GB1377816A - Photocrosslinkable films and compositions for their production - Google Patents
Photocrosslinkable films and compositions for their productionInfo
- Publication number
- GB1377816A GB1377816A GB2918372A GB2918372A GB1377816A GB 1377816 A GB1377816 A GB 1377816A GB 2918372 A GB2918372 A GB 2918372A GB 2918372 A GB2918372 A GB 2918372A GB 1377816 A GB1377816 A GB 1377816A
- Authority
- GB
- United Kingdom
- Prior art keywords
- maleimide
- michler
- ketone
- bis
- tolyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 abstract 16
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 abstract 8
- QYOJZFBQEAZNEW-UHFFFAOYSA-N 1-(2-methylphenyl)pyrrole-2,5-dione Chemical compound CC1=CC=CC=C1N1C(=O)C=CC1=O QYOJZFBQEAZNEW-UHFFFAOYSA-N 0.000 abstract 6
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical group O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 abstract 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical group O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 abstract 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 2
- WAMBUHSSUGGLJO-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;2-(oxiran-2-ylmethoxymethyl)oxirane Chemical compound C1OC1COCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WAMBUHSSUGGLJO-UHFFFAOYSA-N 0.000 abstract 2
- 229940076442 9,10-anthraquinone Drugs 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 abstract 2
- -1 maleimide compound Chemical class 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 abstract 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 abstract 1
- VOTUEBINSRDNLW-UHFFFAOYSA-N 3-methylbenzo[e]perimidine-2,7-dione Chemical compound O=C1C2=CC=CC=C2C2=NC(=O)N(C)C3=CC=CC1=C32 VOTUEBINSRDNLW-UHFFFAOYSA-N 0.000 abstract 1
- 239000004641 Diallyl-phthalate Substances 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000005030 aluminium foil Substances 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 235000010290 biphenyl Nutrition 0.000 abstract 1
- 239000004305 biphenyl Substances 0.000 abstract 1
- 125000006267 biphenyl group Chemical group 0.000 abstract 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 239000008199 coating composition Substances 0.000 abstract 1
- 125000004185 ester group Chemical group 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 239000004814 polyurethane Substances 0.000 abstract 1
- 229920002635 polyurethane Polymers 0.000 abstract 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 abstract 1
- 229920006305 unsaturated polyester Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2130904A DE2130904C3 (de) | 1971-06-22 | 1971-06-22 | Homogene lichtvernetzbare Schichten liefernde Gemische |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1377816A true GB1377816A (en) | 1974-12-18 |
Family
ID=5811447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2918372A Expired GB1377816A (en) | 1971-06-22 | 1972-06-21 | Photocrosslinkable films and compositions for their production |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US3832187A (enExample) |
| JP (1) | JPS5523843B1 (enExample) |
| AT (1) | AT317931B (enExample) |
| BE (1) | BE785186A (enExample) |
| CH (1) | CH584910A5 (enExample) |
| DE (1) | DE2130904C3 (enExample) |
| FR (1) | FR2143233B1 (enExample) |
| GB (1) | GB1377816A (enExample) |
| IT (1) | IT959879B (enExample) |
| LU (1) | LU65544A1 (enExample) |
| NL (1) | NL7203500A (enExample) |
| SE (1) | SE394149B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3905820A (en) * | 1972-01-27 | 1975-09-16 | Hoechst Ag | Light sensitive copolymers, a process for their manufacture and copying compositions containing them |
| JPS5337902B2 (enExample) * | 1973-09-04 | 1978-10-12 | ||
| DE2457882B2 (de) * | 1974-12-06 | 1977-06-02 | Siemens AG, 1000 Berlin und 8000 München | Waermebestaendige, lichtvernetzbare massen |
| US4035321A (en) * | 1975-03-24 | 1977-07-12 | Celanese Corporation | Preparation of ultraviolet curable acrylated polymers |
| GB1575653A (en) * | 1977-06-01 | 1980-09-24 | Ciba Geigy Ag | Reinforced composites |
| JPS607261B2 (ja) * | 1978-10-02 | 1985-02-23 | 旭化成株式会社 | 感光性エラストマ−組成物 |
| US4615968A (en) * | 1982-11-04 | 1986-10-07 | Ciba-Geigy Corporation | Compositions of matter which crosslink under the action of light in the presence of sensitizers |
-
1971
- 1971-06-22 DE DE2130904A patent/DE2130904C3/de not_active Expired
-
1972
- 1972-03-16 NL NL7203500A patent/NL7203500A/xx not_active Application Discontinuation
- 1972-04-12 AT AT316772A patent/AT317931B/de not_active IP Right Cessation
- 1972-04-26 CH CH622172A patent/CH584910A5/xx not_active IP Right Cessation
- 1972-06-19 SE SE7208051A patent/SE394149B/xx unknown
- 1972-06-20 US US00264569A patent/US3832187A/en not_active Expired - Lifetime
- 1972-06-20 LU LU65544D patent/LU65544A1/xx unknown
- 1972-06-21 FR FR7222439A patent/FR2143233B1/fr not_active Expired
- 1972-06-21 BE BE785186A patent/BE785186A/xx unknown
- 1972-06-21 GB GB2918372A patent/GB1377816A/en not_active Expired
- 1972-06-21 IT IT25978/72A patent/IT959879B/it active
- 1972-06-22 JP JP6278172A patent/JPS5523843B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2130904A1 (de) | 1972-12-28 |
| BE785186A (fr) | 1972-12-21 |
| AT317931B (de) | 1974-09-25 |
| NL7203500A (enExample) | 1972-12-28 |
| US3832187A (en) | 1974-08-27 |
| FR2143233A1 (enExample) | 1973-02-02 |
| SE394149B (sv) | 1977-06-06 |
| DE2130904C3 (de) | 1974-06-12 |
| CH584910A5 (enExample) | 1977-02-15 |
| FR2143233B1 (enExample) | 1977-12-23 |
| LU65544A1 (enExample) | 1972-10-25 |
| JPS5523843B1 (enExample) | 1980-06-25 |
| DE2130904B2 (de) | 1973-11-15 |
| IT959879B (it) | 1973-11-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |