JPS5035529B2 - - Google Patents

Info

Publication number
JPS5035529B2
JPS5035529B2 JP47093210A JP9321072A JPS5035529B2 JP S5035529 B2 JPS5035529 B2 JP S5035529B2 JP 47093210 A JP47093210 A JP 47093210A JP 9321072 A JP9321072 A JP 9321072A JP S5035529 B2 JPS5035529 B2 JP S5035529B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP47093210A
Other versions
JPS4952231A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47093210A priority Critical patent/JPS5035529B2/ja
Priority to DE2345981A priority patent/DE2345981C3/de
Priority to GB4355373A priority patent/GB1436443A/en
Priority to US00398337A priority patent/US3856643A/en
Priority to FR7333615A priority patent/FR2200295B1/fr
Publication of JPS4952231A publication Critical patent/JPS4952231A/ja
Publication of JPS5035529B2 publication Critical patent/JPS5035529B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/62Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)
JP47093210A 1972-09-19 1972-09-19 Expired JPS5035529B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP47093210A JPS5035529B2 (ja) 1972-09-19 1972-09-19
DE2345981A DE2345981C3 (de) 1972-09-19 1973-09-12 Durch Photobestrahlung härtbare Harzmischungen
GB4355373A GB1436443A (en) 1972-09-19 1973-09-17 Composition curable by photoirradiation
US00398337A US3856643A (en) 1972-09-19 1973-09-18 Photocurable compositions containing polyvalent metal salts of unsaturated mono or dicarboxylic acids
FR7333615A FR2200295B1 (ja) 1972-09-19 1973-09-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47093210A JPS5035529B2 (ja) 1972-09-19 1972-09-19

Publications (2)

Publication Number Publication Date
JPS4952231A JPS4952231A (ja) 1974-05-21
JPS5035529B2 true JPS5035529B2 (ja) 1975-11-17

Family

ID=14076193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47093210A Expired JPS5035529B2 (ja) 1972-09-19 1972-09-19

Country Status (5)

Country Link
US (1) US3856643A (ja)
JP (1) JPS5035529B2 (ja)
DE (1) DE2345981C3 (ja)
FR (1) FR2200295B1 (ja)
GB (1) GB1436443A (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7309060A (ja) * 1973-06-29 1974-12-31
JPS5039334A (ja) * 1973-07-05 1975-04-11
JPS5123590A (en) * 1974-08-13 1976-02-25 Asada Kagaku Kogyo Kk Suiyoseihorimaano fuyokazai
US4230790A (en) * 1979-01-31 1980-10-28 E. I. Du Pont De Nemours And Company Photopolymerizable compositions useful in dry film photoresist
US4339527A (en) * 1979-01-31 1982-07-13 E. I. Du Pont De Nemours And Company Process for using photopolymerizable compositions
AU3349984A (en) * 1983-11-16 1985-05-23 Dentsply International Inc. Photopolymerizable acrylabe compositions
JPH01182845A (ja) * 1988-01-13 1989-07-20 Toyobo Co Ltd 感光性樹脂組成物
US4943513A (en) * 1988-10-07 1990-07-24 Morton Thiokol, Inc. Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom
EP0646580B1 (de) * 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
US6838536B2 (en) * 2002-08-30 2005-01-04 Ucb, S.A. Reactive and gel-free compositions for making hybrid composites
US8703298B2 (en) * 2004-05-10 2014-04-22 Tohcello Co., Ltd. Gas-barrier film, gas-barrier layered body, and process for producing same
JP2006299095A (ja) * 2005-04-20 2006-11-02 Fuji Photo Film Co Ltd インク組成物、画像形成方法および記録物
EP1932880B8 (en) * 2005-08-31 2012-03-07 Mitsui Chemicals Tohcello Co., Ltd. Gas barrier film, gas barrier laminate and method for production of the film or laminate
CN109799677A (zh) * 2018-12-28 2019-05-24 江门市阪桥电子材料有限公司 一种不含tgic的感光阻焊材料及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826845B1 (ja) * 1970-11-25 1973-08-16
AU451354B2 (en) * 1971-01-06 1974-08-08 Inmont Corp. "actinic radiation curing compositions and method of coating and printing using same"
US3712871A (en) * 1971-02-18 1973-01-23 Continental Can Co Photopolymerizable compositions useful as a printing ink vehicle
US3772171A (en) * 1971-04-05 1973-11-13 Inmont Corp Novel quick setting inks

Also Published As

Publication number Publication date
GB1436443A (en) 1976-05-19
FR2200295A1 (ja) 1974-04-19
DE2345981A1 (de) 1974-04-11
JPS4952231A (ja) 1974-05-21
DE2345981C3 (de) 1978-06-08
US3856643A (en) 1974-12-24
DE2345981B2 (de) 1977-10-06
FR2200295B1 (ja) 1978-03-10

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