GB1436443A - Composition curable by photoirradiation - Google Patents

Composition curable by photoirradiation

Info

Publication number
GB1436443A
GB1436443A GB4355373A GB4355373A GB1436443A GB 1436443 A GB1436443 A GB 1436443A GB 4355373 A GB4355373 A GB 4355373A GB 4355373 A GB4355373 A GB 4355373A GB 1436443 A GB1436443 A GB 1436443A
Authority
GB
United Kingdom
Prior art keywords
compound
unsaturated
diisocyanate
anhydride
reacting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4355373A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Publication of GB1436443A publication Critical patent/GB1436443A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
GB4355373A 1972-09-19 1973-09-17 Composition curable by photoirradiation Expired GB1436443A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47093210A JPS5035529B2 (en:Method) 1972-09-19 1972-09-19

Publications (1)

Publication Number Publication Date
GB1436443A true GB1436443A (en) 1976-05-19

Family

ID=14076193

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4355373A Expired GB1436443A (en) 1972-09-19 1973-09-17 Composition curable by photoirradiation

Country Status (5)

Country Link
US (1) US3856643A (en:Method)
JP (1) JPS5035529B2 (en:Method)
DE (1) DE2345981C3 (en:Method)
FR (1) FR2200295B1 (en:Method)
GB (1) GB1436443A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0646580A3 (de) * 1993-09-16 1995-10-11 Ciba Geigy Ag Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen.
CN109799677A (zh) * 2018-12-28 2019-05-24 江门市阪桥电子材料有限公司 一种不含tgic的感光阻焊材料及其制备方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7309060A (en:Method) * 1973-06-29 1974-12-31
JPS5039334A (en:Method) * 1973-07-05 1975-04-11
JPS5123590A (en) * 1974-08-13 1976-02-25 Asada Kagaku Kogyo Kk Suiyoseihorimaano fuyokazai
US4230790A (en) * 1979-01-31 1980-10-28 E. I. Du Pont De Nemours And Company Photopolymerizable compositions useful in dry film photoresist
US4339527A (en) * 1979-01-31 1982-07-13 E. I. Du Pont De Nemours And Company Process for using photopolymerizable compositions
AU3349984A (en) * 1983-11-16 1985-05-23 Dentsply International Inc. Photopolymerizable acrylabe compositions
JPH01182845A (ja) * 1988-01-13 1989-07-20 Toyobo Co Ltd 感光性樹脂組成物
US4943513A (en) * 1988-10-07 1990-07-24 Morton Thiokol, Inc. Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom
US6838536B2 (en) * 2002-08-30 2005-01-04 Ucb, S.A. Reactive and gel-free compositions for making hybrid composites
WO2005108440A1 (ja) * 2004-05-10 2005-11-17 Tohcello Co., Ltd. ガスバリア性膜、ガスバリア性積層体及びその製造方法
JP2006299095A (ja) * 2005-04-20 2006-11-02 Fuji Photo Film Co Ltd インク組成物、画像形成方法および記録物
CN101278007B (zh) * 2005-08-31 2012-11-07 东赛璐株式会社 气体阻挡膜、气体阻挡层压品以及膜或层压品的制造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826845B1 (en:Method) * 1970-11-25 1973-08-16
AU451354B2 (en) * 1971-01-06 1974-08-08 Inmont Corp. "actinic radiation curing compositions and method of coating and printing using same"
US3712871A (en) * 1971-02-18 1973-01-23 Continental Can Co Photopolymerizable compositions useful as a printing ink vehicle
US3772171A (en) * 1971-04-05 1973-11-13 Inmont Corp Novel quick setting inks

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0646580A3 (de) * 1993-09-16 1995-10-11 Ciba Geigy Ag Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen.
US5605941A (en) * 1993-09-16 1997-02-25 Steinmann; Bettina Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions
US5705316A (en) * 1993-09-16 1998-01-06 Ciba Specialty Chemicals Corporation Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions
US5783712A (en) * 1993-09-16 1998-07-21 Ciba Specialty Chemicals Corporation Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions
US5783615A (en) * 1993-09-16 1998-07-21 Ciba Specialty Chemicals Corporation Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions
CN109799677A (zh) * 2018-12-28 2019-05-24 江门市阪桥电子材料有限公司 一种不含tgic的感光阻焊材料及其制备方法

Also Published As

Publication number Publication date
JPS5035529B2 (en:Method) 1975-11-17
DE2345981C3 (de) 1978-06-08
FR2200295A1 (en:Method) 1974-04-19
US3856643A (en) 1974-12-24
DE2345981B2 (de) 1977-10-06
FR2200295B1 (en:Method) 1978-03-10
JPS4952231A (en:Method) 1974-05-21
DE2345981A1 (de) 1974-04-11

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee