FR2200295B1 - - Google Patents

Info

Publication number
FR2200295B1
FR2200295B1 FR7333615A FR7333615A FR2200295B1 FR 2200295 B1 FR2200295 B1 FR 2200295B1 FR 7333615 A FR7333615 A FR 7333615A FR 7333615 A FR7333615 A FR 7333615A FR 2200295 B1 FR2200295 B1 FR 2200295B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7333615A
Other versions
FR2200295A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Publication of FR2200295A1 publication Critical patent/FR2200295A1/fr
Application granted granted Critical
Publication of FR2200295B1 publication Critical patent/FR2200295B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)
FR7333615A 1972-09-19 1973-09-19 Expired FR2200295B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47093210A JPS5035529B2 (fr) 1972-09-19 1972-09-19

Publications (2)

Publication Number Publication Date
FR2200295A1 FR2200295A1 (fr) 1974-04-19
FR2200295B1 true FR2200295B1 (fr) 1978-03-10

Family

ID=14076193

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7333615A Expired FR2200295B1 (fr) 1972-09-19 1973-09-19

Country Status (5)

Country Link
US (1) US3856643A (fr)
JP (1) JPS5035529B2 (fr)
DE (1) DE2345981C3 (fr)
FR (1) FR2200295B1 (fr)
GB (1) GB1436443A (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7309060A (fr) * 1973-06-29 1974-12-31
JPS5039334A (fr) * 1973-07-05 1975-04-11
JPS5123590A (en) * 1974-08-13 1976-02-25 Asada Kagaku Kogyo Kk Suiyoseihorimaano fuyokazai
US4230790A (en) * 1979-01-31 1980-10-28 E. I. Du Pont De Nemours And Company Photopolymerizable compositions useful in dry film photoresist
US4339527A (en) * 1979-01-31 1982-07-13 E. I. Du Pont De Nemours And Company Process for using photopolymerizable compositions
AU3349984A (en) * 1983-11-16 1985-05-23 Dentsply International Inc. Photopolymerizable acrylabe compositions
JPH01182845A (ja) * 1988-01-13 1989-07-20 Toyobo Co Ltd 感光性樹脂組成物
US4943513A (en) * 1988-10-07 1990-07-24 Morton Thiokol, Inc. Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom
EP0646580B1 (fr) * 1993-09-16 2000-05-31 Ciba SC Holding AG Composés de vinyléther avec des groupes fonctionnels additionnels différents de vinyléther et leur utilisation dans la formulation de compositions durcissables
US6838536B2 (en) * 2002-08-30 2005-01-04 Ucb, S.A. Reactive and gel-free compositions for making hybrid composites
US8703298B2 (en) * 2004-05-10 2014-04-22 Tohcello Co., Ltd. Gas-barrier film, gas-barrier layered body, and process for producing same
JP2006299095A (ja) * 2005-04-20 2006-11-02 Fuji Photo Film Co Ltd インク組成物、画像形成方法および記録物
EP1932880B8 (fr) * 2005-08-31 2012-03-07 Mitsui Chemicals Tohcello Co., Ltd. Film barrière aux gaz, stratifié barrière aux gaz et procédé de production du film ou du stratifié
CN109799677A (zh) * 2018-12-28 2019-05-24 江门市阪桥电子材料有限公司 一种不含tgic的感光阻焊材料及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4826845B1 (fr) * 1970-11-25 1973-08-16
AU451354B2 (en) * 1971-01-06 1974-08-08 Inmont Corp. "actinic radiation curing compositions and method of coating and printing using same"
US3712871A (en) * 1971-02-18 1973-01-23 Continental Can Co Photopolymerizable compositions useful as a printing ink vehicle
US3772171A (en) * 1971-04-05 1973-11-13 Inmont Corp Novel quick setting inks

Also Published As

Publication number Publication date
GB1436443A (en) 1976-05-19
FR2200295A1 (fr) 1974-04-19
DE2345981A1 (de) 1974-04-11
JPS4952231A (fr) 1974-05-21
DE2345981C3 (de) 1978-06-08
US3856643A (en) 1974-12-24
DE2345981B2 (de) 1977-10-06
JPS5035529B2 (fr) 1975-11-17

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Legal Events

Date Code Title Description
ST Notification of lapse