GB1432305A - High sensitive photographic mask material - Google Patents

High sensitive photographic mask material

Info

Publication number
GB1432305A
GB1432305A GB585874A GB585874A GB1432305A GB 1432305 A GB1432305 A GB 1432305A GB 585874 A GB585874 A GB 585874A GB 585874 A GB585874 A GB 585874A GB 1432305 A GB1432305 A GB 1432305A
Authority
GB
United Kingdom
Prior art keywords
layer
silver halide
specified
azide
feb
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB585874A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
Original Assignee
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert AG filed Critical Agfa Gevaert AG
Publication of GB1432305A publication Critical patent/GB1432305A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure

Abstract

1432305 Photographic material for photomasks AGFA-GEVAERT AG 8 Feb 1974 [8 Feb 1973] 05858/74 Heading G2C Photographic material for producing masks comprises in order (a) a transparent support, (b) a metal, metal oxide or Si layer (c) a photoresist layer e.g. a photopolymerizable or polyizer/ azide layer, (d) a silver halide layer the layer (c) or a layer between (c) and (d), containing a dye which has an absorption maximum at a wavelength to which the silver halide is sensitive but does not absorb in a region to which the photoresist is sensitive. Specified photo-resists are cyclized polyizoprene/azide, polymers containing sulphonyl azide groups (e.g. Specification 1062884), polyvinyl cinnamates, photocross linkable polymers as Specifications 1384343 and 1373146 and photopolymerizable compositions as Specification 741441. Preferably an adhesion promoting layer of a hydrolysable organosilane is applied to the photo-resist layer (c) before application of layer (d). The specified screening dyes are of Formula. with an absorption maximum of 546 nm. The specified silver halide emulsion is a green sensitized silver bromoiodide emulsion with an average grain diameter of 0�05 millimicrons.
GB585874A 1973-02-08 1974-02-08 High sensitive photographic mask material Expired GB1432305A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732306278 DE2306278A1 (en) 1973-02-08 1973-02-08 CAMERA SENSITIVE PHOTOMASKS

Publications (1)

Publication Number Publication Date
GB1432305A true GB1432305A (en) 1976-04-14

Family

ID=5871367

Family Applications (1)

Application Number Title Priority Date Filing Date
GB585874A Expired GB1432305A (en) 1973-02-08 1974-02-08 High sensitive photographic mask material

Country Status (3)

Country Link
BE (1) BE810484A (en)
DE (1) DE2306278A1 (en)
GB (1) GB1432305A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1583033A (en) * 1976-05-14 1981-01-21 Gaf Corp Method of exposing and developing a photographic element
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
JPS55149939A (en) * 1979-04-05 1980-11-21 Asahi Chem Ind Co Ltd Image forming method and photosensitive material used for it
JPS5748733A (en) * 1980-09-08 1982-03-20 Fuji Photo Film Co Ltd Photosensitive lithographic plate
FR2507789B1 (en) * 1981-06-12 1988-06-24 Fuji Photo Film Co Ltd LITHOGRAPHIC PHOTOSENSITIVE PULL PLATE PRECURSOR
NL8500992A (en) * 1985-04-03 1986-11-03 Stork Screens Bv PROCESS FOR FORMING A PATTERNED PHOTOPOLYMER COATING ON A PRINTING ROLLER AND PRINTING ROLLER WITH PATTERNED PHOTOPOLYMER COATING.
KR0140472B1 (en) * 1994-10-12 1998-06-15 김주용 Method for forming a photoresist pattern

Also Published As

Publication number Publication date
BE810484A (en) 1974-08-01
DE2306278A1 (en) 1974-08-15

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee