GB1427695A - Signal processing system - Google Patents

Signal processing system

Info

Publication number
GB1427695A
GB1427695A GB1945374A GB1945374A GB1427695A GB 1427695 A GB1427695 A GB 1427695A GB 1945374 A GB1945374 A GB 1945374A GB 1945374 A GB1945374 A GB 1945374A GB 1427695 A GB1427695 A GB 1427695A
Authority
GB
United Kingdom
Prior art keywords
semi
signal
patterns
crosscorrelation
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1945374A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1427695A publication Critical patent/GB1427695A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB1945374A 1973-06-08 1974-05-03 Signal processing system Expired GB1427695A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US368384A US3924113A (en) 1973-06-08 1973-06-08 Electron beam registration system

Publications (1)

Publication Number Publication Date
GB1427695A true GB1427695A (en) 1976-03-10

Family

ID=23450995

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1945374A Expired GB1427695A (en) 1973-06-08 1974-05-03 Signal processing system

Country Status (7)

Country Link
US (1) US3924113A (cg-RX-API-DMAC7.html)
JP (1) JPS5248060B2 (cg-RX-API-DMAC7.html)
CA (1) CA1009766A (cg-RX-API-DMAC7.html)
DE (1) DE2424313C2 (cg-RX-API-DMAC7.html)
FR (1) FR2240484B1 (cg-RX-API-DMAC7.html)
GB (1) GB1427695A (cg-RX-API-DMAC7.html)
IT (1) IT1010161B (cg-RX-API-DMAC7.html)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2320665A1 (fr) * 1975-08-04 1977-03-04 Telecommunications Sa Perfectionnements aux filtres electromecaniques passe-bande de frequences
JPS5315076A (en) * 1976-07-28 1978-02-10 Nippon Telegr & Teleph Corp <Ntt> Electron beam position detection method
JPS5319764A (en) * 1976-08-09 1978-02-23 Nippon Telegr & Teleph Corp <Ntt> Mark detection system in electron beam exposure
DE2702448C2 (de) * 1977-01-20 1982-12-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Positionierung eines mit einer Marke versehenen Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske
DE2846316A1 (de) * 1978-10-24 1980-06-04 Siemens Ag Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten
JPS6058793B2 (ja) * 1980-03-24 1985-12-21 日電アネルバ株式会社 プラズマ分光監視装置
JPS57106130A (en) * 1980-12-24 1982-07-01 Jeol Ltd Detecting method for mark
US4387433A (en) * 1980-12-24 1983-06-07 International Business Machines Corporation High speed data interface buffer for digitally controlled electron beam exposure system
JPS57122517A (en) * 1981-01-22 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Alignment mark detector for electron beam exposure
JPS58122725A (ja) * 1982-01-14 1983-07-21 Nippon Telegr & Teleph Corp <Ntt> ビ−ム形状測定装置
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
FR2586506B1 (fr) * 1985-08-20 1988-01-29 Primat Didier Procede et dispositif optique et electronique pour assurer la decoupe automatique de plaques
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
DE3735154C2 (de) * 1986-10-17 1994-10-20 Canon Kk Verfahren zum Erfassen der Lage einer auf einem Objekt vorgesehenen Marke
JPH0724256B2 (ja) * 1987-08-13 1995-03-15 日本電子株式会社 サイズ測定装置
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
DE102015117693A1 (de) * 2015-10-16 2017-04-20 Ald Vacuum Technologies Gmbh Verfahren zur Bestimmung der sich verändernden Lage des Auftreffpunktes eines energetischen Strahles auf einer begrenzten Fläche
US12493005B1 (en) 2022-06-07 2025-12-09 Nexgen Semi Holding, Inc. Extended range active illumination imager

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328795A (en) * 1959-11-18 1967-06-27 Ling Temco Vought Inc Fixtaking means and method
US3329813A (en) * 1964-08-25 1967-07-04 Jeol Ltd Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen
US3535516A (en) * 1966-10-17 1970-10-20 Hitachi Ltd Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio
US3614736A (en) * 1968-05-21 1971-10-19 Ibm Pattern recognition apparatus and methods invariant to translation, scale change and rotation
US3646333A (en) * 1969-12-12 1972-02-29 Us Navy Digital correlator and integrator
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745317A (en) * 1970-05-04 1973-07-10 Commissariat Energie Atomique System for generating the fourier transform of a function
US3644899A (en) * 1970-07-29 1972-02-22 Cogar Corp Method for determining partial memory chip categories
US3717756A (en) * 1970-10-30 1973-02-20 Electronic Communications High precision circulating digital correlator
US3777133A (en) * 1971-01-26 1973-12-04 C Wormald Cross correlator
CA953010A (en) * 1971-12-03 1974-08-13 Her Majesty In Right Of Canada As Represented By The Minister Of Transpo Rt Radar cross correlator
US3718813A (en) * 1972-01-19 1973-02-27 O Williams Technique for correlation method of determining system impulse response

Also Published As

Publication number Publication date
DE2424313C2 (de) 1984-03-01
IT1010161B (it) 1977-01-10
FR2240484A1 (cg-RX-API-DMAC7.html) 1975-03-07
JPS5248060B2 (cg-RX-API-DMAC7.html) 1977-12-07
JPS5023782A (cg-RX-API-DMAC7.html) 1975-03-14
US3924113A (en) 1975-12-02
FR2240484B1 (cg-RX-API-DMAC7.html) 1976-06-25
DE2424313A1 (de) 1975-01-02
CA1009766A (en) 1977-05-03

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee