BE810484A - CAMERA SENSITIVE PHOTO MASKS - Google Patents

CAMERA SENSITIVE PHOTO MASKS

Info

Publication number
BE810484A
BE810484A BE1005688A BE1005688A BE810484A BE 810484 A BE810484 A BE 810484A BE 1005688 A BE1005688 A BE 1005688A BE 1005688 A BE1005688 A BE 1005688A BE 810484 A BE810484 A BE 810484A
Authority
BE
Belgium
Prior art keywords
photo masks
sensitive photo
camera sensitive
camera
masks
Prior art date
Application number
BE1005688A
Other languages
Dutch (nl)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE810484A publication Critical patent/BE810484A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE1005688A 1973-02-08 1974-02-01 CAMERA SENSITIVE PHOTO MASKS BE810484A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732306278 DE2306278A1 (en) 1973-02-08 1973-02-08 CAMERA SENSITIVE PHOTOMASKS

Publications (1)

Publication Number Publication Date
BE810484A true BE810484A (en) 1974-08-01

Family

ID=5871367

Family Applications (1)

Application Number Title Priority Date Filing Date
BE1005688A BE810484A (en) 1973-02-08 1974-02-01 CAMERA SENSITIVE PHOTO MASKS

Country Status (3)

Country Link
BE (1) BE810484A (en)
DE (1) DE2306278A1 (en)
GB (1) GB1432305A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1583033A (en) * 1976-05-14 1981-01-21 Gaf Corp Method of exposing and developing a photographic element
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
JPS55149939A (en) * 1979-04-05 1980-11-21 Asahi Chem Ind Co Ltd Image forming method and photosensitive material used for it
JPS5748733A (en) * 1980-09-08 1982-03-20 Fuji Photo Film Co Ltd Photosensitive lithographic plate
FR2507789B1 (en) * 1981-06-12 1988-06-24 Fuji Photo Film Co Ltd LITHOGRAPHIC PHOTOSENSITIVE PULL PLATE PRECURSOR
NL8500992A (en) * 1985-04-03 1986-11-03 Stork Screens Bv PROCESS FOR FORMING A PATTERNED PHOTOPOLYMER COATING ON A PRINTING ROLLER AND PRINTING ROLLER WITH PATTERNED PHOTOPOLYMER COATING.
KR0140472B1 (en) * 1994-10-12 1998-06-15 김주용 Method for forming a photoresist pattern

Also Published As

Publication number Publication date
GB1432305A (en) 1976-04-14
DE2306278A1 (en) 1974-08-15

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