BE810484A - Cameragevoelige fotomaskers - Google Patents
Cameragevoelige fotomaskersInfo
- Publication number
- BE810484A BE810484A BE1005688A BE1005688A BE810484A BE 810484 A BE810484 A BE 810484A BE 1005688 A BE1005688 A BE 1005688A BE 1005688 A BE1005688 A BE 1005688A BE 810484 A BE810484 A BE 810484A
- Authority
- BE
- Belgium
- Prior art keywords
- photo masks
- sensitive photo
- camera sensitive
- camera
- masks
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19732306278 DE2306278A1 (de) | 1973-02-08 | 1973-02-08 | Kameraempfindliche photomasken |
Publications (1)
Publication Number | Publication Date |
---|---|
BE810484A true BE810484A (nl) | 1974-08-01 |
Family
ID=5871367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE1005688A BE810484A (nl) | 1973-02-08 | 1974-02-01 | Cameragevoelige fotomaskers |
Country Status (3)
Country | Link |
---|---|
BE (1) | BE810484A (nl) |
DE (1) | DE2306278A1 (nl) |
GB (1) | GB1432305A (nl) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1109715A (en) * | 1976-05-14 | 1981-09-29 | Frank J. Loprest | Photographic element and photographic record prepared therefrom |
US4138262A (en) * | 1976-09-20 | 1979-02-06 | Energy Conversion Devices, Inc. | Imaging film comprising bismuth image-forming layer |
JPS55149939A (en) * | 1979-04-05 | 1980-11-21 | Asahi Chem Ind Co Ltd | Image forming method and photosensitive material used for it |
JPS5748733A (en) * | 1980-09-08 | 1982-03-20 | Fuji Photo Film Co Ltd | Photosensitive lithographic plate |
FR2507789B1 (fr) * | 1981-06-12 | 1988-06-24 | Fuji Photo Film Co Ltd | Precurseur de plaque de tirage photosensible lithographique |
NL8500992A (nl) * | 1985-04-03 | 1986-11-03 | Stork Screens Bv | Werkwijze voor het vormen van een gedessineerde fotopolymeerbekleding op een drukwals alsmede drukwals met gedessineerde fotopolymeerbekleding. |
KR0140472B1 (ko) * | 1994-10-12 | 1998-06-15 | 김주용 | 감광막 패턴 형성방법 |
-
1973
- 1973-02-08 DE DE19732306278 patent/DE2306278A1/de active Pending
-
1974
- 1974-02-01 BE BE1005688A patent/BE810484A/nl unknown
- 1974-02-08 GB GB585874A patent/GB1432305A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1432305A (en) | 1976-04-14 |
DE2306278A1 (de) | 1974-08-15 |
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