippon Electric Co Photo-etching process
DE1614636A1 (de) * 1967-09-23 1971-02-25 Siemens Ag Verfahren zum Herstellen einer Fotolackmaske fuer Halbleiterzwecke
CH497792A (de) * 1968-06-28 1970-10-15 Ibm Verfahren zur Herstellung von Halbleitervorrichtungen
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung

Also Published As

Publication number Publication date
JPS4996675A (cg-RX-API-DMAC7.html) 1974-09-12
DE2401998A1 (de) 1974-07-25
JPS5612011B2 (cg-RX-API-DMAC7.html) 1981-03-18
DE2401998C2 (de) 1983-04-14
GB1461472A (en) 1977-01-13
FR2224787A1 (cg-RX-API-DMAC7.html) 1974-10-31
FR2224787B1 (cg-RX-API-DMAC7.html) 1980-01-11

Similar Documents

Publication Publication Date Title
JPS57172735A (en) Multilayer photoresist processing
KR890014180A (ko) 광경화 코우팅의 제조공정
US3573456A (en) High resolution projection means for printing micro circuits on photoresist material
GB1597585A (en) Master copy of a coloured original and processes for its production
GB1461471A (en) Exposure method
JPS5630129A (en) Manufacture of photomask
GB1252066A (cg-RX-API-DMAC7.html)
JPS5344022A (en) Multi-layer color photographic material
US4083634A (en) Pattern exposure apparatus using polychromatic light source
GB1432305A (en) High sensitive photographic mask material
US4306006A (en) Method of directly manufacturing reticle patterns on chrome-coated plates by means of a pattern generator
JPS5251932A (en) Color sensitized silver halide photographic light sensitive material
JPS5528256A (en) Method of forming fluorescent film
JPS5778140A (en) Forming method for photoresist film
JPS54141573A (en) Mask for exposure
US5552247A (en) Method for patterning an X-ray master mask
US3205071A (en) Method and apparatus for copying representations
KR0119372B1 (ko) 위상반전마스크
US4032341A (en) Pattern exposure using a polychromatic light source
JPS5596952A (en) Production of photomask
JPS57102015A (en) Pattern formation
GB1407123A (en) Process for the manufacture of offset printing plates
JPS5366173A (en) Light exposure method
FR2299666A2 (fr) Proce
NL7501162A (en) Photo-polymerisable positive copying system - contg. nitroso-dimer and free radical source activated by different actinic radiation

Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940102