GB1427733A - Apertured phosphosilicate glass coatings - Google Patents
Apertured phosphosilicate glass coatingsInfo
- Publication number
- GB1427733A GB1427733A GB2076072A GB2076072A GB1427733A GB 1427733 A GB1427733 A GB 1427733A GB 2076072 A GB2076072 A GB 2076072A GB 2076072 A GB2076072 A GB 2076072A GB 1427733 A GB1427733 A GB 1427733A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- substrate
- phosphosilicate glass
- apertured
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Silicon Polymers (AREA)
Abstract
1427733 Phosphosilicate glass coatings MULLARD Ltd 18 July 1973 [4 May 1972] 20760/72 Heading C1M An apertured phosphosilicate glass layer on a substrate is formed by forming a layer 2 comprising a siloxane mixture (defined below) on a substrate 1 (e.g. a silicon slice), irradiating the layer, using an electron beam, in a pattern corresponding to the apertures required (e.g. using a mask 3), washing the layer with a solvent to remove unirradiated areas of the layer, reacting the irradiated portions remaining with phosphorus halide or phosphorus oxyhalide until a phosphosilicate glass layer 4 is formed which contains 1-15 atoms of P per 100 atoms of Si, then heating the glass-coated substrate in wet oxygen at 600-700‹ C., and then in an atmosphere (e.g. dry N 2 ) inert to silicon at 700-850‹ C., and then at 1000-1100‹ C. The siloxane mixture is a mixture of the compounds and some of the units of the latter being replaced by units of the form In the formula* n is 1-6 and R is methyl, ethyl or vinyl. The phosphorus oxyhalide is preferably POCl 3 . The reaction with the phosphorus oxyhalide may be carried out in dry N 2 at 50-150‹ C. An apertured silica layer may be initially provided on the substrate. The electron beam irradiation may be carried out in an O 2 -containing atmosphere, at an electron energy of 3-25 kV., with a charge density of 75-1200 ÁC./cm.<SP>2</SP>. Unirradiated siloxane mixture may be washed off using acetone. The silicon slice may be initially prepared by oxidizing the slice, immersing in hydrofluoric acid and then in a solution comprising concentrated sulphuric acid and hydrogen peroxide, washing with water and drying.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2076072A GB1427733A (en) | 1972-05-04 | 1972-05-04 | Apertured phosphosilicate glass coatings |
DE2302148A DE2302148C2 (en) | 1972-01-18 | 1973-01-17 | Method of making a phosphosilicate glass sheet pattern |
IT67071/73A IT977622B (en) | 1972-01-18 | 1973-01-17 | PROCEDURE FOR PRODUCING A PHOSPHOLIC GLASS DESIGN LAYER ON A SUBSTRATE, PARTICULARLY IN APPLICATION TO SEMI-CONDUCTIVE DEVICES |
US324394A US3877980A (en) | 1972-01-18 | 1973-01-17 | Methods of producing phosphosilicate glass patterns |
JP826173A JPS5718340B2 (en) | 1972-01-18 | 1973-01-18 | |
FR7301693A FR2173949B1 (en) | 1972-01-18 | 1973-01-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2076072A GB1427733A (en) | 1972-05-04 | 1972-05-04 | Apertured phosphosilicate glass coatings |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1427733A true GB1427733A (en) | 1976-03-10 |
Family
ID=10151203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2076072A Expired GB1427733A (en) | 1972-01-18 | 1972-05-04 | Apertured phosphosilicate glass coatings |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1427733A (en) |
-
1972
- 1972-05-04 GB GB2076072A patent/GB1427733A/en not_active Expired
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |